Abstract: Based on an output signal outputted from an input device, a plurality of selection objects having at least a part thereof displayed on a display area of a display device are moved relative to the display area. Among the moved plurality of selection objects, when an end-located selection object reaches a predetermined position of the display area, at least one of the plurality of selection objects displayed on the display area are transformed and displayed.

Abstract: A computer-readable storage medium having stored therein a program that is executed by a computer using a display section and an input section for designating a position on a screen of the display section. The program causes the computer to operate as: means for displaying at least a part of a first content and a second content such that a first region defined by the first content includes a second region for displaying the second content; means for determining, on the basis of a position designated by the input section, whether or not a criterion concerning the input is met; and means for switching between a first mode in which the input operation changes a display form of the first content, and a second mode in which the input operation changes a display form of the second content within the second region, depending on a result of the determination.

Abstract: Provided are an information processing apparatus 1 having a taste as well as an information processing system, an information processing program and an information processing method using the information processing apparatus. The information processing apparatus 1 is one of those with different kinds of appearances from each other, thus having an appearance different from the others, and comprises: a ROM 29 storing appearance information related to the appearance in advance; LCDs 7, 9; and a data processing unit 20 for reading a software so as to process images to be displayed on the LCDs 7, 9. The data processing unit 20 reads the appearance information from the ROM 29, and allows the software to change the images displayed on the LCDs 7, 9. This allows the information processing apparatus 1 to have a different or better taste.

Abstract: A computer-readable storage medium having stored therein a program that is executed by a computer using a display section and an input section for designating a position on a screen of the display section. The program causes the computer to operate as: means for displaying at least a part of a first content and a second content such that a first region defined by the first content includes a second region for displaying the second content; means for determining, on the basis of a position designated by the input section, whether or not a criterion concerning the input is met; and means for switching between a first mode in which the input operation changes a display form of the first content, and a second mode in which the input operation changes a display form of the second content within the second region, depending on a result of the determination.

Abstract: In a display control apparatus, a first content obtained from a server device is planarly displayed on a screen. When an operation to display a second content is detected, the second content is obtained from the server device. In the display control apparatus, it is determined whether or not the second content thus obtained is a stereoscopically viewable image. When the result of the determination is positive, the stereoscopically viewable image as the second content is stereoscopically displayed on the screen.

Abstract: In a display control apparatus, contents obtained from a server device are planarly displayed on a screen. Then, in the display control apparatus, an image included in the planarly displayed contents is obtained, and it is determined whether or not the obtained image is a stereoscopically viewable image. When the result of determination is that the obtained image is a stereoscopically viewable image, the image is stereoscopically displayed on the screen.

Abstract: An information processing system includes a server for managing image files of a planar view image file format and a plurality of first information processing apparatuses each capable of transmitting/receiving an image file via the server. At least one of the first information processing apparatuses includes first transmission means for modifying metadata of an image file of a multi-view image file format which contains a multi-view image, to metadata of an image file of a planar view image file format, and transmitting the image file to the server. At least one of the first information processing apparatuses includes first display control means for, when an image file of the planar view image file format that is received from the server contains a multi-view image, performing multi-view display on a first display device by using the multi-view image.

Abstract: Based on an output signal outputted from an input device, a plurality of selection objects having at least a part thereof displayed on a display area of a display device are moved relative to the display area. Among the moved plurality of selection objects, when an end-located selection object reaches a predetermined position of the display area, at least one of the plurality of selection objects displayed on the display area are transformed and displayed.

Abstract: First, a plurality of selection objects having at least one part thereof displayed on a display area of a display device are moved relative to the display area, based on an output signal outputted from an input device. Then, when an end-located selection object among the moved plurality of selection objects reaches a predetermined position of the display area, displayed on the display area is an object having a shape identical or similar to one part of the plurality of selection objects displayed on the display area.

Abstract: A substrate processing apparatus for processing a substrate coated with a chemical amplification type resist and subjected to a light-exposure treatment comprises a substrate table on which is disposed a substrate, a heater for heating the substrate disposed on the substrate table, and an electric field forming mechanism for forming an electric field exerting force, which is directed toward the substrate, on the protons generated in the resist formed on the substrate disposed on the substrate table.

Abstract: A heating apparatus includes a central hot plate for heating the center portion of a substrate, a plurality of segment hot plates for heating the peripheral portion of the substrate, a hot plate support member supporting the central hot plate and the segment hot plates, support pins for supporting the substrate so as to face the central hot plate and the segment hot plates in a close proximity without being in contact with the central hot plate and the segment hot plates, and a power supply for supplying electricity to the central hot plate and the segment hot plates.

