Patents by Inventor Edwin Lorimer Thomas

Edwin Lorimer Thomas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10074544
    Abstract: A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.
    Type: Grant
    Filed: April 18, 2014
    Date of Patent: September 11, 2018
    Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Jonathan Phillip Singer, Pao Tai Lin, Edwin Lorimer Thomas
  • Patent number: 9845245
    Abstract: Method for making a liquid foam from graphene. The method includes preparing an aqueous dispersion of graphene oxide and adding a water miscible compound to the aqueous dispersion to produce a mixture including a modified form of graphene oxide. A second immiscible fluid (a gas or a liquid) with or without a surfactant are added to the mixture and agitated to form a fluid/water composite wherein the modified form of graphene oxide aggregates at the interfaces between the fluid and water to form either a closed or open cell foam. The modified form of graphene oxide is the foaming agent.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: December 19, 2017
    Assignee: Massachusetts Institute of Technology
    Inventors: Daniel Alcazar Jorba, Edwin Lorimer Thomas
  • Publication number: 20150303064
    Abstract: A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.
    Type: Application
    Filed: April 18, 2014
    Publication date: October 22, 2015
    Inventors: Jonathan Phillip Singer, Pao Tai Lin, Edwin Lorimer Thomas
  • Publication number: 20150191359
    Abstract: Method for making a liquid foam from graphene. The method includes preparing an aqueous dispersion of graphene oxide and adding a water miscible compound to the aqueous dispersion to produce a mixture including a modified form of graphene oxide. A second immiscible fluid (a gas or a liquid) with or without a surfactant are added to the mixture and agitated to form a fluid/water composite wherein the modified form of graphene oxide aggregates at the interfaces between the fluid and water to form either a closed or open cell foam. The modified form of graphene oxide is the foaming agent.
    Type: Application
    Filed: March 23, 2015
    Publication date: July 9, 2015
    Inventors: Daniel Alcazar Jorba, Edwin Lorimer Thomas
  • Patent number: 9012522
    Abstract: Method for making a liquid foam from graphene. The method includes preparing an aqueous dispersion of graphene oxide and adding a water miscible compound to the aqueous dispersion to produce a mixture including a modified form of graphene oxide. A second immiscible fluid (a gas or a liquid) with or without a surfactant are added to the mixture and agitated to form a fluid/water composite wherein the modified form of graphene oxide aggregates at the interfaces between the fluid and water to form either a closed or open cell foam. The modified form of graphene oxide is the foaming agent.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: April 21, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Daniel Alcazar Jorba, Edwin Lorimer Thomas
  • Patent number: 8923661
    Abstract: 2-pattern photonic crystal and the associated photonic devices are described here. A 2-pattern photonic crystal has a large, complete photonic band gap. It includes a TM sub-structure providing a large TM photonic band gap superimposed on a TE sub-structure providing a large TE photonic band gap. The resulting 2-pattern photonic crystals have complete photonic band gaps larger than 15%. By altering the respective sub-structures, optical devices for different polarizations (TE, TM or both) can be readily designed, and those optical devices can be integrated on the same plane.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: December 30, 2014
    Assignee: Massachusetts Institute of Technology
    Inventors: Lin Jia, Edwin Lorimer Thomas
  • Patent number: 8833510
    Abstract: A methodology for designing structured metamaterials that can reflect, absorb and focus the propagation of both scalar acoustic and vector elastic waves is described. Three exemplary representative inventions based on the disclosed invention are described, illustrating i) compact ultra-wide broadband isolation, ii) sub-wavelength gaps and negative index propagation utilizing a single material platform, and iii) a fundamentally new method of producing multiple high frequency spectral gaps. Such metamaterial designs possess a wide range of potential applications, ranging from but not limited to, isolating an entity from external mechanical or acoustical vibrations, compact focusing lenses as well as cascaded high frequency filters for wave shaping and nonlinear wave propagation control.
    Type: Grant
    Filed: May 3, 2012
    Date of Patent: September 16, 2014
    Assignee: Massachusetts Institute of Technology
    Inventors: Cheong Yang Koh, Daniel Alcazar Jorba, Edwin Lorimer Thomas
  • Patent number: 8465910
    Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: June 18, 2013
    Assignee: Massachusetts Institute of Technology
    Inventors: Jonathan Phillip Singer, Jae-Hwang Lee, Steven E. Kooi, Edwin Lorimer Thomas
  • Publication number: 20130025961
    Abstract: A methodology for designing structured metamaterials that can reflect, absorb and focus the propagation of both scalar acoustic and vector elastic waves is described. Three exemplary representative inventions based on the disclosed invention are described, illustrating i) compact ultra-wide broadband isolation, ii) sub-wavelength gaps and negative index propagation utilizing a single material platform, and iii) a fundamentally new method of producing multiple high frequency spectral gaps. Such metamaterial designs possess a wide range of potential applications, ranging from but not limited to, isolating an entity from external mechanical or acoustical vibrations, compact focusing lenses as well as cascaded high frequency filters for wave shaping and nonlinear wave propagation control.
    Type: Application
    Filed: May 3, 2012
    Publication date: January 31, 2013
    Applicant: Massachusetts Institute of Technology
    Inventors: Cheong Yang Koh, Daniel Alcazar Jorba, Edwin Lorimer Thomas
  • Publication number: 20130028553
    Abstract: 2-pattern photonic crystal and the associated photonic devices are described here. A 2-pattern photonic crystal has a large, complete photonic band gap. It includes a TM sub-structure providing a large TM photonic band gap superimposed on a TE sub-structure providing a large TE photonic band gap. The resulting 2-pattern photonic crystals have complete photonic band gaps larger than 15%, By altering the respective sub-structures, optical devices for different polarizations (TE, TM or both) can be readily designed, and those optical devices can be integrated on the same plane.
    Type: Application
    Filed: June 15, 2012
    Publication date: January 31, 2013
    Applicant: Massachusetts Institute of Technology
    Inventors: Lin Jia, Edwin Lorimer Thomas
  • Publication number: 20120322917
    Abstract: Method for making a liquid foam from graphene. The method includes preparing an aqueous dispersion of graphene oxide and adding a water miscible compound to the aqueous dispersion to produce a mixture including a modified form of graphene oxide. A second immiscible fluid (a gas or a liquid) with or without a surfactant are added to the mixture and agitated to form a fluid/water composite wherein the modified form of graphene oxide aggregates at the interfaces between the fluid and water to form either a closed or open cell foam. The modified form of graphene oxide is the foaming agent.
    Type: Application
    Filed: June 14, 2012
    Publication date: December 20, 2012
    Applicant: Massachussetts Institute of Technology
    Inventors: Daniel Alcazar Jorba, Edwin Lorimer Thomas
  • Publication number: 20120164587
    Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.
    Type: Application
    Filed: June 29, 2011
    Publication date: June 28, 2012
    Applicant: Massachusetts Institute of Technology
    Inventors: Jonathan Phillip Singer, Jae-Hwang Lee, Steven E. Kooi, Edwin Lorimer Thomas