Patents by Inventor Eiji Iwamura
Eiji Iwamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11081263Abstract: One chip-shaped electronic component 100 of the present invention has a substrate 10, and a termination electrode layer 80 formed on an end face of the substrate 10. The termination electrode layer 80 is made of a mixed material that contains an electrically-conductive substance (a?) (containing carbon (a) as one type of the electrically-conductive substance (a?)), whisker-like particles (b) covered with the electrically-conductive substance (a?), flake-like particles (c) having electroconductivity, and a tetrafunctional hydroxyphenyl type epoxy resin (d) having a molecular weight of 450 or more and less than 800. In addition, a mass ratio of the flake-like particles (c) is 3/7 or more and 9 or less when the whisker-like particles (b) is assumed to be 1.Type: GrantFiled: December 18, 2018Date of Patent: August 3, 2021Assignees: PELNOX, LTD., PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Eiji Iwamura, Yuichi Ishii, Hirokatsu Itou, Naohiro Takashima, Ken Kasashima
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Publication number: 20200126695Abstract: One chip-shaped electronic component 100 of the present invention has a substrate 10, and a termination electrode layer 80 formed on an end face of the substrate 10. The termination electrode layer 80 is made of a mixed material that contains an electrically-conductive substance (a?) (containing carbon (a) as one type of the electrically-conductive substance (a?)), whisker-like particles (b) covered with the electrically-conductive substance (a?), flake-like particles (c) having electroconductivity, and a tetrafunctional hydroxyphenyl type epoxy resin (d) having a molecular weight of 450 or more and less than 800. In addition, a mass ratio of the flake-like particles (c) is 3/7 or more and 9 or less when the whisker-like particles (b) is assumed to be 1.Type: ApplicationFiled: December 18, 2018Publication date: April 23, 2020Inventors: Eiji IWAMURA, Yuichi ISHII, Hirokatsu ITOU, Naohiro TAKASHIMA, Ken KASASHIMA
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Patent number: 9346993Abstract: The present invention provides a heat dissipating coating composition in a liquid or paste form for application to a heat generating article, comprising an infrared absorbing binder resin (A), infrared absorbing inorganic particles (B), and an organic solvent, having such proportions of the component (A) and the component (B) that the component (A) is 10 to 70 vol % and the component (B) is 90 to 30 vol % based on the total of both components being 100 vol %, and satisfying conditions 1, 2, and 3 specified herein, and also provides a heat dissipating coating film obtained by applying the heat dissipating coating composition to a heat dissipating article and then thermally curing the composition.Type: GrantFiled: March 2, 2013Date of Patent: May 24, 2016Assignees: ARAKAWA CHEMICAL INDUSTRIES, LTD., PELNOX CO., LTD.Inventors: Eiji Iwamura, Masaki Kobayashi, Yasutaka Morozumi, Naoya Takahashi
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Patent number: 9314879Abstract: A principal object of the present invention is to provide a flux which can be used to produce a lead-free solder paste which is excellent in viscosity stability and exhibits excellent wettability at the time of soldering even in atmospheric air. The flux is a lead-free solder flux having a bromine atom concentration of 400 to 20000 ppm based on 0.1 g of the flux and comprising 0.01 to 0.7% by weight of an amine compound (a) represented by the general formula (1): H2N—(CH2)n—X—(CH2)n—NH2 (wherein n represents an integer of 1 to 6 and X represents —NH—CH2CH2—NH— or a piperazine residue).Type: GrantFiled: December 16, 2011Date of Patent: April 19, 2016Assignee: Arakawa Chemical Industries, Ltd.Inventors: Natsuki Kubo, Eiji Iwamura
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Publication number: 20160024366Abstract: A powdered paint composition for heat dissipation according to one aspect of the present invention contains at least one binder resin (A) selected from the group consisting of an epoxy resin (a1) and a polyester resin (a2) having a hydroxy group and/or a carboxyl group and also contains a heat dissipation filler (B) having a thermal conductivity of 0.2 W/mK or more and less than 100 W/mK in an amount of 10 mass % or more and 40 mass % or less. The powdered paint composition for heat dissipation can be used as a material for forming a coating film having excellent efficiency of heat dissipation on the surfaces of various articles.Type: ApplicationFiled: February 25, 2014Publication date: January 28, 2016Inventors: Eiji IWAMURA, Masaki KOBAYASHI, Hirofumi KOMIYAMA, Naoya TAKAHASHI
