Patents by Inventor Eiichi Sugawara
Eiichi Sugawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20220230857Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: ApplicationFiled: April 5, 2022Publication date: July 21, 2022Applicant: Tokyo Electron LimitedInventor: Eiichi SUGAWARA
-
Patent number: 11328910Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: GrantFiled: December 10, 2018Date of Patent: May 10, 2022Assignee: TOKYO ELECTRON LIMITEDInventor: Eiichi Sugawara
-
Publication number: 20190109031Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: ApplicationFiled: December 10, 2018Publication date: April 11, 2019Inventor: Eiichi SUGAWARA
-
Patent number: 10224226Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: GrantFiled: August 15, 2017Date of Patent: March 5, 2019Assignee: TOKYO ELECTRON LIMITEDInventor: Eiichi Sugawara
-
Publication number: 20180019145Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: ApplicationFiled: August 15, 2017Publication date: January 18, 2018Inventor: Eiichi SUGAWARA
-
Patent number: 9799542Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: GrantFiled: March 29, 2012Date of Patent: October 24, 2017Assignee: TOKYO ELECTRON LIMITEDInventor: Eiichi Sugawara
-
Patent number: 8894355Abstract: A turbomolecular pump includes: a rotor (30) formed with rotating blades (32) in a plurality of stages, and rotating at high speed; a plurality of fixed blades (33) arranged along axial direction of the pump so as to alternate with respect to the rotating blades (32); a pump housing (34) containing the rotating blades (32) and the fixed blades (33), and formed with an inlet opening (21a); a circular disk (150), provided close to the inlet opening of the rotor (30), and arranged so as to oppose a surface of the rotor (30) radially inward than a root portion of the rotating blades; and a cylindrical mesh structure (153a, 153b), disposed between the inlet opening (21a) and the rotor (30), and made by interlacing fine wires. Particles that strike the rotor and bounce off are captured internally in the mesh structure (153a, 153b).Type: GrantFiled: February 5, 2010Date of Patent: November 25, 2014Assignees: Shimadzu Corporation, Tokyo Electron LimitedInventors: Yukiteru Sekita, Kazuma Kubota, Tsuyoshi Moriya, Eiichi Sugawara
-
Patent number: 8727708Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.Type: GrantFiled: March 14, 2011Date of Patent: May 20, 2014Assignee: Tokyo Electron LimitedInventors: Tsuyoshi Moriya, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
-
Patent number: 8356970Abstract: An exhaust pump that prevents particles from entering a processing chamber of a substrate processing apparatus. The exhaust pump connected to the processing chamber has rotary blades and an air intake portion disposed on the processing chamber side of the rotary blades. A shielding unit is disposed inside the air intake portion and shields the rotary blades when the air intake portion is viewed from the processing chamber side.Type: GrantFiled: March 24, 2008Date of Patent: January 22, 2013Assignee: Tokyo Electron LimitedInventors: Eiichi Sugawara, Tsuyoshi Moriya
-
Publication number: 20120247671Abstract: Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.Type: ApplicationFiled: March 29, 2012Publication date: October 4, 2012Applicant: TOKYO ELECTRON LIMITEDInventor: Eiichi SUGAWARA
-
Publication number: 20110293401Abstract: A turbomolecular pump includes: a rotor (30) formed with rotating blades (32) in a plurality of stages, and rotating at high speed; a plurality of fixed blades (33) arranged along axial direction of the pump so as to alternate with respect to the rotating blades (32); a pump housing (34) containing the rotating blades (32) and the fixed blades (33), and formed with an inlet opening (21a); a circular disk (150), provided close to the inlet opening of the rotor (30), and arranged so as to oppose a surface of the rotor (30) radially inward than a root portion of the rotating blades; and a cylindrical mesh structure (153a, 153b), disposed between the inlet opening (21a) and the rotor (30), and made by interlacing fine wires. Particles that strike the rotor and bounce off are captured internally in the mesh structure (153a, 153b).Type: ApplicationFiled: February 5, 2010Publication date: December 1, 2011Applicants: TOKYO ELECTRON LIMITED, SHIMADZU CORPORATIONInventors: Yukiteru Sekita, Kazuma Kubota, Tsuyoshi Moriya, Eiichi Sugawara
-
Patent number: 8062432Abstract: A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular pump is supplied toward the foreign matter.Type: GrantFiled: March 24, 2008Date of Patent: November 22, 2011Assignee: Tokyo Electron LimitedInventors: Eiichi Sugawara, Tsuyoshi Moriya
-
