Patents by Inventor Edwin Kroke
Edwin Kroke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230140949Abstract: A method for the preparation of isocyanates in which: (i) a first organosilicon compound having at least one silicon atom Si1 and a unit of formula G-I bound thereto is converted to a third organosilicon compound having a unit of formula G-II by silylation of the NH group of the unit of formula G-I with a second organosilicon compound having one silicon atom Si2; and (ii) the third organosilicon compound is reacted to an isocyanate by thermolysis, whereby the unit of formula G-II is converted to an isocyanate group.Type: ApplicationFiled: March 30, 2021Publication date: May 11, 2023Applicant: TECHNISCHE UNIVERSITÄT BERGAKADEMIE FREIBERGInventors: Edwin KROKE, Franziska GRÜNDLER, Marcus HERBIG, Marlene-Kirstin BAUMHARDT
-
Patent number: 11053397Abstract: An anti-corrosion coating to protect against corrosion, comprising: a high-density protective coating on a substrate which is prone to corrosion, preferably metals and/or alloys thereof, containing pre-condensed coat-forming alkoxysilane precursors, wherein the molecules of the pre-condensed coat-forming alkoxysilane precursors are built up from monomer units selected from the group formed by coat-forming alkoxysilane precursors, wherein the molecules of the pre-condensed coat-forming alkoxysilane precursors are cross-linked with each other, wherein the high-density protective coating has a coating thickness of at least 50 ?m. The high-density protective coating formed by an inorganic-organic hybrid material, which is preferably produced without solvents (i.e. without the addition of solvents, in particular organic solvents), is comprised of at least one coat-forming alkoxysilane precursor, in particular selected from the group formed by trialkoxysilane precursors.Type: GrantFiled: April 17, 2019Date of Patent: July 6, 2021Assignee: EPG Engineered nanoProducts Germany AGInventors: Edwin Kroke, Stefan Pfeiffer
-
Publication number: 20190241750Abstract: An anti-corrosion coating to protect against corrosion, comprising: a high-density protective coating on a substrate which is prone to corrosion, preferably metals and/or alloys thereof, containing pre-condensed coat-forming alkoxysilane precursors, wherein the molecules of the pre-condensed coat-forming alkoxysilane precursors are built up from monomer units selected from the group formed by coat-forming alkoxysilane precursors, wherein the molecules of the pre-condensed coat-forming alkoxysilane precursors are cross-linked with each other, wherein the high-density protective coating has a coating thickness of at least 50 ?m. The high-density protective coating formed by an inorganic-organic hybrid material, which is preferably produced without solvents (i.e. without the addition of solvents, in particular organic solvents), is comprised of at least one coat-forming alkoxysilane precursor, in particular selected from the group formed by trialkoxysilane precursors.Type: ApplicationFiled: April 17, 2019Publication date: August 8, 2019Inventors: Edwin Kroke, Stefan Pfeiffer
-
Patent number: 10308817Abstract: The invention relates to a protection layer which is used as anticorrosion layer on corrosion-prone substrates, especially corroding metals, alloys and other materials, especially on steel, and as a basecoat for the application of further porous layer systems or as a topcoat, and to the process for production thereof and to use on a coated substrate for protection against corrosion and specifically for use against microbially induced corrosion (MIC), wherein the anticorrosion layer comprises a high-density protection layer on a corrosion-prone substrate, containing pre-condensed layer-forming alkoxysilane precursors, wherein the molecules of the pre-condensed layer-forming alkoxysilane precursors are formed from monomer units selected from the group of the triethoxysilane precursors, wherein the molecules of the pre-condensed layer-forming alkoxysilane precursors are crosslinked with one another, and wherein the high-density protection layer has a layer thickness of at least 50 ?m.Type: GrantFiled: November 7, 2014Date of Patent: June 4, 2019Assignee: EPG Engineered nanoProducts Germany AGInventors: Edwin Kroke, Stefan Pfeifer
-
Patent number: 10266554Abstract: There is provided herein a method of preparing an isocyanatosilane including reacting an olefinic isocyanate with a hydridosilane in the presence of a dinuclear rhodium complex under hydrosilylation conditions.Type: GrantFiled: May 31, 2017Date of Patent: April 23, 2019Assignee: Momentive Performance Materials Inc.Inventors: Brendan John O'Keefe, Roland Wagner, Holger Jürgen Glatzer, Tiberiu Simandan, Konstantin Kraushaar, Joe Adrian Biele, Edwin Kroke
-
Publication number: 20180346493Abstract: There is provided herein a method of preparing an isocyanatosilane including reacting an olefinic isocyanate with a hydridosilane in the presence of a dinuclear rhodium complex under hydrosilylation conditions.Type: ApplicationFiled: May 31, 2017Publication date: December 6, 2018Inventors: Brendan John O'Keefe, Roland Wagner, Helger Jurgen Glatzer, Tiberiu Simandan, Konstantin Kraushaar, Joe Adrian Biele, Edwin Kroke
-
Publication number: 20170009082Abstract: The invention relates to a protection layer which is used as anticorrosion layer on corrosion-prone substrates, especially corroding metals, alloys and other materials, especially on steel, and as a basecoat for the application of further porous layer systems or as a topcoat, and to the process for production thereof and to use on a coated substrate for protection against corrosion and specifically for use against microbially induced corrosion (MIC), wherein the anticorrosion layer comprises a high-density protection layer on a corrosion-prone substrate, containing pre-condensed layer-forming alkoxysilane precursors, wherein the molecules of the pre-condensed layer-forming alkoxysilane precursors are formed from monomer units selected from the group of the triethoxysilane precursors, wherein the molecules of the pre-condensed layer-forming alkoxysilane precursors are crosslinked with one another, and wherein the high-density protection layer has a layer thickness of at least 50 ?m.Type: ApplicationFiled: November 7, 2014Publication date: January 12, 2017Inventors: Edwin Kroke, Stefan Pfeifer
-
Patent number: 9309270Abstract: The present invention relates to a method for silylating 2-amino-1,3,5-triazines of the general formula (I) in which R1 and R2 are each independently hydrogen, hydroxyl, NH2, NHR3, NR32, NO2, NHCOR3, C1- to C2-alkyl, C1- to C20-hydroxyalkyl, C2- to C20-alkenyl, C1- to C20-alkoxy, aryl or aryloxy optionally substituted with C1- to C8-alkyl and R3 is C1- to C20-alkyl, C3- to C12-cycloalkyl, C4 to C30-alkylcycloalkyl, aryl optionally substituted with C1- to C8-alkyl, with silanes, by reacting silanes of the general formula (II) X—SiH(R4R5)??(II), in which X is fluorine, chlorine, bromine or iodine R4 and R5 are each independently C1- to C20-alkyl, C1- to C20-hydroxyalkyl, C1- to C20-haloalkyl, C2- to C20-alkenyl, C1- to C20-alkoxy, aryl or aryloxy optionally substituted with C1- to C8-alkyl, in the presence of a base.Type: GrantFiled: April 1, 2014Date of Patent: April 12, 2016Assignee: BASF SEInventors: Alexander König, Rebekka Von Benten, Jens Aβmann, Edwin Kroke, Sandra Jähnigen, Anke Schwarzer
-
Publication number: 20160052945Abstract: The present invention relates to a method for silylating 2-amino-1,3,5-triazines of the general formula (I) in which R1 and R2 are each independently hydrogen, hydroxyl, NH2, NHR3, NR32, NO2, NHCOR3, C1- to C20 -alkyl, C1- to C20-hydroxyalkyl, C2- to C20-alkenyl, C1- to C20-alkoxy, aryl or aryloxy optionally substituted with C1- to C8-alkyl and R3 is C1- to C20-alkyl, C3- to C12-cycloalkyl, C4 to C30-alkylcycloalkyl, aryl optionally substituted with C1- to C8-alkyl, with silanes, by reacting silanes of the general formula (ID X—SiH(R4R5) ??(II), in which X is fluorine, chlorine, bromine or iodine R4 and R5 are each independently C1- to C20-alkyl, C1- to C20-hydroxyalkyl, C1- to C20-haloalkyl, C2- to C20-alkenyl, C1- to C20-alkoxy, aryl or aryloxy optionally substituted with C1- to C8-alkyl, in the presence of a base.Type: ApplicationFiled: April 1, 2014Publication date: February 25, 2016Inventors: Alexander KÖNIG, Rebekka VON BENTEN, Jens AßMANN, Edwin KROKE, Sandra JÄHNIGEN, Anke SCHWARZER
-
