Abstract: A reticle removing apparatus adapted to remove a reticle in a reticle library of an exposure apparatus is provided. The reticle removing apparatus includes a bracket and a reticle removing module movably coupled to the bracket, wherein the reticle removing module is configured to be moved into the reticle library in a first direction to remove the reticle in the reticle library. A reticle removing method using the reticle removing apparatus is also provided.

Abstract: A pickup device disposed on a base includes a driving unit, a pickup arm, a control unit, a passive arm and a control line. The control unit is disposed on the pickup arm and electrically connects to the pickup arm for controlling that. The passive arm is connected with the pickup arm. The control line is electrically connected between the driving unit and the control unit and embedded in the passive arm. Therefore, the passive arm can protect the control line from damage by suffering external force. Further, the times of being bent to broken of the control line can be reduced to elongate the life thereof. A lithography apparatus using the pickup device is also provided.