Patents by Inventor Eiji Ozaki

Eiji Ozaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9822450
    Abstract: The present invention provides a vacuum processing apparatus capable of reducing attachment of particles generated in a processing space to an inner wall of a chamber, and of easily adjusting pressure in the processing space while introducing a gas into the processing space at a desired flow rate. A vacuum processing apparatus according to one embodiment includes: a container; a gas exhaust portion; a substrate holder configured to retain a substrate; a shield provided to surround the substrate holder and dividing an inside of the container into a processing space and an outside space; a gas introducing portion; a plasma generating portion; and an exhaust portion provided to the shield having a communication path through which the processing space and the outside space communicate, wherein at least part of the communication path is hidden from a region where the plasma generating portion generates the plasma.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: November 21, 2017
    Assignee: Canon Anelva Corporation
    Inventors: Toshikazu Nakazawa, Norihito Tsukamoto, Keisuke Ueda, Eiji Ozaki
  • Patent number: 9127355
    Abstract: Provided is a substrate processing apparatus including an openable and closable lid and being capable of precisely controlling a gap between multiple shields. The substrate processing apparatus includes: an openable and closable lid provided on an opening of a chamber; a first shield provided on a surface of the lid at the chamber side and having an insertion hole; an insertion section fixed to the lid while inserted through the insertion hole, and configured to support the first shield in a manner movable within a predetermined distance; a restriction section provided on an end portion of the insertion section and configured to restrict the movement of the first shield; and biasing means configured to bias the first shield to a member provided inside the chamber when the lid is closed.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: September 8, 2015
    Assignee: CANON ANELVA CORPORATION
    Inventors: Toshikazu Nakazawa, Norihito Tsukamoto, Keisuke Ueda, Eiji Ozaki
  • Patent number: 9085820
    Abstract: Provided is a substrate processing apparatus including an openable and closable lid and being capable of precisely controlling a gap between multiple shields. The substrate processing apparatus includes: an openable and closable lid provided on an opening of a chamber; a first shield provided on a surface of the lid at the chamber side and having an insertion hole; an insertion section fixed to the lid while inserted through the insertion hole, and configured to support the first shield in a manner movable within a predetermined distance; a restriction section provided on an end portion of the insertion section and configured to restrict the movement of the first shield; and biasing means configured to bias the first shield to a member provided inside the chamber when the lid is closed.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: July 21, 2015
    Assignee: CANON ANELVA CORPORATION
    Inventors: Toshikazu Nakazawa, Norihito Tsukamoto, Keisuke Ueda, Eiji Ozaki
  • Publication number: 20140261182
    Abstract: The present invention provides a vacuum processing apparatus capable of reducing attachment of particles generated in a processing space to an inner wall of a chamber, and of easily adjusting pressure in the processing space while introducing a gas into the processing space at a desired flow rate. A vacuum processing apparatus according to one embodiment includes: a container; a gas exhaust portion; a substrate holder configured to retain a substrate; a shield provided to surround the substrate holder and dividing an inside of the container into a processing space and an outside space; a gas introducing portion; a plasma generating portion; and an exhaust portion provided to the shield having a communication path through which the processing space and the outside space communicate, wherein at least part of the communication path is hidden from a region where the plasma generating portion generates the plasma.
    Type: Application
    Filed: June 4, 2014
    Publication date: September 18, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventors: Toshikazu NAKAZAWA, Norihito TSUKAMOTO, Keisuke UEDA, Eiji OZAKI
  • Patent number: 8465990
    Abstract: The present invention provides a manufacturing method of a magneto-resistance effect element, in which the step coverage of a formed film can be enlarged and also the film can be deposited in a low temperature range. In an embodiment of the present invention, an insulating protective layer is formed on a multilayered structure by a plasma CVD apparatus in which a plasma source and a film deposition chamber are separated from each other by a partition wall plate. According to the present method, it is possible to deposit the protective layer without inviting the degradation of a magnetic characteristic and also to perform low temperature film deposition even at a temperature lower than 150° C. Hence, it is possible to deposit the protective layer while leaving resist and also to reduce the number of steps in the manufacturing of the magneto-resistance effect element having a multilayered structure.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: June 18, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Naoko Matsui, Eiji Ozaki, Hiroshi Akasaka
  • Publication number: 20120091881
    Abstract: The present invention provides an electron emitting device that includes a cathode, and a gate onto which electrons field-emitted from the cathode are irradiated. The gate includes at least a layer containing molybdenum and oxygen provided at a portion onto which the electrons field-emitted from the cathode are irradiated. The layer has peaks in a range of 397 eV through 401 eV, a range of 414 eV through 418 eV, a range of 534 eV through 538 eV, and a range of 540 eV through 547 eV, respectively, in a spectrum measured by electron energy loss spectroscopy using a transmission electron microscope.