Publication number: 20100254878Abstract: Process for winning pure silicon comprising the following steps: Providing a suspension, which exhibits at least some contaminated silicon particles, and guiding the suspension through at least one microstructure apparatus.Type: ApplicationFiled: April 1, 2010Publication date: October 7, 2010Inventors: Armin MÜLLER, Christian Kusterer, Silvio Stute, Martin Bertau, Ute Singliar, Robert Schulze, Edwin Kroke, Hans-Joachim Möller
-
Patent number: 7655206Abstract: The present invention relates to a for controlled synthesis of hydrogen-rich cyclosiloxanes of the (H2SiO)n type. where n is an integer equal to or greater than 3, by reacting: a.) a halosilane of the H2SiX2 type where X=halogen with b.) a lithium salt, copper(II) salt or a salt of a metal from main group 2 or transition group 2 of the periodic table of the elements, or a mixture of these salts. The ring size is advantageously adjustable to n=3, 4, 5, 6 (especially n=4 to 6), such that larger rings are not formed. In a particularly advantageous embodiment of the process, for the selective preparation of cyclohexasiloxane (H2SiO)6, after the reaction, the solvent is at least partly removed and then solvent is added again.Type: GrantFiled: April 19, 2007Date of Patent: February 2, 2010Assignee: Evonik Degussa GmbHInventors: Gerrit Fester, Gerhard Roewer, Edwin Kroke
-
Patent number: 7645877Abstract: The present invention relates to unsymmetrical and symmetrical phosphorus-comprising heptazine derivatives, represented by the formula (1): in which Ra, Rb and Rc are, independently of one another, an azide group —N3 or an —N?PR1R2R3 group, with the proviso that at least one radical from Ra, Rb and Rc is an —N?PR1R2R3 group, to a process for the preparation thereof and to the use thereof.Type: GrantFiled: September 14, 2005Date of Patent: January 12, 2010Assignees: Zylum Beteiligungsgesellschaft mbH & Co., Patente II KGInventors: Tobias Gmeiner, Edwin Kroke, Marcus Schwarz
-
Publication number: 20090041649Abstract: The present invention relates to a for controlled synthesis of hydrogen-rich cyclosiloxanes of the (H2SiO)n type. where n is an integer equal to or greater than 3, by reacting: a.) a halosilane of the H2SiX2 type where X=halogen with b.) a lithium salt, copper(II) salt or a salt of a metal from main group 2 or transition group 2 of the periodic table of the elements, or a mixture of these salts. The ring size is advantageously adjustable to n=3, 4, 5, 6 (especially n=4 to 6), such that larger rings are not formed. In a particularly advantageous embodiment of the process, for the selective preparation of cyclohexasiloxane (H2SiO)6, after the reaction, the solvent is at least partly removed and then solvent is added again.Type: ApplicationFiled: April 19, 2007Publication date: February 12, 2009Applicant: EVONIK DEGUSSA GmbHInventors: Gerrit Fester, Gerhard Roewer, Edwin Kroke
-
Publication number: 20080039624Abstract: The present invention relates to unsymmetrical and symmetrical phosphorus-comprising heptazine derivatives, represented by the formula (1): in which Ra, Rb and Rc are, independently of one another, an azide group —N3 or an —N?PR1R2R3 group, with the proviso that at least one radical from Ra, Rb and Rc is an —N?PR1R2R3 group, to a process for the preparation thereof and to the use thereof.Type: ApplicationFiled: September 14, 2005Publication date: February 14, 2008Applicant: UNIVERSITAT KONSTANZInventors: Tobias Gmeiner, Edwin Kroke, Marcus Schwarz
-
Publication number: 20050031521Abstract: A compound having a space spinel structure and the formula Si3-x Cx N4 wherein 0<x?1. An example of the compound is spin el silicon carbonitride. The compound of the invention may be made by providing a silicon carbo-diimide compound and subjecting the compound to elevated temperature and pressure conditions.Type: ApplicationFiled: August 27, 2002Publication date: February 10, 2005Inventors: Andreas Zerr, Edwin Kroke, Ralf Riedel, Marcus Schwarz
-
Patent number: 6127510Abstract: Novel C/N-- and B/C/N polymers which can be obtained by reaction of (a) a carbodiimide having the formula R.sub.3 E--NCN--ER.sub.3, in which R includes a group selected from the group consisting of alkyl groups and aryl groups, and E comprises a component selected from the group consisting of Si, Ge, and Sn, and (b) a halogenotriazine. Methods for making and using said polymers.Type: GrantFiled: August 10, 1999Date of Patent: October 3, 2000Assignee: Bayer AktiengesellschaftInventors: Ralf Riedel, Edwin Kroke, Axel Greiner