Patents by Inventor Efraim Aharoni

Efraim Aharoni has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240170958
    Abstract: For example, a multi voltage-domain Electro Static Discharge (ESD) power clamp may include a plurality of pins; and an ESD array including a cascaded plurality of ESD power clamps. For example, the ESD array may include a plurality of ESD array portions configured to protect a respective plurality of voltage domains from ESD. For example, the ESD array may be configured to connect the plurality of ESD array portions between a respective plurality of pin pairs from the plurality of pins. For example, an ESD array portion corresponding to a voltage domain may include one or more ESD power clamps of the cascaded plurality of ESD power clamps. For example, the ESD array portion may be configured to protect a voltage range of the voltage domain.
    Type: Application
    Filed: November 22, 2022
    Publication date: May 23, 2024
    Applicant: TOWER SEMICONDUCTOR LTD.
    Inventors: Efraim Aharoni, Avi Parvin, Roda Kanawati, Allon Parag, Einat Arad Ophir
  • Patent number: 9882003
    Abstract: Some demonstrative embodiments include devices and/or systems of a Silicon Controlled Rectifier (SCR). For example, a silicon controlled rectifier (SCR) may include a metal-oxide-semiconductor field-effect transistor (MOSFET), the MOSFET may include a gate; an N-type source region; a non-Lightly Doped Drain (LDD) N-type drain region; and a P-Well region extending between the N-type source region and the non-LDD N-type drain region, and extending between the non-LDD N-type drain region and a drain region of the gate.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: January 30, 2018
    Assignee: TOWER SEMICONDUCTOR LTD.
    Inventor: Efraim Aharoni
  • Publication number: 20180012961
    Abstract: Some demonstrative embodiments include devices and/or systems of a Silicon Controlled Rectifier (SCR). For example, a silicon controlled rectifier (SCR) may include a metal-oxide-semiconductor field-effect transistor (MOSFET), the MOSFET may include a gate; an N-type source region; a non-Lightly Doped Drain (LDD) N-type drain region; and a P-Well region extending between the N-type source region and the non-LDD N-type drain region, and extending between the non-LDD N-type drain region and a drain region of the gate.
    Type: Application
    Filed: July 11, 2016
    Publication date: January 11, 2018
    Inventor: Efraim Aharoni