Patents by Inventor Eiji Matsumoto
Eiji Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9560488Abstract: A BAN system includes multiple terminal apparatuses connected by wireless communication, where a terminal apparatus of the multiple terminal apparatuses is configured to identify in which direction acceleration has changed, the direction being identified based on a measurement result of a sensor of the terminal apparatus, the sensor being configured to measure acceleration; and to refer to information that specifies corresponding to places where the plurality of terminal apparatuses is to be attached to a body, directions in which acceleration changes when the body performs a given behavior, and determines based on the identified direction, a place where the terminal apparatus is attached to the body.Type: GrantFiled: June 26, 2015Date of Patent: January 31, 2017Assignee: FUJITSU LIMITEDInventors: Toshihiro Kunitake, Hiroki Akano, Yuki Iwamasa, Eiji Matsumoto, Ichirou Ida, Tatsuya Kikuzuki, Kazumi Kasai, Teruhisa Ninomiya
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Patent number: 9542586Abstract: A pattern inspection method according to one aspect of the present invention includes generating a first positional deviation amount map by using data acquired by a pre-scan, generating a second positional deviation amount map by using data acquired by a full scan, generating a first positional deviation difference map by calculating a difference between the first positional deviation amount map and the second positional deviation amount map, generating a third positional deviation amount map from the first positional deviation difference map and the second positional deviation amount map, and judging existence of a value exceeding an allowable value, in values defined by the third positional deviation amount map.Type: GrantFiled: August 13, 2012Date of Patent: January 10, 2017Assignee: NuFlare Technology, Inc.Inventors: Eiji Matsumoto, Nobutaka Kikuiri, Hideo Tsuchiya
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Publication number: 20160343553Abstract: Method of producing a target having a small average crystal grain size of gold or platinum and having a uniform crystal grain size in an in-plane direction of a target surface and a thickness direction of the target in order to further stabilize film deposition characteristics during sputtering.Type: ApplicationFiled: January 20, 2015Publication date: November 24, 2016Applicant: FURUYA METAL CO., LTD.Inventors: Tomohiro MARUKO, Yu SUZUKI, Shoji SAITO, Amiko ITO, Yusuke TAKAISHI, Nobuo KIKUCHI, Daishi KANEKO, Eiji MATSUMOTO
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Publication number: 20160236368Abstract: A multiple vegetable cutting apparatus having a simple configuration, being easy to be assembled, which, as a single apparatus, can be used with the specification being varied, depending upon the vegetable type, and the cutting way, thus being economical. The multiple vegetable cutting apparatus includes a main body, supported by a base; a receiving tray, installed on the main body for receiving and discharging a vegetable cut; a dish-like rotating disk, disposed inside of top face of the receiving tray and having a blade for cutting vegetables fed; a driving unit, incorporated in the main body for rotation-driving the rotating disk; a cover, having an adapter receiver in a location corresponding to the rotating disk, and covering the receiving tray; and a vegetable charging adapter, set inside the adapter receiver, and having plural forms of vegetable charging parts corresponding to the vegetable types and/or the cutting ways.Type: ApplicationFiled: March 6, 2015Publication date: August 18, 2016Inventor: Eiji Matsumoto
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Publication number: 20160139586Abstract: A numerical control device for controlling a first control axis configured to operate in shorter period than reference control period based on first input command input by a first external input device, wherein a movement command data calculation processing unit is configured to calculate a plurality of the movement command data commanding movement amount of axis to be moved by the first control axis during the reference control period and write the plurality of the movement command data in a first buffer in process of calculating the movement command data.Type: ApplicationFiled: November 18, 2015Publication date: May 19, 2016Inventors: Eiji MATSUMOTO, Keiichiro MIYAJIMA
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Publication number: 20160057582Abstract: A BAN system includes multiple terminal apparatuses connected by wireless communication, where a terminal apparatus of the multiple terminal apparatuses is configured to identify in which direction acceleration has changed, the direction being identified based on a measurement result of a sensor of the terminal apparatus, the sensor being configured to measure acceleration; and to refer to information that specifies corresponding to places where the plurality of terminal apparatuses is to be attached to a body, directions in which acceleration changes when the body performs a given behavior, and determines based on the identified direction, a place where the terminal apparatus is attached to the body.Type: ApplicationFiled: June 26, 2015Publication date: February 25, 2016Inventors: Toshihiro Kunitake, HIROKI AKANO, Yuki Iwamasa, Eiji Matsumoto, Ichirou Ida, Tatsuya Kikuzuki, Kazumi Kasai, Teruhisa Ninomiya
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Patent number: 9063233Abstract: An exposure management system includes dosimeters, wireless relay devices that wirelessly communicate with the dosimeters, and a monitoring device. The dosimeters are carried by workers for measuring exposure doses in a radiation management facility. The wireless relay devices transmit a monitor indication message that requests the dosimeters to provide respective responses that include information of measured exposure doses. The wireless relay devices receive the responses from the dosimeters by using allocated respective communication channels that are different from each other. Each dosimeter receives the monitoring indication message and generates a designated number of response times for providing a response to the monitor indication message, and determines a communication channel corresponding to each of the generated response times. The monitoring device is connected to the wireless relay devices for monitoring an exposure state of each of the workers through the wireless relay devices and dosimeters.Type: GrantFiled: January 29, 2009Date of Patent: June 23, 2015Assignee: FUJI ELECTRIC CO., LTD.Inventors: Eiji Matsumoto, Tetsuo Shibata, Minoru Imai