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Publication number: 20150010759Abstract: The present invention provides a heat dissipating coating composition in a liquid or paste form for application to a heat generating article, comprising an infrared absorbing binder resin (A), infrared absorbing inorganic particles (B), and an organic solvent, having such proportions of the component (A) and the component (B) that the component (A) is 10 to 70 vol % and the component (B) is 90 to 30 vol % based on the total of both components being 100 vol %, and satisfying conditions 1, 2, and 3 specified herein, and also provides a heat dissipating coating film obtained by applying the heat dissipating coating composition to a heat dissipating article and then thermally curing the composition.Type: ApplicationFiled: March 2, 2013Publication date: January 8, 2015Inventors: Eiji Iwamura, Masaki Kobayashi, Yasutaka Morozumi, Naoya Takahashi
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Publication number: 20130276937Abstract: A principal object of the present invention is to provide a flux which can be used to produce a lead-free solder paste which is excellent in viscosity stability and exhibits excellent wettability at the time of soldering even in atmospheric air. The flux is a lead-free solder flux having a bromine atom concentration of 400 to 20000 ppm based on 0.1 g of the flux and comprising 0.01 to 0.7% by weight of an amine compound (a) represented by the general formula (1): H2N—(CH2)n—X—(CH2)n—NH2 (wherein n represents an integer of 1 to 6 and X represents —NH—CH2CH2—NH— or a piperazine residue).Type: ApplicationFiled: December 16, 2011Publication date: October 24, 2013Applicant: Arakawa Chemical Industries, Ltd.Inventors: Natsuki Kubo, Eiji Iwamura
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Patent number: 8323752Abstract: The present invention provides a novel carbon-based material in which carbons different in property are combined in such a manner as to be applicable to a device. The carbon-based thin film provides a carbon-based thin film 10 including first phases 1 that contain amorphous carbon and extend in a film thickness direction, and a second phase 2 that contains a graphite structure and intervenes between the first phases 1. In the thin film, at least one selected from the group consisting of the following a) to e) is satisfied: a) the second phase contains more graphite structures per unit volume than the first phases; b) a density of the second phase is larger than that of the first phases; c) an electric resistivity of the second phase is lower than that of the first phases; d) an elastic modulus of the second phase is higher than that of the first phases; and e) in the second phase, a basal plane of the graphite structure is oriented along the film thickness direction.Type: GrantFiled: February 25, 2005Date of Patent: December 4, 2012Assignee: Japan Science and Technology AgencyInventor: Eiji Iwamura
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Publication number: 20120291922Abstract: A solder paste according to an aspect of the invention includes, within a flux, an activator that has a dibasic acid with a molecular weight of 250 or less, a monobasic acid with a molecular weight of 150 or greater and 300 or less, and a dibasic acid with a molecular weight of 300 or greater and 600 or less; and at least one resin additive selected from the group consisting of high-density polyethylenes and polypropylenes. The solder paste has the resin additive in an amount of 4% by weight or greater and 12% by weight or less when the total amount of the flux is taken as 100% by weight, and has a viscosity of 400 Pa·s or greater at 80° C.Type: ApplicationFiled: December 6, 2010Publication date: November 22, 2012Applicants: ARAKAWA CHEMICAL INDUSTRIES, LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA, HARIMA CHEMICALS, INC., FUJITSU TEN LIMITED, KOKI COMPANY LIMITED, DENSO CORPORATIONInventors: Eiji Iwamura, Kazushi Gotoh, Fumio Ishiga, Takayasu Yoshioka, Masayoshi Utsuno, Atsuo Nakamura, Teruo Okochi, Masaki Sanji, Takuji Sukekawa, Kenshi Ikedo, Yoshiyuki Andoh, Takeshi Shirai, Kimiaki Mori, Rie Wada, Kensuke Nakanishi, Masami Aihara, Seishi Kumamoto
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Publication number: 20120291921Abstract: A flux for a solder paste according to an aspect of the invention includes an acrylic resin obtained by radically copolymerizing a (meth)acrylate having a C6-C15 alkyl group and a (meth)acrylate other than the above-mentioned (meth)acrylate; and rosins. The weight ratio of the acrylic resin is 0.5 or greater and 1.2 or less when the weight of the rosins is taken as 1, and the flux for a solder paste is fluidized by application of a shear force of 10 Pa or greater and 150 Pa or less.Type: ApplicationFiled: December 6, 2010Publication date: November 22, 2012Applicants: ARAKAWA CHEMICAL INDUSTRIES, LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA, HARIMA CHEMICALS, INC., FUJITSU TEN LIMITED, KOKI COMPANY LIMITED, DENSO CORPORATIONInventors: Eiji Iwamura, Kazushi Gotoh, Shinsuke Nagasaka, Takayasu Yoshioka, Masayoshi Utsuno, Atsuo Nakamura, Teruo Okochi, Masaki Sanji, Takuji Sukekawa, Kenshi Ikedo, Yoshiyuki Andoh, Takeshi Shirai, Kimiaki Mori, Rie Wada, Kensuke Nakanishi, Masami Aihara, Seishi Kumamoto
