Abstract: Provided is a distribution circuit which has good pass characteristic and isolation characteristic over a wide band. A distribution circuit, in which Wilkinson-type distribution circuits configured with a coil, a capacitor, and a resistor are cascaded in two stages between an input terminal and at least three terminals, and a capacitor is connected in parallel with the resistor inserted between the output terminals in the latter-stage Wilkinson-type distribution circuits.

Abstract: A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is presented. A glass coated with a heat reflecting colored film, obtained by heat treatment of a glass having a first layer containing iron oxide, chromium oxide and nickel oxide and a second layer containing cobalt oxide, laminated sequentially by a sputtering method, on one side of a glass substrate.

Abstract: A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is presented. A glass coated with a heat reflecting colored film, obtained by heat treatment of a glass having a first layer containing iron oxide, chromium oxide and nickel oxide and a second layer containing cobalt oxide, laminated sequentially by a sputtering method, on one side of a glass substrate.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.

Abstract: A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is presented. A glass coated with a heat reflecting colored film, obtained by heat treatment of a glass having a first layer containing iron oxide, chromium oxide and nickel oxide and a second layer containing cobalt oxide, laminated sequentially by a sputtering method, on one side of a glass substrate.

Abstract: A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is presented. A glass coated with a heat reflecting colored film, obtained by heat treatment of a glass having a first layer containing iron oxide, chromium oxide and nickel oxide and a second layer containing cobalt oxide, laminated sequentially by a sputtering method, on one side of a glass substrate.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.

Abstract: A copper sulfate plating bath is used which contains

Abstract: A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is presented. A glass coated with a heat reflecting colored film, obtained by heat treatment of a glass having a first layer containing iron oxide, chromium oxide and nickel oxide and a second layer containing cobalt oxide, laminated sequentially by a sputtering method, on one side of a glass substrate.

Abstract: A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent electric power is supplied to the target.

Abstract: An image forming apparatus including an image forming unit for forming images of two pages on one side of a sheet and forming images of other two pages on the other side of the sheet, a storage unit for storing an image to be formed by the image forming unit, and a control unit for controlling to store images in the storage unit in a first mode of fastening or to fasten the longer side of the sheet so as to locate an image of a (4N−1)-th page at the back side of an image of a (4N−3)-th page and locate an image of a 4N-th page at the back side of an image of a (4N−2)-th page, and in a second mode of fastening or to fasten the shorter side of the sheet so as to locate an image of a 4N-th page at the back side of an image of a (4N−3)-th page and locate an image of a (4N−1)-th page at the back side of an image of a (4N−2)-th page, wherein the image forming unit forms the images in the storage unit located by the control unit, on the sheet.

Abstract: A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.

Abstract: An image forming apparatus has a re-supply stacker for reversing a front surface and a rear surface of a sheet and temporarily stacking sheets so that a sheet having one surface on which an image was formed by an image forming unit is re-supplied to the image forming unit, a sheet conveyer for reversing a front surface and a rear surface of a sheet and conveying the sheet to the re-supply stacker, a shifter for shifting the sheet discharged from the sheet conveyer onto the re-supply stacker to abut the sheet against a regulation unit for regulating a position of the sheet, and a controller for controlling so that a shift amount of the shifter is changed.

Abstract: An image forming apparatus including an image forming unit for forming images of two pages on one side of a sheet and forming images of other two pages on the other side of the sheet, a storage unit for storing an image to be formed by the image forming unit, and a control unit for controlling to store images in the storage unit in a first mode of fastening or to fasten the longer side of the sheet so as to locate an image of a (4N-1)-th page at the back side of an image of a (4N-3)-th page and locate an image of a 4N-th page at the back side of an image of a (4N-2)-th page, and in a second mode of fastening or to fasten the shorter side of the sheet so as to locate an image of a 4N-th page at the back side of an image of a (4N-3)-th page and locate an image of a (4N-1)-th page at the back side of an image of a (4N-2)-th page, wherein the image forming unit forms the images in the storage unit located by the control unit, on the sheet.

Abstract: A functional product having a transparent oxide layer and a silver layer alternately laminated on a transparent substrate in a total number of (2n+1) layers, where n.gtoreq.1, wherein an oxide film whose major component is an oxide containing tin and silicon, is formed on the outermost layer.

Abstract: A functional product comprising at least one layer of a thin film having a function formed above a substrate; and at least one layer of an oxide film whose major component is an oxide containing tin and silicon, formed above the substrate.

Abstract: The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.

Abstract: A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.

Abstract: A low emissivity film which comprises: a substrate; and a coating of oxide and metallic films alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein the oxide film (B) formed on the outer side of the metallic film (A) being most apart from the substrate, has an internal stress which is equal to, or less than 1.1×1010 dyne/cm2.