Patents by Inventor Eiichi Yamaguchi

Eiichi Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Information processing system, program, and information processing method
    Patent number: 11938945
    Abstract: An information processing system includes one or more vehicles, and a server communicable with the one or more vehicles. The vehicle acquires an image obtained by imaging a road on which a host vehicle is located. The vehicle or the server determines a degree of difficulty in traveling on the road due to snow cover from the image. The server stores the degree of difficulty in traveling for each of one or more roads, and provides information to a client by using the stored degree of difficulty in traveling for each of one or more roads.
    Type: Grant
    Filed: April 28, 2022
    Date of Patent: March 26, 2024
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Eiichi Kusama, Masatoshi Hayashi, Hisanori Mitsumoto, Kuniaki Jinnai, Makoto Akahane, Yuriko Yamaguchi, Daisuke Kato
  • METAL-CARBOHYDRATE COMPLEX
    Publication number: 20230151051
    Abstract: Provided is an L-glucose derivative represented by General Formula (1) below: wherein X1 represents a —SAuR1 group, and X2, X3, X4 and X5 each independently represent an —OR2 group, an —NH2 group, or a fluorine atom; and R1 represents a ligand and R2 represents a hydrogen atom or an organic group.
    Type: Application
    Filed: March 31, 2021
    Publication date: May 18, 2023
    Inventors: Eiichi YAMAGUCHI, Hideki IIJIMA
  • Chemical vapor deposition apparatus
    Patent number: 7368018
    Abstract: A chemical vapor deposition apparatus is provided. The chemical vapor deposition apparatus includes a susceptor support base and a susceptor, and configured to rotate the susceptor with a rotary shaft, a gap as wide as about 1 mm or more is provided along the boundary between the support base and the perimeter of the susceptor to prevent Ga from forming bridges between the support base and the susceptor during growth of III-V compound semiconductors such as GaN, thereby preventing disturbance of rotation.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: May 6, 2008
    Assignee: Powdec K.K.
    Inventor: Eiichi Yamaguchi
  • Chemical vapor phase epitaxial device
    Publication number: 20040211365
    Abstract: A chemical vapor deposition apparatus is provided. The chemical vapor deposition apparatus includes a susceptor support base and a susceptor, and configured to rotate the susceptor with a rotary shaft, a gap as wide as about 1 mm or more is provided along the boundary between the support base and the perimeter of the susceptor to prevent Ga from forming bridges between the support base and the susceptor during growth of III-V compound semiconductors such as GaN, thereby preventing disturbance of rotation.
    Type: Application
    Filed: March 23, 2004
    Publication date: October 28, 2004
    Inventor: Eiichi Yamaguchi