Patents by Inventor Eiji Morinaga

Eiji Morinaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9758946
    Abstract: A work vehicle having a plurality of working modes allowing working in accordance with a load state includes an engine, an exhaust gas purification apparatus, a reducing agent tank, a state determination portion, and an engine control unit. The exhaust gas purification apparatus purifies a nitrogen oxide in an exhaust gas. The reducing agent tank stores a reducing agent. The state determination portion determines a state of the reducing agent. The engine control unit controls output of the engine with the use of a restricted-operation engine output torque curve in which horsepower output from the engine is lower than horsepower output from the engine at the time when each of the plurality of working modes is selected, when a state of the reducing agent is equal to or lower than a reference value.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: September 12, 2017
    Assignee: KOMATSU LTD.
    Inventors: Jin Yogita, Eiji Morinaga, Kozo Okuda, Kazuyoshi Morimoto
  • Publication number: 20150240454
    Abstract: A work vehicle having a plurality of working modes allowing working in accordance with a load state includes an engine, an exhaust gas purification apparatus, a reducing agent tank, a state determination portion, and an engine control unit. The exhaust gas purification apparatus purifies a nitrogen oxide in an exhaust gas. The reducing agent tank stores a reducing agent. The state determination portion determines a state of the reducing agent. The engine control unit controls output of the engine with the use of a restricted-operation engine output torque curve in which horsepower output from the engine is lower than horsepower output from the engine at the time when each of the plurality of working modes is selected, when a state of the reducing agent is equal to or lower than a reference value.
    Type: Application
    Filed: February 26, 2014
    Publication date: August 27, 2015
    Inventors: Jin Yogita, Eiji Morinaga, Kozo Okuda, Kazuyoshi Morimoto
  • Patent number: 8914199
    Abstract: The display system of the excavating machine has a work machine condition detection unit which detects information related to a current position of an excavating machine and a processing unit. This processing unit calculates an icon display of the bucket and the positions of the excavation edge portions viewed from a top of the excavating machine based on the information related to the current position of the excavating machine, the information related to the posture of the main body, the information about the positions of the excavation edge portions and the outer shape information about the bucket, and displays on a screen of a display device the target surface, the icon display position of the bucket, and an image which indicates the positions of the excavation edge portions.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: December 16, 2014
    Assignee: Komatsu Ltd.
    Inventors: Azumi Nomura, Masao Yamamura, Daishi Iwanaga, Etsuo Fujita, Eiji Morinaga
  • Publication number: 20140099178
    Abstract: The display system of the excavating machine has a work machine condition detection unit which detects information related to a current position of an excavating machine and a processing unit. This processing unit calculates an icon display of the bucket and the positions of the excavation edge portions viewed from a top of the excavating machine based on the information related to the current position of the excavating machine, the information related to the posture of the main body, the information about the positions of the excavation edge portions and the outer shape information about the bucket, and displays on a screen of a display device the target surface, the icon display position of the bucket, and an image which indicates the positions of the excavation edge portions.
    Type: Application
    Filed: November 27, 2012
    Publication date: April 10, 2014
    Applicant: Komatsu Ltd.
    Inventors: Azumi Nomura, Masao Yamamura, Daishi Iwanaga, Etsuo Fujita, Eiji Morinaga
  • Patent number: 8655630
    Abstract: A design workflow construction apparatus is provided for supporting design of an object having a plurality of design elements. In constructing the design workflow, the apparatus uses input variables, design variables, and intermediate variables. The design workflow construction apparatus includes means for acquiring object design elements and means for determining an order of designing the object design elements. The apparatus also includes means for determining the important design variables.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: February 18, 2014
    Assignee: Osaka University
    Inventors: Yoshiharu Iwata, Ryohei Satoh, Keiji Kudo, Atsushi Taya, Kazuya Okamoto, Hidenori Murata, Koichiro Atsumi, Eiji Arai, Eiji Morinaga
  • Patent number: 8418359
    Abstract: A method for manufacturing a circuit pattern-provided substrate including forming a resist layer on a substrate, forming an opening corresponding to a circuit pattern and having an eaves cross-sectional shape in the resist layer, forming a thin film layer having a portion formed on the substrate in the opening and a portion formed on the resist layer, and removing the resist layer such that the resist layer and the portion of the thin film layer formed on the resist layer are removed from the substrate. The forming of the opening comprises exposing the resist layer with a mask device which changes an exposure amount of the resist layer such that the eaves cross-sectional shape has a space at a boundary between the resist layer and the substrate.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: April 16, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Ryohei Satoh, Koji Nakagawa, Eiji Morinaga, Reo Usui, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20120100774
    Abstract: An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×1019/cm3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
    Type: Application
    Filed: January 3, 2012
    Publication date: April 26, 2012
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Ryohei SATOH, Koji Nakagawa, Eiji Morinaga, Reo Usui, Takamitsu Isono, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20120053905
    Abstract: A design system (1) is provided with a function of acquiring a design specification of an object to be designed and an evaluation index for evaluating a value of the object to be designed in the design specification; a function of acquiring profile data of the object to be designed; a function (design order determining section (12)) of extracting entity design elements and important design variables from the profile data and prioritizing the entity design elements and the important design variables so as to construct a design workflow; a function (evaluation approach construction section (13)) of constructing an evaluation formula for performance/evaluation of a design result of each of the entity design elements in conformity with the design workflow; a function of finding an appropriate solution by performing automatic optimization while evaluating the design result with use of the evaluation index in accordance with the design workflow with which the evaluation formula is associated; and a function of outp
    Type: Application
    Filed: February 16, 2010
    Publication date: March 1, 2012
    Applicant: Osaka University
    Inventors: Yoshiharu Iwata, Ryohei Satoh, Keiji Kudo, Atsushi Taya, Kazuya Okamoto, Hidenori Murata, Koichiro Atsumi, Eiji Arai, Eiji Morinaga
  • Publication number: 20090205851
    Abstract: The present invention is to provide a method for manufacturing a circuit pattern-provided transparent substrate having a circuit pattern which is free from pattern peeling and remaining of resist and has good pattern precision and which does not cause disconnection when used as an electrode of an electron circuit or the like.
    Type: Application
    Filed: February 2, 2009
    Publication date: August 20, 2009
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Ryohei SATOH, Koji Nakagawa, Eiji Morinaga, Reo Usui, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20080202798
    Abstract: An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×1019/cm3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
    Type: Application
    Filed: April 28, 2008
    Publication date: August 28, 2008
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Ryohei SATOH, Koji Nakagawa, Eiji Morinaga, Reo Usui, Takamitsu Isono, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto