Patents by Inventor Egbert Brouwer

Egbert Brouwer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
    Publication number: 20070146695
    Abstract: The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.
    Type: Application
    Filed: December 1, 2006
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Egbert Brouwer, Hedser Van Brug