Abstract: A heat processing apparatus comprises a hot plate for putting the substrate on or near its surface, a ceiling with a first and second concentric regions with a first and second heat pipes, respectively, opposite to the hot plate surface, a member surrounding a space between the hot plate and the ceiling, a gas flow generator supplying gas to the a region from a circumference of the hot plate to a center of the ceiling, and a temperature control mechanism for controlling a regional temperature of the first region in such a manner that a heat emission is greater from a center of the substrate than from a circumference of the substrate, thus heating a substrate to a uniform temperature all over its surface.

Abstract: A heating processing chamber has a plate for holding a wafer and a heater heating the plate portion. The plate portion is composed of a plurality of divided plates separated from each other, and thereby the plate is hard to break even through a drastic change in temperature, thus making it possible to increase the durability of the plate.

Abstract: A substrate processing apparatus for processing a substrate coated with a chemical amplification type resist and subjected to a light-exposure treatment comprises a substrate table on which is disposed a substrate, a heater for heating the substrate disposed on the substrate table, and an electric field forming mechanism for forming an electric field exerting force, which is directed toward the substrate, on the protons generated in the resist formed on the substrate disposed on the substrate table.

Abstract: A heating apparatus comprises a central hot plate for heating the center portion of a substrate, a plurality of segment hot plates for heating the peripheral portion of the substrate, a hot plate support member supporting the central hot plate and the segment hot plates, support pins for supporting the substrate so as to face the central hot plate and the segment hot plates in a close proximity without being in contact with the central hot plate and the segment hot plates, and a power supply for supplying electricity to the central hot plate and the segment hot plates.

Abstract: In a heat processing apparatus structured to heat a wafer on a hot plate, a black plate at least the rear face of which practically has a color with a JIS lightness of 0V to 4V is positioned above the hot plate. Moreover, cooling air is blown out from nozzles onto the rear face of the hot plate. Thus, the temperature of the hot plate can be cooled rapidly.

Abstract: A heat treatment table is divided into two or more regions, a heater is disposed for each region. On a predetermined portion of the heat treatment table, a plurality of sensors are disposed separately each other. A relation between temperatures of the respective portions on the heat treatment table and temperatures detected by the sensors is grasped in advance, thereby enables to surmise a temperature of the respective portion of the heat treatment table from the temperature detected by the sensors. In the case of an wafer being actually treated by placing on the heat treatment table, the temperatures detected by the sensors are observed, from these detected temperatures, the temperatures of the respective portions on the heat treatment table, that is, temperatures affecting the wafer, are surmised.

Abstract: An object of the present invention is to heat a substrate at a uniform temperature all over its surface. The heat processing apparatus of the present invention comprises: a hot plate for putting the substrate on or near its surface; a ceiling with a first and second concentric regions with a first and second heat pipes, respectively, opposite to the hot plate surface; a surrounding member for surrounding a space between the hot plate and the ceiling; gas flow generation means for generating a gas flow in the space from a circumference of the hot plate to a center of the ceiling; and a temperature control mechanism for controlling a regional temperature of the first region. The temperature control mechanism controls the regional temperature in such a manner that a heat emission is greater from a center of the substrate than from a circumference of the substrate.

Abstract: The heat treatment apparatus of the present invention comprises a chamber, a hot plate for supporting and heating a substrate in a chamber, a gas supply mechanism having a single or a plurality of gas blow-out ports and arranged in an upper space above the hot plate in the chamber, for supplying a gas along the substrate so as to cover the substrate placed on the hot plate, and an exhaust mechanism having a single or a plurality of gas converge/exhaust ports which face the gas blow-out ports with the hot plate interposed therebetween, for converging and exhausting the gas blown out from the gas blow-out ports, from the chamber, the gas converge/exhaust ports having an effective exhaustion opening length L2 which is shorter than an effective blow-out opening length L1.

Abstract: A heat treatment table is divided into two or more regions, a heater is disposed for each region. On a predetermined portion of the heat treatment table, a plurality of sensors are disposed separately each other. A relation between temperatures of the respective portions on the heat treatment table and temperatures detected by the sensors is grasped in advance, thereby enables to surmise a temperature of the respective portion of the heat treatment table from the temperature detected by the sensors. In the case of an wafer being actually treated by placing on the heat treatment table, the temperatures detected by the sensors are observed, from these detected temperatures, the temperatures of the respective portions on the heat treatment table, that is, temperatures affecting the wafer, are surmised.