Patents by Inventor Eiji Matsumoto

Eiji Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9560488
    Abstract: A BAN system includes multiple terminal apparatuses connected by wireless communication, where a terminal apparatus of the multiple terminal apparatuses is configured to identify in which direction acceleration has changed, the direction being identified based on a measurement result of a sensor of the terminal apparatus, the sensor being configured to measure acceleration; and to refer to information that specifies corresponding to places where the plurality of terminal apparatuses is to be attached to a body, directions in which acceleration changes when the body performs a given behavior, and determines based on the identified direction, a place where the terminal apparatus is attached to the body.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: January 31, 2017
    Assignee: FUJITSU LIMITED
    Inventors: Toshihiro Kunitake, Hiroki Akano, Yuki Iwamasa, Eiji Matsumoto, Ichirou Ida, Tatsuya Kikuzuki, Kazumi Kasai, Teruhisa Ninomiya
  • Patent number: 9542586
    Abstract: A pattern inspection method according to one aspect of the present invention includes generating a first positional deviation amount map by using data acquired by a pre-scan, generating a second positional deviation amount map by using data acquired by a full scan, generating a first positional deviation difference map by calculating a difference between the first positional deviation amount map and the second positional deviation amount map, generating a third positional deviation amount map from the first positional deviation difference map and the second positional deviation amount map, and judging existence of a value exceeding an allowable value, in values defined by the third positional deviation amount map.
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: January 10, 2017
    Assignee: NuFlare Technology, Inc.
    Inventors: Eiji Matsumoto, Nobutaka Kikuiri, Hideo Tsuchiya
  • Publication number: 20160343553
    Abstract: Method of producing a target having a small average crystal grain size of gold or platinum and having a uniform crystal grain size in an in-plane direction of a target surface and a thickness direction of the target in order to further stabilize film deposition characteristics during sputtering.
    Type: Application
    Filed: January 20, 2015
    Publication date: November 24, 2016
    Applicant: FURUYA METAL CO., LTD.
    Inventors: Tomohiro MARUKO, Yu SUZUKI, Shoji SAITO, Amiko ITO, Yusuke TAKAISHI, Nobuo KIKUCHI, Daishi KANEKO, Eiji MATSUMOTO
  • Publication number: 20160236368
    Abstract: A multiple vegetable cutting apparatus having a simple configuration, being easy to be assembled, which, as a single apparatus, can be used with the specification being varied, depending upon the vegetable type, and the cutting way, thus being economical. The multiple vegetable cutting apparatus includes a main body, supported by a base; a receiving tray, installed on the main body for receiving and discharging a vegetable cut; a dish-like rotating disk, disposed inside of top face of the receiving tray and having a blade for cutting vegetables fed; a driving unit, incorporated in the main body for rotation-driving the rotating disk; a cover, having an adapter receiver in a location corresponding to the rotating disk, and covering the receiving tray; and a vegetable charging adapter, set inside the adapter receiver, and having plural forms of vegetable charging parts corresponding to the vegetable types and/or the cutting ways.
    Type: Application
    Filed: March 6, 2015
    Publication date: August 18, 2016
    Inventor: Eiji Matsumoto
  • Publication number: 20160139586
    Abstract: A numerical control device for controlling a first control axis configured to operate in shorter period than reference control period based on first input command input by a first external input device, wherein a movement command data calculation processing unit is configured to calculate a plurality of the movement command data commanding movement amount of axis to be moved by the first control axis during the reference control period and write the plurality of the movement command data in a first buffer in process of calculating the movement command data.
    Type: Application
    Filed: November 18, 2015
    Publication date: May 19, 2016
    Inventors: Eiji MATSUMOTO, Keiichiro MIYAJIMA
  • Publication number: 20160057582
    Abstract: A BAN system includes multiple terminal apparatuses connected by wireless communication, where a terminal apparatus of the multiple terminal apparatuses is configured to identify in which direction acceleration has changed, the direction being identified based on a measurement result of a sensor of the terminal apparatus, the sensor being configured to measure acceleration; and to refer to information that specifies corresponding to places where the plurality of terminal apparatuses is to be attached to a body, directions in which acceleration changes when the body performs a given behavior, and determines based on the identified direction, a place where the terminal apparatus is attached to the body.
    Type: Application
    Filed: June 26, 2015
    Publication date: February 25, 2016
    Inventors: Toshihiro Kunitake, HIROKI AKANO, Yuki Iwamasa, Eiji Matsumoto, Ichirou Ida, Tatsuya Kikuzuki, Kazumi Kasai, Teruhisa Ninomiya
  • Patent number: 9063233
    Abstract: An exposure management system includes dosimeters, wireless relay devices that wirelessly communicate with the dosimeters, and a monitoring device. The dosimeters are carried by workers for measuring exposure doses in a radiation management facility. The wireless relay devices transmit a monitor indication message that requests the dosimeters to provide respective responses that include information of measured exposure doses. The wireless relay devices receive the responses from the dosimeters by using allocated respective communication channels that are different from each other. Each dosimeter receives the monitoring indication message and generates a designated number of response times for providing a response to the monitor indication message, and determines a communication channel corresponding to each of the generated response times. The monitoring device is connected to the wireless relay devices for monitoring an exposure state of each of the workers through the wireless relay devices and dosimeters.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: June 23, 2015
    Assignee: FUJI ELECTRIC CO., LTD.
