Patents by Inventor Edwin Eduard Krijnen

Edwin Eduard Krijnen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070246785
    Abstract: A locking device to lock a six degree of freedom positioned body is disclosed. The device has a clamping bushing to clamp against a surface of a bore extending through the body, a clamping ring to expand when subject to a compression force, and a lock actuator configured to cause the force to be applied so that the clamping ring expands against the clamping bushing so as to cause the clamping bushing to be pushed into contact against the surface. An adjustment mechanism to adjust a position of a body is also disclosed. The mechanism has an intermediate body on which the body is mounted and first and second adjustment elements to adjust a position of the intermediate body with respect to a fixed location in first and second directions, respectively, so that adjustment of the intermediate body is effected substantially in a plane defined by the directions.
    Type: Application
    Filed: April 20, 2006
    Publication date: October 25, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Edwin Eduard Krijnen
  • Publication number: 20060001850
    Abstract: A lithographic apparatus and device manufacturing method are disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes a shaft having a first threaded section and a second threaded section. The first threaded section and the second threaded section have different pitches.
    Type: Application
    Filed: July 2, 2004
    Publication date: January 5, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Constant Dekker, Edwin Eduard Krijnen
  • Publication number: 20050260779
    Abstract: A lithographic apparatus including an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; at least one mounting bracket configured to couple a second part of the apparatus to a first part thereof, the mounting bracket including a first rigid part, a second rigid part, and an elastic part connecting the first and second rigid parts, wherein a fixing mechanism is provided to fix the positions of the first rigid part and the second rigid part with respect to each other, the elastic part being less rigid than each of the rigid bracket parts, and the fixing mechanism is configured to couple the first and second rigid parts of the mounting bracket substantially by form fixation.
    Type: Application
    Filed: May 18, 2004
    Publication date: November 24, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Edwin Eduard Krijnen