    Type: Application
    Filed: October 3, 2011
    Publication date: April 19, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Eiji Ozaki, Taiko Motoi, Ryoji Fujiwara, Akiko Kitao
  • Patent number: 8134288
    Abstract: An electron-emitting device includes an electron-emitting film containing molybdenum. A spectrum obtained by measuring a surface of the electron-emitting film by X-ray photoelectron spectroscopy has a first peak having a peak top in the range of 229±0.5 eV and a sub peak having a peak top in the range of 228.1±0.3 eV.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: March 13, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Taiko Motoi, Eiji Ozaki, Ryoji Fujiwara, Akiko Kitao
  • Publication number: 20110256642
    Abstract: The present invention provides a manufacturing method of a magneto-resistance effect element, in which the step coverage of a formed film can be enlarged and also the film can be deposited in a low temperature range. In an embodiment of the present invention, an insulating protective layer is formed on a multilayered structure by a plasma CVD apparatus in which a plasma source and a film deposition chamber are separated from each other by a partition wall plate. According to the present method, it is possible to deposit the protective layer without inviting the degradation of a magnetic characteristic and also to perform low temperature film deposition even at a temperature lower than 150° C. Hence, it is possible to deposit the protective layer while leaving resist and also to reduce the number of steps in the manufacturing of the magneto-resistance effect element having a multilayered structure.
    Type: Application
    Filed: April 14, 2011
    Publication date: October 20, 2011
    Applicant: CANON ANELVA CORPORATION
    Inventors: Naoko Matsui, Eiji Ozaki, Hiroshi Akasaka
  • Publication number: 20110148281
    Abstract: An electron-emitting device includes an electron-emitting film containing molybdenum. A spectrum obtained by measuring a surface of the electron-emitting film by X-ray photoelectron spectroscopy has a first peak having a peak top in the range of 229±0.5 eV and a sub peak having a peak top in the range of 228.1±0.3 eV.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Taiko Motoi, Eiji Ozaki, Ryoji Fujiwara, Akiko Kitao
  • Patent number: 7903378
    Abstract: A magnetic head substrate is provided with a recording element having a main magnetic pole layer and a recording-side monitor element including a resistance film, a lead conductor located as a layer below the resistance film, and a contact conductor for conductively connecting the resistance film and the lead conductor. The resistance film is formed on the same plane as that for a lowermost layer of the main magnetic pole layer or a base layer from the same material as that for them, so as to straddle the surface position of a medium-facing surface in the height direction. The contact conductor and the lead conductor are disposed while being retreated to the back side of the above-described position in the height direction. The upper surface and the lower surface of the contact conductor are entirely in contact with the resistance film and are not exposed to the outside.
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: March 8, 2011
    Assignee: TDK Corporation
    Inventors: Toru Takahashi, Kiyoshi Kobayashi, Eiji Ozaki
  • Patent number: 7859791
    Abstract: A perpendicular magnetic recording head includes a nonmagnetic insulating layer and a main magnetic pole layer disposed on the nonmagnetic insulating layer. The main magnetic pole layer includes a pole straight part exposed in an opposing surface opposite a recording medium and a flared part that extends from the pole straight part in a height direction. The flared part broadens in a track width direction as the flared part extends in the height direction. The pole straight part of the main magnetic pole layer as viewed from the opposing surface has a trapezoidal shape over its entire length, the trapezoidal shape being narrowed at the nonmagnetic insulating layer-side. The flared part as viewed from the opposing surface has a trapezoidal shape at least at a junction with the pole straight part, the trapezoidal shape being narrowed at the nonmagnetic insulating layer-side.
