Patents by Inventor Eiichi Kawamura

Eiichi Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7291931
    Abstract: A semiconductor device includes a first insulation layer including a first conductor pattern, a second insulation layer formed on the first insulation layer and including a second conductor pattern, and a third conductor pattern formed on the second insulation layer, wherein there is formed a first alignment mark part in the first insulation layer by a part of the first conductor pattern, the third conductor pattern is formed with a second alignment mark part corresponding to the first alignment mark part, the first and second alignment marks forming a mark pair for detecting alignment of the first conductor pattern and the third conductor pattern, the second conductor pattern being formed in the second insulation layer so as to avoid the first alignment mark part.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: November 6, 2007
    Assignee: Fujitsu Limited
    Inventors: Katsuyoshi Kirikoshi, Eiichi Kawamura
  • Patent number: 7220521
    Abstract: A method of fabricating a semiconductor device includes an exposing process in which a lower pattern is formed by a first exposing process and an upper pattern is formed thereon by a second exposing process, wherein the exposure process includes the steps of obtaining a first correction value representing a difference of first and second alignment error correction parameter preset values respectively used at the time of a first exposing process of exposing the lower patterns in a current lot and in a just-before lot, obtaining, as a second correction value, an optimum correction amount of a third alignment error correction parameter preset value needed for proper alignment of the upper pattern in the second exposing process of the just-before lot, the third alignment error correction parameter has been used in the second exposing process of the just-before lot for exposing the upper pattern, and obtaining an optimum correction parameter prediction value to be used for exposing the upper pattern in the second
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: May 22, 2007
    Assignee: Fujitsu Limited
    Inventor: Eiichi Kawamura
  • Publication number: 20060125101
    Abstract: A semiconductor device includes a first insulation layer including a first conductor pattern, a second insulation layer formed on the first insulation layer and including a second conductor pattern, and a third conductor pattern formed on the second insulation layer, wherein there is formed a first alignment mark part in the first insulation layer by a part of the first conductor pattern, the third conductor pattern is formed with a second alignment mark part corresponding to the first alignment mark part, the first and second alignment marks forming a mark pair for detecting alignment of the first conductor pattern and the third conductor pattern, the second conductor pattern being formed in the second insulation layer so as to avoid the first alignment mark part.
    Type: Application
    Filed: February 10, 2006
    Publication date: June 15, 2006
    Applicant: FUJITSU LIMITED
    Inventors: Katsuyoshi Kirikoshi, Eiichi Kawamura
  • Patent number: 7033904
    Abstract: A semiconductor device includes a first insulation layer including a first conductor pattern, a second insulation layer formed on the first insulation layer and including a second conductor pattern, and a third conductor pattern formed on the second insulation layer, wherein there is formed a first alignment mark part in the first insulation layer by a part of the first conductor pattern, the third conductor pattern is formed with a second alignment mark part corresponding to the first alignment mark part, the first and second alignment marks forming a mark pair for detecting alignment of the first conductor pattern and the third conductor pattern, the second conductor pattern being formed in the second insulation layer so as to avoid the first alignment mark part.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: April 25, 2006
    Assignee: Fujitsu Limited
    Inventors: Katsuyoshi Kirikoshi, Eiichi Kawamura
  • Publication number: 20060027926
    Abstract: A semiconductor device includes a first insulation layer including a first conductor pattern, a second insulation layer formed on the first insulation layer and including a second conductor pattern, and a third conductor pattern formed on the second insulation layer, wherein there is formed a first alignment mark part in the first insulation layer by a part of the first conductor pattern, the third conductor pattern is formed with a second alignment mark part corresponding to the first alignment mark part, the first and second alignment marks forming a mark pair for detecting alignment of the first conductor pattern and the third conductor pattern, the second conductor pattern being formed in the second insulation layer so as to avoid the first alignment mark part.
    Type: Application
    Filed: December 2, 2004
    Publication date: February 9, 2006
    Applicant: FUJITSU LIMITED
    Inventors: Katsuyoshi Kirikoshi, Eiichi Kawamura
  • Publication number: 20060028645
    Abstract: A method of fabricating a semiconductor device includes an exposing process in which a lower pattern is formed by a first exposing process and an upper pattern is formed thereon by a second exposing process, wherein the exposure process includes the steps of obtaining a first correction value representing a difference of first and second alignment error correction parameter preset values respectively used at the time of a first exposing process of exposing the lower patterns in a current lot and in a just-before lot, obtaining, as a second correction value, an optimum correction amount of a third alignment error correction parameter preset value needed for proper alignment of the upper pattern in the second exposing process of the just-before lot, the third alignment error correction parameter has been used in the second exposing process of the just-before lot for exposing the upper pattern, and obtaining an optimum correction parameter prediction value to be used for exposing the upper pattern in the second
    Type: Application
    Filed: February 24, 2005
    Publication date: February 9, 2006
    Applicant: FUJITSU LIMITED
    Inventor: Eiichi Kawamura
  • Patent number: 6656879
    Abstract: A method of reversible selective manifestation of different states of a functional element is disclosed. The functional element is composed of at least two compounds and is capable of alternatively assuming (a) a first state in which the two compounds interact to form a regular aggregate structure, or (b) a second state in which the two compounds do not interact, and at least one of the two compounds is in an aggregate or crystallized state. The respective conditions for attaining one of the two states can be reversibly and extremely speedily controlled, for instance, by use of a heat application device.
    Type: Grant
    Filed: June 3, 1993
    Date of Patent: December 2, 2003
    Assignee: Ricoh Company, Ltd.
    Inventors: Kyoji Tsutsui, Takehito Yamaguchi, Hideaki Ema, Masaru Shimada, Hiroshi Goto, Ichiro Sawamura, Eiichi Kawamura, Keishi Kubo, Shoji Maruyama, Hiroki Kuboyama, Keishi Taniguchi
  • Publication number: 20030114303
    Abstract: A method of reversible selective manifestation of different states of a functional element is disclosed. The functional element is composed of at least two compounds and is capable of alternatively assuming (a) a first state in which the two compounds interact to form a regular aggregate structure, or (b) a second state in which the two compounds do not interact, and at least one of the two compounds is in an aggregate or crystallized state. The respective conditions for attaining one of the two states can be reversibly and extremely speedily controlled, for instance, by use of a heat application device.
    Type: Application
    Filed: June 3, 1993
    Publication date: June 19, 2003
    Inventors: KYOJI TSUTSUI, TAKEHITO YAMAGUCHI, HIDEAKI EMA, MASARU SHIMADA, HIROSHI GOTO, ICHIRO SAWAMURA, EIICHI KAWAMURA, KEISHI KUBO, SHOJI MARUYAMA, HIROKI KUBOYAMA, KEISHI TANIGUCHI
  • Patent number: 6457870
    Abstract: A sealed rolling bearing in which a rolling member is disposed in a bearing space formed between an outer race and an inner race to rotate the outer race and the inner race relatively to each other, and rotation seal members are disposed at both ends of the bearing space in the axial direction thereof while a stationary seal member is disposed on the side of the inner race, thereby sealing the bearing space. The bearing is provided with a vent on the side of the inner race for approximating a fluid pressure in the bearing space to an outside fluid pressure by causing the inside of the bearing space to communicate with the outside when the state of fluid in the bearing space and state of the outside fluid have a predetermined relationship.
    Type: Grant
    Filed: January 26, 2001
    Date of Patent: October 1, 2002
    Assignee: NSK Ltd.
    Inventors: Tomoyuki Aizawa, Eiichi Kawamura, Kazuo Akagami
  • Patent number: 6420095
    Abstract: A method of manufacturing a semiconductor device including the steps of: forming a transparent oxide film on a light reflecting surface; forming an anti-reflective a-c film on the surface of the transparent film; and coating a photoresist film on the surface of the anti-reflective film and patterning the photoresist film, wherein the thicknesses of the anti-reflective film and the transparent film are selected so as to set a standing wave intensity Isw=I&dgr;/Iave to 0.2 or smaller, where Iave is an average value of light intensity in the photoresist film, and I&dgr; is an amplitude of a light intensity change. A fine pattern can be formed on a highly reflective substrate with a small size variation and at a high precision.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: July 16, 2002
    Assignee: Fujitsu Limited
    Inventors: Eiichi Kawamura, Teruyoshi Yao, Nobuhisa Naori, Koichi Hashimoto, Masaharu Kobayashi, Tadasi Oshima
  • Patent number: 6348519
    Abstract: Emulsion ink, by which clear images are produced, having excellent drying and fixing properties and preservation stability and does not bleed, strike through or leak. The emulsion ink contains an aqueous emulsified ultraviolet cure compound.