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Patent number: 8178471Abstract: There are provided hydrogen storage materials comprising a first region composed primarily of an amorphous carbon containing at least one metal element selected from the group consisting of Ti, Zr, Hf and Y, and a second region composed primarily of an amorphous carbon having a density lower than that of the first region.Type: GrantFiled: January 22, 2004Date of Patent: May 15, 2012Assignee: Japan Science and Technology AgencyInventor: Eiji Iwamura
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Publication number: 20060014638Abstract: There are provided hydrogen storage materials comprising a first region composed primarily of an amorphous carbon containing at least one metal element selected from the group consisting of Ti, Zr, Hf and Y, and a second region composed primarily of an amorphous carbon having a density lower than that of the first region.Type: ApplicationFiled: January 22, 2004Publication date: January 19, 2006Inventor: Eiji Iwamura
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Patent number: 6815962Abstract: There is provided an electric connection-inspection device which does not impair a freedom of selection of using materials from a viewpoint of restriction in terms of product's function with the aptitude of electric features of electric resistance and physical properties of internal stress, and restriction in terms of manufacture as to the appropriation or not of employment of a plating method, and which has a fine construction provided with the excellent durability that an electrode element is hard to adhere and coagulate.Type: GrantFiled: August 13, 2002Date of Patent: November 9, 2004Assignees: Kabushiki Kaisha Kobe Seiko Sho, Genesis Technology Inc.Inventors: Takayuki Hirano, Yasuji Yoneda, Hiroshi Gotoh, Eiji Iwamura, Susumu Takeuchi
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Patent number: 6716540Abstract: A multilayer film formed body comprises an outermost layer comprising a diamondlike carbon film, a substrate comprising an iron material, and an intermediate layer comprising a first layer on the substrate side, and a second layer on the outermost layer side. The first layer comprises at least either metal of Cr and Al, and a second layer comprises an amorphous layer including carbon and at least either metal of Cr and Al. The second layer has a gradient structure where the metal decreases as the position becomes closer to the outermost layer. The hardness of the second layer increases stepwise or continuously as the position becomes closer to the outermost layer. The hardness of the second layer close to the first layer is close to the hardness of the first layer. The hardness of the second layer close to the outermost layer is close to the hardness of the outermost layer.Type: GrantFiled: March 5, 2002Date of Patent: April 6, 2004Assignee: Kabushiki Kaisha Kobe Seiko ShoInventors: Toshimitsu Kohara, Koichiro Akari, Eiji Iwamura
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Patent number: 6599492Abstract: An onion-like carbon thin film is provided which contains carbon as a main component, has a film thickness of at least 20 nm or more, and has clusters of an onion-like structure. Specifically, there is provided the onion-like carbon thin film satisfying the foregoing requirements, and in which (1) at least 20 or more clusters each having a diameter of 4 nm or more, and having an onion-like structure are contained per 0.001 &mgr;m2; or (2) the proportion of clusters each having an onion-like structure in a matrix is at least 50% by volume or more. The onion-like carbon thin film of the present invention is very useful in terms of availability in various industrial fields as a hard protective film or a solid lubricating film of the surface in various machine parts, electronic parts, and the like, or as a field electron emission material, or the like, an electronic part of a field emission display, or the like.Type: GrantFiled: March 28, 2001Date of Patent: July 29, 2003Assignee: Kobe Steel, Ltd.Inventors: Eiji Iwamura, Takashi Kinoshita