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: December 28, 2010
    Assignee: TDK Corporation
    Inventors: Yusuke Toma, Hiroshi Kameda, Eiji Ozaki
  • Patent number: 7545603
    Abstract: A magnetic head and a manufacturing method thereof which can suppress side fringing and permeation of a recording magnetic field in the first direction while maintaining the intensity of a recording magnetic field. By making a length of a trailing upper surface of a front portion in a height direction longer than a length of a leading lower surface of the front portion in the height direction, a generated magnetic field of the trailing upper surface can be comparatively weakened, to suppress side fringing and magnetic field permeation of a recording magnetic field. The recording magnetic field can be kept large enough by shortening the length of the leading lower surface in the height direction to intensify a generated magnetic field generated from the leading side.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: June 9, 2009
    Assignee: TDK Corporation
    Inventors: Hiroshi Kameda, Eiji Ozaki
  • Publication number: 20080074801
    Abstract: A magnetic head substrate is provided with a recording element having a main magnetic pole layer and a recording-side monitor element including a resistance film, a lead conductor located as a layer below the resistance film, and a contact conductor for conductively connecting the resistance film and the lead conductor. The resistance film is formed on the same plane as that for a lowermost layer of the main magnetic pole layer or a base layer from the same material as that for them, so as to straddle the surface position of a medium-facing surface in the height direction. The contact conductor and the lead conductor are disposed while being retreated to the back side of the above-described position in the height direction. The upper surface and the lower surface of the contact conductor are entirely in contact with the resistance film and are not exposed to the outside.
    Type: Application
    Filed: September 18, 2007
    Publication date: March 27, 2008
    Inventors: Toru Takahashi, Kiyoshi Kobayashi, Eiji Ozaki
  • Publication number: 20070236834
    Abstract: A perpendicular magnetic recording head includes a nonmagnetic insulating layer and a main magnetic pole layer disposed on the nonmagnetic insulating layer. The main magnetic pole layer includes a pole straight part exposed in an opposing surface opposite a recording medium and a flared part that extends from the pole straight part in a height direction. The flared part broadens in a track width direction as the flared part extends in the height direction. The pole straight part of the main magnetic pole layer as viewed from the opposing surface has a trapezoidal shape over its entire length, the trapezoidal shape being narrowed at the nonmagnetic insulating layer-side. The flared part as viewed from the opposing surface has a trapezoidal shape at least at a junction with the pole straight part, the trapezoidal shape being narrowed at the nonmagnetic insulating layer-side.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 11, 2007
    Applicant: ALPS ELECTRIC CO., LTD.
    Inventors: Yusuke Toma, Hiroshi Kameda, Eiji Ozaki
  • Publication number: 20050243466
    Abstract: A magnetic head and a manufacturing method thereof which can suppress side fringing and permeation of a recording magnetic field in the first direction while maintaining the intensity of a recording magnetic field. By making a length of a trailing upper surface of a front portion in a height direction longer than a length of a leading lower surface of the front portion in the height direction, a generated magnetic field of the trailing upper surface can be comparatively weakened, to suppress side fringing and magnetic field permeation of a recording magnetic field. The recording magnetic field can be kept large enough by shortening the length of the leading lower surface in the height direction to intensify a generated magnetic field generated from the leading side.
