Patents by Inventor Eiichiro Kobayashi

Eiichiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128090
    Abstract: A method for fabricating a layer structure having a target topology profile in a step which has a side face and a lateral face, includes processes of: (a) depositing a dielectric layer on a preselected area of the substrate under first deposition conditions, wherein the dielectric layer has a portion whose resistance to fluorine and/or chlorine radicals under first dry-etching conditions is tuned; and (b) exposing the dielectric layer obtained in process (a) to the fluorine and/or chlorine radicals under the first dry-etching conditions, thereby removing at least a part of the portion of the dielectric layer, thereby forming a layer structure having the target topology profile on the substrate.
    Type: Application
    Filed: December 6, 2023
    Publication date: April 18, 2024
    Inventors: Eiichiro Shiba, Yoshinori Ota, René Henricus Jozef Vervuurt, Nobuyoshi Kobayashi, Akiko Kobayashi
  • Patent number: 11961741
    Abstract: A method for fabricating a layer structure having a target topology profile in a step which has a side face and a lateral face, includes processes of: (a) depositing a dielectric layer on a preselected area of the substrate under first deposition conditions, wherein the dielectric layer has a portion whose resistance to fluorine and/or chlorine radicals under first dry-etching conditions is tuned; and (b) exposing the dielectric layer obtained in process (a) to the fluorine and/or chlorine radicals under the first dry-etching conditions, thereby removing at least a part of the portion of the dielectric layer, thereby forming a layer structure having the target topology profile on the substrate.
    Type: Grant
    Filed: March 4, 2021
    Date of Patent: April 16, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Eiichiro Shiba, Yoshinori Ota, René Henricus Jozef Vervuurt, Nobuyoshi Kobayashi, Akiko Kobayashi
  • Publication number: 20130022507
    Abstract: A tubular flow reactor comprises at least two fluid feed channels made of a multi-walled tube for feeding at least two kinds of fluids to be used in a reaction, a reaction channel having an annular cross section that can cause the fluids to react while flowing the same therethrough, and a fluid discharge channel for discharging a reaction product. The fluid feed channels are so connected as to communicate with an inlet of the reaction channel along a peripheral tangential direction or along a direction perpendicular to a peripheral surface of the annular reaction channel, and the fluid discharge channel is so connected as to communicate with an outlet of the reaction channel.
    Type: Application
    Filed: April 1, 2011
    Publication date: January 24, 2013
    Applicant: NISSO ENGINEERING CO., LTD.
    Inventor: Eiichiro Kobayashi
  • Publication number: 20120035392
    Abstract: A tubular flow type reactor comprising: (1) inflow channels for respective inflow of at least two kinds of fluids to be used in a reaction, (2) an outer tube having a lumen that is capable of merging the fluids and of distributing the merged fluids for the reaction, (3) an outflow channel for outflow of a reaction product from the outer tube, and (4) an inner tube disposed in the lumen of the outer tube, wherein an annular flow channel is formed between the outer tube and the inner tube, and the inflow channels are connected to the outer tube along the direction tangential to the internal circumference of the outer tube in such a manner that the lumens of the inflow channels communicate with the lumen of the outer tube, i.e., the annular flow channel.
    Type: Application
    Filed: March 24, 2010
    Publication date: February 9, 2012
    Applicant: NISSO ENGINEERING CO., LTD.
    Inventors: Eiichiro Kobayashi, Norihira Fukuzawa
  • Patent number: 6218485
    Abstract: A process for producing a monodisperse polymer which has a number-average molecular weight from 1,000 to 100,000 and a molecular weight distribution Mw (weight-average molecular weight)/Mn (number-average molecular weight)=1.00 through 1.50 is disclosed. This process comprises: homopolymerizing or random copolymerizing an anionic polymerizable compound by living anionic polymerization using an organic alkali metal and/or an alkali metal as a polymerization initiator, wherein a target molecular weight is obtained by adding the compound divided into multiple steps.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: April 17, 2001
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Hiroo Muramoto, Yukikazu Nobuhara, Eiichiro Kobayashi