Patents by Inventor Eiji Fujiyama

Eiji Fujiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140261161
    Abstract: A substrate holder apparatus includes a substrate holder configured to hold a substrate in a vacuum processing space in a chamber, a support column coupled to the substrate holder, a first rotating support unit which rotatably supports the support column, a second rotating support unit which rotatably supports the support column at a position spaced apart from a position where the first rotating support unit supports the support column, a housing configured to support the first rotating support unit and the rotating support unit, and a conductive member configured to electrically connect the support column to the housing.
    Type: Application
    Filed: June 2, 2014
    Publication date: September 18, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventors: Yasushi MIURA, Eiji FUJIYAMA, Masaaki ISHIDA
  • Publication number: 20140262769
    Abstract: A substrate holder apparatus includes a substrate holder configured to hold a substrate in a vacuum processing space in a chamber, a support column coupled to the substrate holder, a first rotating support unit which rotatably supports the support column, a second rotating support unit which rotatably supports the support column at a position spaced apart from a position where the first rotating support unit supports the support column, and a housing configured to support the first rotating support unit and the second rotating support unit. The second rotating support unit and the housing or the support column and the housing are electrically insulated from each other.
    Type: Application
    Filed: June 2, 2014
    Publication date: September 18, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventors: Yasushi MIURA, Eiji FUJIYAMA, Masaaki ISHIDA
  • Patent number: 8378576
    Abstract: [Objection of the invention]An ion beam generator, a thermal distortion in a grid assembly is reduced. [Structure to solve the objection]Thermal expansion coefficients ?P, ?M and ?G, for a sidewall (1A) of a discharge chamber, mounting platform (40) and extraction grid electrode assembly (20) are selected to have a relation: ?P>?M??G. For example, the material of discharge chamber sidewall is stainless steel o aluminum, the material of grids is Mo, W or C and the material of platform is Ti or Mo.
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: February 19, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Einstein Noel Abarra, Yasushi Miura, Eiji Fujiyama, Naoyuki Suzuki, Yasuyuki Taneda, Yasushi Kamiya
  • Publication number: 20110139998
    Abstract: [Objective of the Invention] An ion beam generator, a thermal distortion in a grid assembly is reduced. [Structure to Solve the Objective] Thermal expansion coefficients ?P, ?M and ?G, for a sidewall (1A) of a discharge chamber, mounting platform (40) and extraction grid electrode assembly (20) are selected to have a relation: ?P>?M??G. For example, the material of discharge chamber sidewall is stainless steel o aluminum, the material of grids is Mo, W or C and the material of platform is Ti or Mo.
    Type: Application
    Filed: October 4, 2010
    Publication date: June 16, 2011
    Applicant: CANON ANELVA CORPORATION
    Inventors: Einstein Noel ABARRA, Yasushi MIURA, Eiji FUJIYAMA, Naoyuki SUZUKI, Yasuyuki TANEDA, Yasushi KAMIYA
  • Patent number: 4960073
    Abstract: A microwave plasma treatment apparatus comprises a plurality of auxiliary magnets arranged around the periphery of a plasma formation chamber. A plurality of auxiliary magnets are disposed along the circumference of the plasma formation chamber while a plurality of auxiliary magnets may also be arranged in the axial direction of the plasma formation chamber. Also, the magnetic poles of every auxiliary magnet are respectively reverse in polarity to the adjoining magnetic poles of an auxiliary magnet(s) disposed adjacent thereto either along the circumference of the plasma formation chamber or in the axial direction thereof. This enables the whole high-density plasma to be substantially uniform throughout the inside of the plasma formation chamber.
    Type: Grant
    Filed: September 14, 1989
    Date of Patent: October 2, 1990
    Assignee: Anelva Corporation
    Inventors: Yasuhiro Suzuki, Sumio Mori, Eiji Fujiyama, Masami Sasaki