Patents by Inventor Efrat NOIFELD

Efrat NOIFELD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method, system and computer program product for 3D-NAND CDSEM metrology
    Patent number: 11651509
    Abstract: A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: May 16, 2023
    Assignee: Applied Materials Israel Ltd.
    Inventors: Roman Kris, Roi Meir, Sahar Levin, Ishai Schwarzband, Grigory Klebanov, Shimon Levi, Efrat Noifeld, Hiroshi Miroku, Taku Yoshizawa, Kasturi Saha, Sharon Duvdevani-Bar, Vadim Vereschagin
  • METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METROLOGY
    Publication number: 20210383529
    Abstract: A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.
    Type: Application
    Filed: October 31, 2019
    Publication date: December 9, 2021
    Inventors: Roman KRIS, Roi MEIR, Sahar LEVIN, Ishai SCHWARZBAND, Grigory KLEBANOV, Shimon LEVI, Efrat NOIFELD, Hiroshi MIROKU, Taku YOSHIZAWA, Kasturi SAHA, Sharon DUVDEVANI-BAR, Vadim VERESCHAGIN
  • CD-SEM technique for wafers fabrication control
    Patent number: 9824852
    Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.
    Type: Grant
    Filed: December 31, 2015
    Date of Patent: November 21, 2017
    Assignee: Applied Materials Israel Ltd
    Inventors: Roman Kris, Yakov Weinberg, Yan Ivanchenko, Ishai Schwarzband, Dan Lange, Arbel Englander, Efrat Noifeld, Ran Goldman, Ori Shoval
  • CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL
    Publication number: 20170194125
    Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.
    Type: Application
    Filed: December 31, 2015
    Publication date: July 6, 2017
    Inventors: Roman KRIS, Yakov WEINBERG, Yan IVANCHENKO, Ishai SCHWARZBAND, Dan LANGE, Arbel ENGLANDER, Efrat NOIFELD, Ran GOLDMAN, Ori SHOVAL