Patents by Inventor Eiichirou Yamada

Eiichirou Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive element
    Patent number: 8092980
    Abstract: A photosensitive element 1 comprising a support film 10 and a layer (photosensitive layer) 20 composed of a photosensitive resin composition formed on the support film 10, wherein the haze of the support film 10 is 0.01-2.0%, the total number of particles and aggregates with diameters of 5 ?m or larger in the support film 10 is no greater than 5/mm2, the photosensitive layer 20 contains (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated bond and (C) a photopolymerization initiator, and the thickness of the photosensitive layer 20 is 3-30 ?m.
    Type: Grant
    Filed: January 28, 2008
    Date of Patent: January 10, 2012
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masao Kubota, Shinji Takano, Eiichirou Yamada
  • PHOTOSENSITIVE ELEMENT
    Publication number: 20100112481
    Abstract: A photosensitive element 1 comprising a support film 10 and a layer (photosensitive layer) 20 composed of a photosensitive resin composition formed on the support film 10, wherein the haze of the support film 10 is 0.01-2.0%, the total number of particles and aggregates with diameters of 5 ?m or larger in the support film 10 is no greater than 5/mm2, the photosensitive layer 20 contains (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated bond and (C) a photopolymerization initiator, and the thickness of the photosensitive layer 20 is 3-30 ?m.
    Type: Application
    Filed: January 28, 2008
    Publication date: May 6, 2010
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masao Kubota, Shinji Takano, Eiichirou Yamada