Patents by Inventor Ehud TZURI

Ehud TZURI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for reducing semiconductor substrate strain variation
    Patent number: 9484274
    Abstract: Embodiments of the disclosure provide methods and system for correcting lithographic film stress/strain variations on a semiconductor substrate using laser energy treatment process. In one embodiment, a method for correcting film stress/strain variations on a substrate includes performing a measurement process in a metrology tool on a substrate to obtain a substrate distortion or an overlay error map, determining dose of laser energy in a computing system to correct film stress/strain variations or substrate distortion based on the overlay error map, and providing a laser energy treatment recipe to a laser energy apparatus based on the dose of laser energy determined to correct substrate distortion or film stress/strain variations.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: November 1, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher Dennis Bencher, Ehud Tzuri, Ellie Y. Yieh
  • METHODS FOR REDUCING SEMICONDUCTOR SUBSTRATE STRAIN VARIATION
    Publication number: 20150371908
    Abstract: Embodiments of the disclosure provide methods and system for correcting lithographic film stress/strain variations on a semiconductor substrate using laser energy treatment process. In one embodiment, a method for correcting film stress/strain variations on a substrate includes performing a measurement process in a metrology tool on a substrate to obtain a substrate distortion or an overlay error map, determining dose of laser energy in a computing system to correct film stress/strain variations or substrate distortion based on the overlay error map, and providing a laser energy treatment recipe to a laser energy apparatus based on the dose of laser energy determined to correct substrate distortion or film stress/strain variations.
    Type: Application
    Filed: June 3, 2015
    Publication date: December 24, 2015
    Inventors: Christopher Dennis BENCHER, Ehud TZURI, Ellie Y. YIEH