    Inventors: Eiji Matsumoto, Tetsuo Shibata, Minoru Imai
  • Publication number: 20150172978
    Abstract: A base station apparatus acquires, when a handover from a first device in a base station apparatus to a second device in the base station apparatus occurs, handover source information related to data received by the first device after the handover. The base station apparatus calculates a time taken to transfer the data from the first device to the second device based on the acquired handover source information. The base station apparatus transfers the data during the calculated time.
    Type: Application
    Filed: November 19, 2014
    Publication date: June 18, 2015
    Inventors: Kimihisa Akazawa, Eiji Matsumoto, Shinya TOKUYASU
  • Patent number: 8861832
    Abstract: An inspection region of a mask is virtually divided by stripes, and a pattern on a position error correcting unit is also virtually divided by stripes. Then, a stage is moved such that all the stripes of both the mask and the position error correcting unit are continuously scanned, so that optical images of these stripes are acquired. Fluctuation values of position coordinates of the patterns formed on the position error correcting unit are acquired from the optical images of the position error correcting unit. Based upon the fluctuation values, fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask are obtained so that the position coordinates are corrected. Thereafter, a map is generated from the fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: October 14, 2014
    Assignee: NuFlare Technology, Inc.
    Inventors: Takafumi Inoue, Eiji Matsumoto, Nobutaka Kikuiri, Ikunao Isomura
  • Publication number: 20140045966
    Abstract: The photosensitive composition of the present invention includes: (1) a radical initiator (A); (2) an acid generator (B) and/or a base generator (C); and (3) a polymerizable substance (D), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) are to generate an active species (H) on exposure to active rays, the active species (H) reacting with the radical initiator (A), the acid generator (B) or the base generator (C) to generate another active species (I), the active species (I) initiating polymerization of the polymerizable substance (D), the active species (H) or (I) is an acid or a base, and the photosensitive composition contains substantially no colorants, metal oxide powder, or metallic powder.
    Type: Application
    Filed: March 6, 2012
    Publication date: February 13, 2014
    Inventors: Shihei Motofuji, Shintaro Higuchi, Hironobu Tokunaga, Takao Mukai, Takeshi Otaka, Yusuke Mizuno, Yasuhiro Shindo, Eiji Matsumoto
  • Publication number: 20130044205
    Abstract: A pattern inspection method according to one aspect of the present invention includes generating a first positional deviation amount map by using data acquired by a pre-scan, generating a second positional deviation amount map by using data acquired by a full scan, generating a first positional deviation difference map by calculating a difference between the first positional deviation amount map and the second positional deviation amount map, generating a third positional deviation amount map from the first positional deviation difference map and the second positional deviation amount map, and judging existence of a value exceeding an allowable value, in values defined by the third positional deviation amount map.
    Type: Application
    Filed: August 13, 2012
    Publication date: February 21, 2013
    Applicant: NuFlare Technology, Inc.
    Inventors: Eiji Matsumoto, Nobutaka Kikuiri, Hideo Tsuchiya
  • Publication number: 20110063127
    Abstract: An exposure management system includes dosimeters, wireless relay devices that wirelessly communicate with the dosimeters, and a monitoring device. The dosimeters are carried by workers for measuring exposure doses in a radiation management facility. The wireless relay devices transmit a monitor indication message that requests the dosimeters to provide respective responses that include information of measured exposure doses. The wireless relay devices receive the responses from the dosimeters by using allocated respective communication channels that are different from each other. Each dosimeter receives the monitoring indication message and generates a designated number of response times for providing a response to the monitor indication message, and determines a communication channel corresponding to each of the generated response times. The monitoring device is connected to the wireless relay devices for monitoring an exposure state of each of the workers through the wireless relay devices and dosimeters.
    Type: Application
    Filed: January 29, 2009
    Publication date: March 17, 2011
    Applicant: FUJI ELECTRIC SYSTEMS CO., LTD.
    Inventors: Eiji Matsumoto, Tetsuo Shibata, Minoru Imai
  • Publication number: 20100297783
    Abstract: A method for performing a plasma process using a plasma processing apparatus which includes a vacuum process chamber, an exhaust device, a mass flow controller supplying a process gas, a stage electrode which receives and holds a workpiece by adsorption, a transfer device, and a high-frequency electrical source. The method includes a first step of performing the plasma process for the workpiece in the vacuum process chamber by a corresponding recipe of predetermined recipes, a second step of acquiring apparatus parameters showing the condition of the plasma processing apparatus when a specific recipe of the predetermined recipes is executed to diagnose whether the condition of the plasma processing apparatus is good or not based on the acquired apparatus parameters.
    Type: Application
    Filed: August 3, 2010
    Publication date: November 25, 2010
    Inventors: Shoji IKUHARA, Daisuke Shiraishi, Hideyuki Yamamoto, Akira Kagoshima, Hiromichi Enami, Yosuke Karashima, Eiji Matsumoto
  • Publication number: 20100288730
    Abstract: The invention provides a vacuum processing chamber comprising a particle removing function and capable of improving the yield and process efficiency for processing samples.
