Patents by Inventor Edwin van den Tillaart

Edwin van den Tillaart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sublimation cell with time stability of output vapor pressure
    Patent number: 11946131
    Abstract: Designs and arrangements for sublimation cells are provided, which enriches an inert carrier gas with organic vapor such that the partial pressure of the organic vapor is highly stable in time. Stability is achieved by controlling the local rates of evaporation along the solid-gas interface through one or more crucibles, thereby reducing the effects of greater headspace and lowering interfacial area as the source depletes. Local evaporation rates also can be controlled using either temperature distribution or convective flow fields.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: April 2, 2024
    Assignee: Universal Display Corporation
    Inventors: Gregory McGraw, Edwin Van Den Tillaart, William E. Quinn, Sven Pekelder, Matthew King
  • NOZZLE EXIT CONTOURS FOR PATTERN COMPOSITION
    Publication number: 20220042165
    Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
    Type: Application
    Filed: October 26, 2021
    Publication date: February 10, 2022
    Inventors: Edwin van den Tillaart, Sven Pekelder, Mark Meuwese, William E. Quinn, Gregory McGraw, Gregg Kottas
  • Nozzle exit contours for pattern composition
    Patent number: 11168391
    Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: November 9, 2021
    Assignee: Universal Display Corporation
    Inventors: Edwin van den Tillaart, Sven Pekelder, Mark Meuwese, William E. Quinn, Gregory McGraw, Gregg Kottas
  • SUBLIMATION CELL WITH TIME STABILITY OF OUTPUT VAPOR PRESSURE
    Publication number: 20180340253
    Abstract: Designs and arrangements for sublimation cells are provided, which enriches an inert carrier gas with organic vapor such that the partial pressure of the organic vapor is highly stable in time. Stability is achieved by controlling the local rates of evaporation along the solid-gas interface through one or more crucibles, thereby reducing the effects of greater headspace and lowering interfacial area as the source depletes. Local evaporation rates also can be controlled using either temperature distribution or convective flow fields.
    Type: Application
    Filed: May 17, 2018
    Publication date: November 29, 2018
    Inventors: Gregory MCGRAW, Edwin VAN DEN TILLAART, William E. QUINN, Sven PEKELDER, Matthew KING
  • NOZZLE EXIT CONTOURS FOR PATTERN COMPOSITION
    Publication number: 20170294615
    Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 12, 2017
    Inventors: Edwin van den Tillaart, Sven Pekelder, Mark Meuwese, William E. Quinn, Gregory McGraw, Gregg Kottas