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Publication number: 20150172978Abstract: A base station apparatus acquires, when a handover from a first device in a base station apparatus to a second device in the base station apparatus occurs, handover source information related to data received by the first device after the handover. The base station apparatus calculates a time taken to transfer the data from the first device to the second device based on the acquired handover source information. The base station apparatus transfers the data during the calculated time.Type: ApplicationFiled: November 19, 2014Publication date: June 18, 2015Inventors: Kimihisa Akazawa, Eiji Matsumoto, Shinya TOKUYASU
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Patent number: 8861832Abstract: An inspection region of a mask is virtually divided by stripes, and a pattern on a position error correcting unit is also virtually divided by stripes. Then, a stage is moved such that all the stripes of both the mask and the position error correcting unit are continuously scanned, so that optical images of these stripes are acquired. Fluctuation values of position coordinates of the patterns formed on the position error correcting unit are acquired from the optical images of the position error correcting unit. Based upon the fluctuation values, fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask are obtained so that the position coordinates are corrected. Thereafter, a map is generated from the fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask.Type: GrantFiled: February 15, 2013Date of Patent: October 14, 2014Assignee: NuFlare Technology, Inc.Inventors: Takafumi Inoue, Eiji Matsumoto, Nobutaka Kikuiri, Ikunao Isomura
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Publication number: 20140045966Abstract: The photosensitive composition of the present invention includes: (1) a radical initiator (A); (2) an acid generator (B) and/or a base generator (C); and (3) a polymerizable substance (D), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) are to generate an active species (H) on exposure to active rays, the active species (H) reacting with the radical initiator (A), the acid generator (B) or the base generator (C) to generate another active species (I), the active species (I) initiating polymerization of the polymerizable substance (D), the active species (H) or (I) is an acid or a base, and the photosensitive composition contains substantially no colorants, metal oxide powder, or metallic powder.Type: ApplicationFiled: March 6, 2012Publication date: February 13, 2014Inventors: Shihei Motofuji, Shintaro Higuchi, Hironobu Tokunaga, Takao Mukai, Takeshi Otaka, Yusuke Mizuno, Yasuhiro Shindo, Eiji Matsumoto
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Publication number: 20130044205Abstract: A pattern inspection method according to one aspect of the present invention includes generating a first positional deviation amount map by using data acquired by a pre-scan, generating a second positional deviation amount map by using data acquired by a full scan, generating a first positional deviation difference map by calculating a difference between the first positional deviation amount map and the second positional deviation amount map, generating a third positional deviation amount map from the first positional deviation difference map and the second positional deviation amount map, and judging existence of a value exceeding an allowable value, in values defined by the third positional deviation amount map.Type: ApplicationFiled: August 13, 2012Publication date: February 21, 2013Applicant: NuFlare Technology, Inc.Inventors: Eiji Matsumoto, Nobutaka Kikuiri, Hideo Tsuchiya
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Publication number: 20110063127Abstract: An exposure management system includes dosimeters, wireless relay devices that wirelessly communicate with the dosimeters, and a monitoring device. The dosimeters are carried by workers for measuring exposure doses in a radiation management facility. The wireless relay devices transmit a monitor indication message that requests the dosimeters to provide respective responses that include information of measured exposure doses. The wireless relay devices receive the responses from the dosimeters by using allocated respective communication channels that are different from each other. Each dosimeter receives the monitoring indication message and generates a designated number of response times for providing a response to the monitor indication message, and determines a communication channel corresponding to each of the generated response times. The monitoring device is connected to the wireless relay devices for monitoring an exposure state of each of the workers through the wireless relay devices and dosimeters.Type: ApplicationFiled: January 29, 2009Publication date: March 17, 2011Applicant: FUJI ELECTRIC SYSTEMS CO., LTD.Inventors: Eiji Matsumoto, Tetsuo Shibata, Minoru Imai
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Publication number: 20100297783Abstract: A method for performing a plasma process using a plasma processing apparatus which includes a vacuum process chamber, an exhaust device, a mass flow controller supplying a process gas, a stage electrode which receives and holds a workpiece by adsorption, a transfer device, and a high-frequency electrical source. The method includes a first step of performing the plasma process for the workpiece in the vacuum process chamber by a corresponding recipe of predetermined recipes, a second step of acquiring apparatus parameters showing the condition of the plasma processing apparatus when a specific recipe of the predetermined recipes is executed to diagnose whether the condition of the plasma processing apparatus is good or not based on the acquired apparatus parameters.Type: ApplicationFiled: August 3, 2010Publication date: November 25, 2010Inventors: Shoji IKUHARA, Daisuke Shiraishi, Hideyuki Yamamoto, Akira Kagoshima, Hiromichi Enami, Yosuke Karashima, Eiji Matsumoto