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: February 19, 2002
    Assignee: Ricoh Company, Ltd.
    Inventors: Kouichi Ohshima, Masanaga Imamura, Keishi Taniguchi, Eiichi Kawamura, Hiroshi Adachi
  • Publication number: 20010002939
    Abstract: A sealed rolling bearing in which a rolling member is disposed in a bearing space formed between an outer race and an inner race to rotate the outer race and the inner race relatively to each other, and rotation seal members are disposed at the both ends of the bearing space in the axial direction thereof while a stationary seal member is disposed on the side of the inner race, thereby sealing the bearing space. The bearing is provided with vent means on the side of the inner race for approximating a fluid pressure in the bearing space to an outside fluid pressure by causing the inside of the bearing space to communicate with the outer when the state of the fluid in the bearing space and state of the outside fluid become a predetermined relationship.
    Type: Application
    Filed: January 26, 2001
    Publication date: June 7, 2001
    Inventors: Tomoyuki Aizawa, Eiichi Kawamura, Kazuo Akagami
  • Patent number: 6063835
    Abstract: Emulsion ink, by which clear images are produced, having excellent drying and fixing properties and preservation stability and does not bleed, strike through or leak. The emulsion ink contains an aqueous emulsified ultraviolet cure compound.
    Type: Grant
    Filed: April 30, 1996
    Date of Patent: May 16, 2000
    Assignee: Ricoh Company, Ltd.
    Inventors: Kouichi Ohshima, Masanaga Imamura, Keishi Taniguchi, Eiichi Kawamura, Hiroshi Adachi
  • Patent number: 5750316
    Abstract: A method of manufacturing a semiconductor device including the steps of: forming a transparent oxide film on a light reflecting surface; forming an anti-reflective a-c film on the surface of the transparent film; and coating a photoresist film on the surface of the anti-reflective film and patterning the photoresist film, wherein the thicknesses of the anti-reflective film and the transparent film are selected so as to set a standing wave intensity I.sub.sw =I.delta./I.sub.ave to 0.2 or smaller, where I.sub.ave is an average value of light intensity in the photoresist film, and I.delta. is an amplitude of a light intensity change. A fine pattern can be formed on a highly reflective substrate with a small size variation and at a high precision.
    Type: Grant
    Filed: March 15, 1995
    Date of Patent: May 12, 1998
    Assignee: Fujitsu Limited
    Inventors: Eiichi Kawamura, Teruyoshi Yao, Nobuhisa Naori, Koichi Hashimoto, Masaharu Kobayashi, Tadasi Oshima
  • Patent number: 5738759
    Abstract: A recording material including paper containing cellulose fibers as the main component, with the elongation percentage of the paper in the cross direction thereof when immersed in water at 20.degree. C. for 1 minute being 1.8 % or less, is produced and recycled. In addition, paper containing cellulose fibers, with the same elongation percentage as mentioned above in the machine direction thereof is also provided.
    Type: Grant
    Filed: October 2, 1995
    Date of Patent: April 14, 1998
    Assignee: Ricoh Company, Ltd.
    Inventors: Hiroshi Kitazawa, Shigeaki Kimura, Eiichi Kawamura, Toshiyuki Kawanishi, Masato Igarashi
  • Patent number: 5700746
    Abstract: A reversible thermosensitive recording medium is disclosed which includes an opaque support and a transparent recording film having a thermosensitive layer capable of reversibly assuming a maximum transparent state and a maximum opaque state depending upon the thermal hysteresis thereof. The recording film has an image display section in which a void space is provided between the recording film and the opaque support and a color discriminative from the color of the support. The display section in the maximum transparent state shows a reflectance greater by 5% than that in the maximum opaque state and a transmittance of 20-80% in the maximum transparent state, so that the visibility of the recorded image is improved.
    Type: Grant
    Filed: March 5, 1996
    Date of Patent: December 23, 1997
    Assignee: Ricoh Company, Ltd.