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Patent number: 6562445Abstract: A coating film and a coated machine component that have an excellent wear resistance, a low friction coefficient, and an excellent sliding performance are provided. A coating film of the present invention is a DLC hard multilayer film 3 which has a low hardness hard carbon layer 4 containing a graphite cluster having a mean size of 2 nm or more, and a high hardness hard carbon layer 5 containing a graphite cluster having a mean size of 1 nm or less, the low hardness carbon layer 4 and the high hardness carbon layer 5 being amorphous structures each containing carbon as a main component, and being alternately laminated. The graphite cluster in the low hardness hard carbon layer 4 preferably has a shell structure in which the C-planes of graphite are laminated in the form of spherical nuclei. Further, it is preferable that the outermost layer A is formed of the low hardness hard carbon layer, and the layer thickness thereof is set at from 2 nm to 200 nm.Type: GrantFiled: March 21, 2001Date of Patent: May 13, 2003Assignee: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)Inventor: Eiji Iwamura
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Publication number: 20030034782Abstract: There is provided an electric connection-inspection device which does not impair a freedom of selection of using materials from a viewpoint of restriction in terms of product's function with the aptitude of electric features of electric resistance and physical properties of internal stress, and restriction in terms of manufacture as to the appropriation or not of employment of a plating method, and which has a fine construction provided with the excellent durability that an electrode element is hard to adhere and coagulate.Type: ApplicationFiled: August 13, 2002Publication date: February 20, 2003Inventors: Takayuki Hirano, Yasuji Yoneda, Hiroshi Gotoh, Eiji Iwamura, Susumu Takeuchi
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Publication number: 20020136895Abstract: A multilayer film formed body comprises an outermost layer comprising a diamondlike carbon film, a substrate comprising an iron material, and an intermediate layer comprising a first layer on the substrate side, and a second layer on the outermost layer side. The first layer comprises at least either metal of Cr and Al, and a second layer comprises an amorphous layer including carbon and at least either metal of Cr and Al. The second layer has a gradient structure where the metal decreases as the position becomes closer to the outermost layer. The hardness of the second layer increases stepwise or continuously as the position becomes closer to the outermost layer. The hardness of the second layer close to the first layer is close to the hardness of the first layer. The hardness of the second layer close to the outermost layer is close to the hardness of the outermost layer.Type: ApplicationFiled: March 5, 2002Publication date: September 26, 2002Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd)Inventors: Toshimitsu Kohara, Koichiro Akari, Eiji Iwamura
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Patent number: RE43590Abstract: Disclosed is an electrode for semiconductor devices capable of suppressing the generation of hillocks and reducing the resistivity, which is suitable for an active matrixed liquid crystal display and the like in which a thin film transistor is used; its fabrication method; and a sputtering target for forming the electrode film for semiconductor devices. The electrode for semiconductor devices is made of an Al alloy containing the one or more alloying elements selected from Fe, Co, Ni, Ru, Rh and Ir, in a total amount from 0.1 to 10 At %, or one or more alloying elements selected from rare earth elements, in a total amount from 0.05 to 15 at %.Type: GrantFiled: May 9, 2006Date of Patent: August 21, 2012Assignee: Kobelco Research Institute, Inc.Inventors: Seigo Yamamoto, Katsutoshi Takagi, Eiji Iwamura, Kazuo Yoshikawa, Takashi Oonishi
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Patent number: RE44239Abstract: Disclosed is an electrode for semiconductor devices capable of suppressing the generation of hillocks and reducing the resistivity, which is suitable for an active matrixed liquid crystal display and the like in which a thin film transistor is used; its fabrication method; and a sputtering target for forming the electrode film for semiconductor devices. The electrode for semiconductor devices is made of an Al alloy containing the one or more alloying elements selected from Fe, Co, Ni, Ru, Rh and Ir, in a total amount from 0.1 to 10 At %, or one or more alloying elements selected from rare earth elements, in a total amount from 0.05 to 15 at %.Type: GrantFiled: May 9, 2006Date of Patent: May 28, 2013Assignee: Kobelco Research Institute, Inc.Inventors: Seigo Yamamoto, Katsutoshi Takagi, Eiji Iwamura, Kazuo Yoshikawa, Takashi Oonishi