    Type: Application
    Filed: April 27, 2005
    Publication date: November 3, 2005
    Inventors: Hiroshi Kameda, Eiji Ozaki
  • Patent number: 6743944
    Abstract: An industrially advantageous process for producing optically active 4-amino-2-methylbutane-1-ol which is useful as an intermediate in synthesizing optically active medicines and pesticides. Racemic 4-amino-2-methylbutane-1-ol is treated with an optically active organic acid. The diastereomeric salt thus obtained is crystallized out and subjected to solid-liquid separation to give optically active 4-amino-2-methylbutane-1-ol. The diastereomeric salt of optically active 4-amino-2-methylbutane-1-ol with an optically active reagent for optical resolution is decomposed by bringing into contact with a solvent and an alkali and subjected to solid-liquid separation, thereby recovering the optically active 4-amino-2-methylbutane-1-ol from the filtrate. Further, the filtration residue containing the alkali salt of the reagent for optical resolution obtained by the solid-liquid separation is brought into contact with a solvent and an acid.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: June 1, 2004
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Eiji Ozaki, Takakazu Endou, Yasumasa Yamaguchi, Mitsuharu Hamanaka
  • Patent number: 6238896
    Abstract: The present invention relates to a method for preparing a malonic acid monoester represented by Formula (II): HOOCCH2COOR  (II) wherein R is alkenyl, aryl, aralkyl or C1-20 alkyl, comprising treating a cyanoacetic acid ester represented by Formula (I): NCCH2COOR  (I) wherein R is defined in Formula (II), with a culture, cells or a product from treated cells of a microorganism belonging to the genus Corynebacterium, Gordona or Rhodococcus and having nitrilase activity to thereby hydrolyze the cyanoacetic acid ester.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: May 29, 2001
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Eiji Ozaki, Kanehiko Enomoto, Takakazu Endo
  • Patent number: 5773240
    Abstract: The present invention relates to an optically active .alpha.-substituted carboxylic acid derivative represented by the general formula (I): ##STR1## (wherein R.sub.1 is a hydroxyl group, ##STR2## R.sub.2 is a methyl group or a chlorine atom; R.sub.3 is a hydrogen atom or an alkyl group with 1-6 carbon atoms; n is an integer of 1 or 2; and * represents an asymmetric carbon atom, provided that R.sub.2 is a chlorine atom when R.sub.1 is a hydroxyl group);and a method for producing the optically active .alpha.-substituted carboxylic acid derivative represented by the general formula (I) and antipodes thereof using a culture, cells or a material obtainable from cells of a microorganism having an ability to asymmetrically hydrolyze ester bonds. The optically active .alpha.-substituted carboxylic acid derivatives and antipodes thereof provided by the invention are useful as raw materials for various liquid crystals and as synthetic intermediates for various optically active medicines or agricultural chemicals.
    Type: Grant
    Filed: December 12, 1996
    Date of Patent: June 30, 1998
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Eiji Ozaki, Toshitaka Uragaki, Keiichi Sakashita, Tetsuya Ikemoto, Yoshimasa Kobayashi, Akihiro Sakimae
  • Patent number: 5597716
    Abstract: The present invention relates to a process for producing D-lactic acid and L-lactamide, comprising allowing a culture broth of a microorganism capable of asymmetric hydrolysis of DL-lactamide belonging to the genus Alcaligenes, Pseudomonas, Agrobacterium, Brevibacterium, Acinetobacter, Corynebacterium, Enterobacter, Micrococcus or Rhodococcus, the microorganism itself, a material obtained therefrom or an immobilized material thereof to act on DL-lactamide, and recovering the resulting D-lactic acid and the remaining L-lactamide. The present invention enables sufficient production of D-lactic acid and L-lactamide by the present microorganism.
    Type: Grant
    Filed: November 17, 1994
    Date of Patent: January 28, 1997
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Eiji Sato, Eiji Ozaki, Chinami Iida, Yoshimasa Kobayashi, Akihiro Sakimae
  • Patent number: 5482847
    Abstract: The present invention relates to a DNA fragment containing a nucleotide sequence that encodes an amino acid sequence of esterase, said esterase asymmetrically hydrolyzing carboxylic acid esters represented by the formula (I); ##STR1## (wherein R.sub.1 is alkyl, aralkyl or aryl, R.sub.2 and R.sub.3 are alkyl, and n is 1 or 2) an esterase encoded by the DNA fragment, a recombinant plasmid containing the DNA fragment, a microorganism transformed with the recombinant plasmid and methods of producing optically active carboxylic acids and their enantiomeric esters.
    Type: Grant
    Filed: January 14, 1994
    Date of Patent: January 9, 1996
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Eiji Ozaki, Akihiro Sakimae, Ryozo Numazawa