    Inventors: Atsushi Kutami, Eiichi Kawamura, Keishi Kubo
  • Patent number: 5635005
    Abstract: A method for recycling a support material of an image-bearing support is composed of the steps of (a) impregnating an image-bearing support, at least part of which is composed of a paper layer, and on which paper layer images made from a thermofusible ink containing a thermofusible resin component are formed, with at least one of water or an aqueous solution which is selected from the group consisting of an aqueous solution containing a surfactant, an aqueous solution containing a water-soluble polymer, and an aqueous solution containing a water-soluble polymer and a surfactant; (b) causing an image release member to adhere to the image bearing side of the support with the application of heat thereto, the image release member including a resin layer which is composed of the same thermofusible resin component as that contained in the thermofusible ink, or a resin layer having the same or substantially the same SP value as that of the thermofusible resin component in said thermofusible ink; and (c) peeling the
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: June 3, 1997
    Assignee: Ricoh Company, Ltd.
    Inventors: Tadashi Saitoh, Kiyoshi Tanikawa, Eiichi Kawamura
  • Patent number: 5626426
    Abstract: A self aligning roller bearing with retainer comprises an outer ring having an outer ring raceway in a shape of a spherical concave surface with a single center, an inner ring having a pair of inner ring raceways opposite to the outer ring raceway, a plurality of convex rollers provided rotatable between the outer ring raceway and the inner ring raceway, and a pair of retainers comprising a main portion formed in a hollow cylindrical frustum shape and having a plurality of crossbars, an outwardly flanged portion extending radially outward from the larger diameter end of the main portion and an inwardly flanged portion extending radially inward from the smaller diameter end of the main portion, and connected to the outwardly flanges portion by the crossbars so as to form a plurality of pockets each defined by two of the crossbars and outwardly and inwardly flanged portions to receive one of the convex rollers, the outwardly flanged portion having protrusions each protruding towards the pocket so as to rub agai
    Type: Grant
    Filed: April 25, 1996
    Date of Patent: May 6, 1997
    Assignees: NSK Ltd., Nakanishi Metal Works Co., Ltd.
    Inventors: Akiyoshi Honda, Masahide Matsubara, Eiichi Kawamura, Fukuji Kikkawa, Kunio Fukuda, Teruo Nagao
  • Patent number: 5607534
    Abstract: A method of recycling a support material for supporting images thereon, at least part of the support material including a paper layer which contains cellulose fibers as the main component and bears thereon hydrophobic images having a coloring agent and a heat softening or thermofusible material, includes the steps of causing the support material to hold a water-containing image peeling liquid thereon; bringing an image peeling member into contact with the hydrophobic images while the image peeling liquid is held on the support material; and peeling the hydrophobic images off the paper layer, with the image peeling liquid being held in an amount of 1.0 g or more per A4-size paper layer, or with the rate of the penetration of the image peeling liquid into the paper layer of the support material being set at 12 ml/m.sup.2 or more for a contact time of 0.
    Type: Grant
    Filed: August 22, 1994
    Date of Patent: March 4, 1997
    Assignee: Ricoh Company, Ltd.
    Inventors: Toshiyuki Kawanishi, Masato Igarashi, Eiichi Kawamura, Tadashi Saitoh, Kiyoshi Tanikawa, Kakuji Murakami
  • Patent number: RE36963
    Abstract: A predetermined processing liquid is supplied by a liquid supplying unit to a sheet of transfer paper having a surface on which toner is stably attached. An adhesive state of the toner on the transfer paper sheet is changed to an unstable adhesive state. The processing liquid is constructed by water, aqueous solutions of a surfactant, a water-soluble polymer, etc. The transfer paper sheet including the processing liquid is fed to a toner separating unit. While the toner is heated and pressurized in the toner separating unit, the toner is attached to a separating roller having a surface on which the softened toner is easily attached. The toner separating unit then separates only the transfer paper sheet from the surface of the separating roller by a separating claw. The processing liquid is removed from the transfer paper sheet by heating the transfer paper sheet, etc. using a drying unit such that the transfer paper sheet can be reused for a copying machine, etc.
    Type: Grant
    Filed: February 25, 1999
    Date of Patent: November 21, 2000
    Assignee: Ricoh Company, Ltd.
    Inventors: Kazuhiro Ando, Yoshiaki Miyashita, Youichi Asaba, Kiyoshi Tanikawa, Satoshi Singuryo, Shinichi Kuramoto, Sadao Takahashi, Yoshiyuki Kimura, Tadashi Saito, Mitsuru Ohminato, Masaru Nakano, Eiichi Kawamura