    Type: Application
    Filed: July 27, 2010
    Publication date: November 18, 2010
    Inventors: Toru Ito, Kotaro Fujimoto, Eiji Matsumoto, Atsushi Yoshida, Kouta Tanaka
  • Publication number: 20100132888
    Abstract: A plasma processing apparatus includes a plasma processing main frame, and an apparatus controller controlling the plasma processing main frame. The plasma processing main frame has a vacuum process chamber, an exhaust device, a mass flow controller, a stage electrode receiving a workpiece, a high-frequency electrical source to, and a transfer device placing the workpiece on the stage electrode and carrying out the processed workpiece. The apparatus controller controls the plasma processing main frame in accordance with a predetermined procedure and is provided with a diagnosis device which acquires a plurality of recipes for processing workpieces carried in the chamber and apparatus parameters of the plasma processing apparatus when a specific recipe of the above recipes is executed, whereby the condition of the plasma processing main frame is diagnosed based on the acquired apparatus parameters.
    Type: Application
    Filed: February 3, 2010
    Publication date: June 3, 2010
    Inventors: Shoji IKUHARA, Daisuke Shiraishi, Hideyuki Yamamoto, Akira Kagoshima, Hiromichi Enami, Yosuke Karashima, Eiji Matsumoto
  • Publication number: 20080170970
    Abstract: The invention provides a vacuum processing chamber comprising a particle removing function and capable of improving the yield and process efficiency for processing samples.
    Type: Application
    Filed: July 3, 2007
    Publication date: July 17, 2008
    Inventors: Toru Ito, Kotaro Fujimoto, Eiji Matsumoto, Atsushi Yoshida, Kouta Tanaka
  • Publication number: 20060260746
    Abstract: There is provided a preventive maintenance technique capable of diagnosing apparatus conditions without causing serious decrease in uptime ratio. A plasma process apparatus is composed of a plasma processing main frame, and an apparatus controller controlling the plasma processing main frame. The plasma processing main frame has a vacuum process chamber, an exhaust device evacuating the vacuum process chamber, a mass flow controller supplying a process gas into the vacuum process chamber, a stage electrode receiving a workpiece and holding it by adsorption, a high-frequency electrical source applying a high-frequency electrical power to the supplied process gas to generate plasma, and a transfer device placing the workpiece on the stage electrode and carrying out the processed workpiece.
    Type: Application
    Filed: August 9, 2005
    Publication date: November 23, 2006
    Inventors: Shoji Ikuhara, Daisuke Shiraishi, Hideyuki Yamamoto, Akira Kagoshima, Hiromichi Enami, Yosuke Karashima, Eiji Matsumoto
  • Publication number: 20060118668
    Abstract: There is provided a vegetable cutting device that is capable of grating and other cutting processings, requires no manual operation after supplying vegetables into the device, and can automatically and efficiently grate or cut vegetables without wasting materials. The device includes: a rotor 14 that radially guides a supplied vegetable by centrifugal force; a toothed cutter cylinder 7 that has toothed cutter blades 31 and 32 and passing-through holes 30 for a processed vegetable in an inner peripheral surface thereof and surrounds the rotor 14 with a slight gap; and a collecting portion 5 having a cover that surrounds the toothed cutter cylinder 7 and is arranged outside the toothed cutter cylinder 7 with a processed vegetable discharge space for receiving the vegetable discharged from the passing-through holes 30.
    Type: Application
    Filed: December 3, 2004
    Publication date: June 8, 2006
    Inventor: Eiji Matsumoto
  • Patent number: 6890966
    Abstract: In a process for the production of a lightweight cold urethane wherein raw materials are injected into a mold in one shot, diethanolamine is added in an amount of 0.1 to 2.0 parts by weight per 100 parts by weight of the polyol. When principal raw materials including a polyol and an isocyanate, and an auxiliary ingredient mixture prepared by previously mixing auxiliary ingredients other than the polyol and the isocyanate, are injected into a mold from separate storage vessels, a water-soluble silicone foam stabilizer is added to the auxiliary ingredient mixture.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: May 10, 2005
    Assignee: Suzuki Motor Corporation
    Inventors: Masahiko Ando, Eiji Matsumoto
  • Publication number: 20050078698
    Abstract: A multicast communication apparatus 1 has a multicast processing unit 11 to transmit by multicast one or a plurality of data to a plurality of receiving terminals 3, a retransmission request receiving unit 12 to receive a request for retransmission which specifies at least one data out of the one or the plurality of data transmitted by the multicast and which is transmitted by unicast from any one of the plurality of receiving terminals 3, and a retransmission processing unit 13 to transmit by the unicast the specified data in the request for retransmission to the any one of the plurality of receiving terminals 3 which transmitted the request for retransmission.
    Type: Application
    Filed: January 24, 2003
    Publication date: April 14, 2005
    Inventors: Yoshinobu Araya, Eiji Matsumoto