Patents by Inventor Eiji Manabe

Eiji Manabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11791182
    Abstract: A measuring method includes measuring a displacement A1, placing an imaging unit 20 at a position where the imaging unit is allowed to image a measurement mark MI and imaging the measurement mark M1. In the measuring of the displacement A1, the displacement A1 of a surface of a combined substrate, which is composed of two sheets of substrates bonded to each other, on a side of the imaging unit 20 at a position where the measurement mark M1 for position deviation measurement, which is provided within the combined substrate, is placed is measured. In the imaging of the measurement mark M1, the measurement mark M1 is imaged by the imaging unit 20 while putting the measurement mark M1 in focus by moving a focal position back and forth with respect to a focal position which is previously set based on the displacement A1.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: October 17, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuji Mimura, Shigeto Tsuruta, Eiji Manabe, Hisanori Hizume
  • Publication number: 20220415673
    Abstract: A bonding system includes a bonding device, an inspection device and a controller. The bonding device forms a combined substrate by bonding a first substrate and a second substrate to each other. The inspection device inspects the combined substrate. The controller controls the inspection device. The controller includes a measurement controller, a comparison unit and a re-measurement controller. The measurement controller causes the inspection device to measure the combined substrate at a first number of measurement points. The comparison unit compares, with a reference, an inspection result including a deviation amount between the first substrate and the second substrate in the combined substrate based on a measurement result. The re-measurement controller causes the inspection device to re-measure the combined substrate at a second number of measurement points greater than the first number of measurement points based on a comparison result obtained by the comparison unit.
    Type: Application
    Filed: September 28, 2020
    Publication date: December 29, 2022
    Inventors: Yoshitaka Otsuka, Shigeto Tsuruta, Yuji Mimura, Hiroshi Maeda, Eiji Manabe, Hisanori Hizume, Shinichi Shinozuka, Hironori Tanoue
  • Publication number: 20210249287
    Abstract: A measuring method includes measuring a displacement A1, placing an imaging unit 20 at a position where the imaging unit is allowed to image a measurement mark M1 and imaging the measurement mark M1. In the measuring of the displacement A1, the displacement A1 of a surface of a combined substrate, which is composed of two sheets of substrates bonded to each other, on a side of the imaging unit 20 at a position where the measurement mark M1 for position deviation measurement, which is provided within the combined substrate, is placed is measured. In the imaging of the measurement mark M1, the measurement mark M1 is imaged by the imaging unit 20 while putting the measurement mark M1 in focus by moving a focal position back and forth with respect to a focal position which is previously set based on the displacement A1.
    Type: Application
    Filed: April 10, 2019
    Publication date: August 12, 2021
    Inventors: Yuji Mimura, Shigeto Tsuruta, Eiji Manabe, Hisanori Hizume
  • Patent number: 9343349
    Abstract: In accordance with some embodiments of the present disclosure, a substrate holding apparatus is provided. The substrate holding apparatus includes a first holding part, a second holding part and a controller. The first holding part adsorbs and holds a first region including a central portion of a substrate. The second holding part adsorbs and holds a second region located outside the first region of the substrate. The second holding part adsorbs and holds the second region of the substrate after the first holding part adsorbs and holds the first region of the substrate.
    Type: Grant
    Filed: April 3, 2013
    Date of Patent: May 17, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yasuharu Iwashita, Osamu Hirakawa, Eiji Manabe, Takeshi Tamura, Akira Fukutomi
  • Publication number: 20140284000
    Abstract: A separation apparatus for separating a superposed substrate into a processing target substrate and a supporting substrate, includes: one holding part holding the processing target substrate via a tape; another holding part holding the supporting substrate; and a moving mechanism moving the another holding part in a vertical direction while holding an outer peripheral portion thereof to continuously separate the supporting substrate held by the another holding part from the processing target substrate held by the one holding part starting from an outer peripheral portion toward a central portion of the supporting substrate, wherein the moving mechanism includes: a first moving part holding the another holding part and moving only the outer peripheral portion of the another holding part in the vertical direction; and a second moving part moving the first moving part and the another holding part in the vertical direction.
    Type: Application
    Filed: June 10, 2014
    Publication date: September 25, 2014
    Inventors: Yasutaka SOMA, Naoto YOSHITAKA, Hiroshi KOMEDA, Eiji MANABE, Osamu HIRAKAWA, Masatoshi DEGUCHI, Takeshi TAMURA
  • Publication number: 20130264780
    Abstract: In accordance with some embodiments of the present disclosure, a substrate holding apparatus is provided. The substrate holding apparatus includes a first holding part, a second holding part and a controller. The first holding part adsorbs and holds a first region including a central portion of a substrate. The second holding part adsorbs and holds a second region located outside the first region of the substrate. The second holding part adsorbs and holds the second region of the substrate after the first holding part adsorbs and holds the first region of the substrate.
    Type: Application
    Filed: April 3, 2013
    Publication date: October 10, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yasuharu IWASHITA, Osamu HIRAKAWA, Eiji MANABE, Takeshi TAMURA, Akira FUKUTOMI
  • Publication number: 20130000684
    Abstract: A cleaning method of cleaning a joint surface of a processing target substrate separated from a superposed substrate, while the processing target substrate is placed inside an annular frame and held by a tape bonded to a surface of the frame and a non-joint surface of the processing target substrate, the cleaning method including: a placement step of placing a cleaning jig to face the processing target substrate such that a supply surface of the cleaning jig for supplying a solvent for the adhesive onto the joint surface of the processing target substrate covers the joint surface and a distance between the supply surface and the joint surface is a predetermined distance; and a cleaning step of then supplying the solvent between the supply surface and the joint surface and diffusing the supplied solvent over the joint surface by a surface tension.
    Type: Application
    Filed: June 15, 2012
    Publication date: January 3, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yasutaka SOMA, Naoto Yoshitaka, Hiroshi Komeda, Eiji Manabe, Osamu Hirakawa, Masatoshi Deguchi, Takeshi Tamura