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Publication number: 20100288730Abstract: The invention provides a vacuum processing chamber comprising a particle removing function and capable of improving the yield and process efficiency for processing samples.Type: ApplicationFiled: July 27, 2010Publication date: November 18, 2010Inventors: Toru Ito, Kotaro Fujimoto, Eiji Matsumoto, Atsushi Yoshida, Kouta Tanaka
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Publication number: 20100132888Abstract: A plasma processing apparatus includes a plasma processing main frame, and an apparatus controller controlling the plasma processing main frame. The plasma processing main frame has a vacuum process chamber, an exhaust device, a mass flow controller, a stage electrode receiving a workpiece, a high-frequency electrical source to, and a transfer device placing the workpiece on the stage electrode and carrying out the processed workpiece. The apparatus controller controls the plasma processing main frame in accordance with a predetermined procedure and is provided with a diagnosis device which acquires a plurality of recipes for processing workpieces carried in the chamber and apparatus parameters of the plasma processing apparatus when a specific recipe of the above recipes is executed, whereby the condition of the plasma processing main frame is diagnosed based on the acquired apparatus parameters.Type: ApplicationFiled: February 3, 2010Publication date: June 3, 2010Inventors: Shoji IKUHARA, Daisuke Shiraishi, Hideyuki Yamamoto, Akira Kagoshima, Hiromichi Enami, Yosuke Karashima, Eiji Matsumoto
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Publication number: 20080170970Abstract: The invention provides a vacuum processing chamber comprising a particle removing function and capable of improving the yield and process efficiency for processing samples.Type: ApplicationFiled: July 3, 2007Publication date: July 17, 2008Inventors: Toru Ito, Kotaro Fujimoto, Eiji Matsumoto, Atsushi Yoshida, Kouta Tanaka
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Publication number: 20060260746Abstract: There is provided a preventive maintenance technique capable of diagnosing apparatus conditions without causing serious decrease in uptime ratio. A plasma process apparatus is composed of a plasma processing main frame, and an apparatus controller controlling the plasma processing main frame. The plasma processing main frame has a vacuum process chamber, an exhaust device evacuating the vacuum process chamber, a mass flow controller supplying a process gas into the vacuum process chamber, a stage electrode receiving a workpiece and holding it by adsorption, a high-frequency electrical source applying a high-frequency electrical power to the supplied process gas to generate plasma, and a transfer device placing the workpiece on the stage electrode and carrying out the processed workpiece.Type: ApplicationFiled: August 9, 2005Publication date: November 23, 2006Inventors: Shoji Ikuhara, Daisuke Shiraishi, Hideyuki Yamamoto, Akira Kagoshima, Hiromichi Enami, Yosuke Karashima, Eiji Matsumoto
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Publication number: 20060118668Abstract: There is provided a vegetable cutting device that is capable of grating and other cutting processings, requires no manual operation after supplying vegetables into the device, and can automatically and efficiently grate or cut vegetables without wasting materials. The device includes: a rotor 14 that radially guides a supplied vegetable by centrifugal force; a toothed cutter cylinder 7 that has toothed cutter blades 31 and 32 and passing-through holes 30 for a processed vegetable in an inner peripheral surface thereof and surrounds the rotor 14 with a slight gap; and a collecting portion 5 having a cover that surrounds the toothed cutter cylinder 7 and is arranged outside the toothed cutter cylinder 7 with a processed vegetable discharge space for receiving the vegetable discharged from the passing-through holes 30.Type: ApplicationFiled: December 3, 2004Publication date: June 8, 2006Inventor: Eiji Matsumoto
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Patent number: 6890966Abstract: In a process for the production of a lightweight cold urethane wherein raw materials are injected into a mold in one shot, diethanolamine is added in an amount of 0.1 to 2.0 parts by weight per 100 parts by weight of the polyol. When principal raw materials including a polyol and an isocyanate, and an auxiliary ingredient mixture prepared by previously mixing auxiliary ingredients other than the polyol and the isocyanate, are injected into a mold from separate storage vessels, a water-soluble silicone foam stabilizer is added to the auxiliary ingredient mixture.Type: GrantFiled: May 10, 2002Date of Patent: May 10, 2005Assignee: Suzuki Motor CorporationInventors: Masahiko Ando, Eiji Matsumoto
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Publication number: 20050078698Abstract: A multicast communication apparatus 1 has a multicast processing unit 11 to transmit by multicast one or a plurality of data to a plurality of receiving terminals 3, a retransmission request receiving unit 12 to receive a request for retransmission which specifies at least one data out of the one or the plurality of data transmitted by the multicast and which is transmitted by unicast from any one of the plurality of receiving terminals 3, and a retransmission processing unit 13 to transmit by the unicast the specified data in the request for retransmission to the any one of the plurality of receiving terminals 3 which transmitted the request for retransmission.Type: ApplicationFiled: January 24, 2003Publication date: April 14, 2005Inventors: Yoshinobu Araya, Eiji Matsumoto