Publication number: 20110162678Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.Type: ApplicationFiled: March 14, 2011Publication date: July 7, 2011Applicant: TOKYO ELECTRON LIMITEDInventors: Tsuyoshi MORIYA, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
-
Patent number: 7927066Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.Type: GrantFiled: March 2, 2006Date of Patent: April 19, 2011Assignee: Tokyo Electron LimitedInventors: Tsuyoshi Moriya, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
-
Publication number: 20100043894Abstract: A valve element that can prevent particles rebounding from an exhausting pump from entering a chamber and also prevent a decrease in exhaust efficiency. The valve element has a through hole that penetrates the valve element along an exhaust flow in an exhaust flow passage between the chamber in which a substrate is subjected to predetermined processing and the exhausting pump having rotary blades rotating at high speed, and a particle trap that covers the through hole. The particle trap has a plurality of preventive members that are arranged such as to obstruct particles rebounding from the exhausting pump. The ratio of openings of the particle trap to the exhaust flow in the exhaust flow passage is not less than a predetermined value.Type: ApplicationFiled: July 29, 2009Publication date: February 25, 2010Applicant: TOKYO ELECTRON LIMITEDInventors: Tsuyoshi Moriya, Eiichi Sugawara, Morihiro Takanashi
-
Publication number: 20080240905Abstract: An exhaust pump that prevents particles from entering a processing chamber of a substrate processing apparatus. The exhaust pump connected to the processing chamber has rotary blades and an air intake portion disposed on the processing chamber side of the rotary blades. A shielding unit is disposed inside the air intake portion and shields the rotary blades when the air intake portion is viewed from the processing chamber side.Type: ApplicationFiled: March 24, 2008Publication date: October 2, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Eiichi SUGAWARA, Tsuyoshi Moriya
-
Publication number: 20080236629Abstract: A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular pump is supplied toward the foreign matter.Type: ApplicationFiled: March 24, 2008Publication date: October 2, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Eiichi Sugawara, Tsuyoshi Moriya
-
Publication number: 20060257243Abstract: A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.Type: ApplicationFiled: March 2, 2006Publication date: November 16, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Tsuyoshi Moriya, Takahiro Murakami, Yoshiyuki Kobayashi, Tetsuji Sato, Eiichi Sugawara, Shosuke Endoh, Masaki Fujimori
-
Patent number: 6211293Abstract: A polyfunctional polycarbodiimide compound contains at least four molecular chains bonded independently to a backbone. Each of the molecular chains contains a carbodiimido (—N═C═N—) group. The polyfunctional carbodiimide compound can be produced by reacting (a) an isocyanate compound having at least one carbodiimido group and at least one isocyanate group with (b) a polyol, polyamine and/or aminoalcohol having at least four hydroxyl, primary amino and/or secondary amino groups in a molecule. Also disclosed are a resin composition containing the polyfunctional polycarbodiimide compound as a crosslinking agent; and a treatment method of an article, which makes use of the resin composition.Type: GrantFiled: May 21, 1999Date of Patent: April 3, 2001Assignees: Dainichiseika Color & Chemicals Mfg. Co., Ltd., Ukima Colour & Chemicals Mfg. Co., Ltd.Inventors: Michiei Nakamura, Hiroyuki Shimanaka, Yoshitaka Wakebe, Tatsuo Kawamura, Eiichi Sugawara, Ken Okura, Masayuki Takahashi, Nobuo Takezawa
-
Patent number: 5929188Abstract: A polyfunctional polycarbodiimide compound contains at least four molecular chains bonded independently to a backbone. Each of the molecular chains contains a carbodiimido (--N.dbd.C.dbd.N--) group. The polyfunctional carbodiimide compound can be produced by reacting (a) an isocyanate compound having at least one carbodiimido group and at least one isocyanate group with (b) a polyol, polyamine and/or aminoalcohol having at least four hydroxyl, primary amino and/or secondary amino groups in a molecule. Also disclosed are a resin composition containing the polyfunctional polycarbodiimide compound as a crosslinking agent; and a treatment method of an article, which makes use of the resin composition.Type: GrantFiled: April 24, 1997Date of Patent: July 27, 1999Assignees: Dainichiseika Color & Chemicals Mfg. Co., Ltd., Ukima Colour & Chemicals Mfg. Co., Ltd.Inventors: Michiei Nakamura, Hiroyuki Shimanaka, Yoshitaka Wakebe, Tatsuo Kawamura, Eiichi Sugawara, Ken Okura, Masayuki Takahashi, Nobuo Takezawa