Patents by Inventor Edwin P. Boyd

Edwin P. Boyd has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymeric compositions and uses therefor
    Patent number: 7612146
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
    Type: Grant
    Filed: September 7, 2005
    Date of Patent: November 3, 2009
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Larry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett
  • Polymeric compositions and uses therefor
    Patent number: 6949609
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: September 27, 2005
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Larry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett
  • Polymeric compositions and uses therefor
    Publication number: 20030176583
    Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
    Type: Application
    Filed: December 12, 2002
    Publication date: September 18, 2003
    Inventors: Larry F. Rhodes, Richard Vicari, Leah J. Langsdorf, Andrew A. Sobek, Edwin P. Boyd, Brian Bennett