Abstract: A compound represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R1 being other than those containing a urethane bond.

Abstract: A composition including at least one compound having a perfluoropolyether group and a curable site, wherein in a molecular weight distribution curve in gel permeation chromatography measurement, the following formula is satisfied: M2/M1?3.5, wherein M1 is a molecular weight at a main peak, and M2 is a molecular weight at 25% intensity of an intensity of the main peak on a higher molecular weight side than M1. Also disclosed is a curable composition containing the composition and a method for producing the curable composition.

Abstract: The present invention makes it possible to convert an NC program used for one processing into an NC program capable of securing appropriate processing accuracy in another processing machine. Provided is an NC program conversion process method by a conversion system which converts a conversion source NC program for executing a processing in a conversion source processing machine into a conversion destination NC program for executing a processing in a conversion destination processing machine, wherein an input of information relating to (1) stiffness of the conversion destination processing machine or (2) stiffness of the tool included in a conversion destination toolset is received, and on the basis of the received information relating to the stiffness, a conversion source NC program 1424 is converted into a conversion destination NC program 1425.

Abstract: The present invention makes it possible to convert an NC program used for one processing into an NC program capable of securing appropriate processing accuracy in another processing machine. Provided is an NC program conversion process method by a conversion system which converts a conversion source NC program for executing a processing in a conversion source processing machine into a conversion destination NC program for executing a processing in a conversion destination processing machine, wherein an input of information relating to (1) stiffness of the conversion destination processing machine or (2) stiffness of the tool included in a conversion destination toolset is received, and on the basis of the received information relating to the stiffness, a conversion source NC program 1424 is converted into a conversion destination NC program 1425.

Abstract: The present invention provides a technology for generating an NC program which can secure appropriate machining accuracy. Provided is a conversion computer 10 which includes a CPU 11 and generates an NC program for a turning process for a workpiece on a lathe, wherein the CPU 11 is configured to generate an NC program such that displacements caused for a workpiece to be processed on a plurality of machining positions at a time of a turning process are calculated, on the basis of the displacements caused for the workpiece on the plurality of machining positions, a movement path of a tool to be used at the time of the turning process is decided, and the tool is moved through the decided movement path.

Abstract: The present invention makes it possible to convert an NC program used for one processing into an NC program capable of securing appropriate processing accuracy in another processing machine. Provided is an NC program conversion process method by a conversion system which converts a conversion source NC program for executing a processing in a conversion source processing machine into a conversion destination NC program for executing a processing in a conversion destination processing machine, wherein an input of information relating to (1) stiffness of the conversion destination processing machine or (2) stiffness of the tool included in a conversion destination toolset is received, and on the basis of the received information relating to the stiffness, a conversion source NC program 1424 is converted into a conversion destination NC program 1425.

Abstract: Provided is a technique for converting an NC program into an NC program capable of ensuring appropriate precision in working while avoiding the occurrence of differences in levels caused by correction during the cutting of a cut surface of a workpiece.

Abstract: The present invention provides a method for producing an antifouling film capable of long-term continuous production of an antifouling film having excellent antifouling properties. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of applying a second release agent to a surface of a die coated with a first release agent; Process (3) of pushing the substrate to the surface of the die coated with the second release agent with the resin in between to form an uneven structure on a surface of the resin; and Process (4) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a predetermined compound. The first release agent contains a predetermined compound. The second release agent contains a predetermined compound.

Abstract: The present invention provides a method for producing an antifouling film having excellent antifouling properties and rubbing resistance. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of pushing the substrate to a die with the resin in between to form an uneven structure on a surface of the resin; and Process (3) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a compound containing a perfluoro(poly)ether group. The die includes a surface having undergone release treatment using a release agent containing a compound that contains a perfluoro(poly)ether group, a hydrolyzable group, and a Si atom.

Abstract: The present invention makes it possible to convert an NC program used for one processing into an NC program capable of securing appropriate processing accuracy in another processing machine. Provided is an NC program conversion process method by a conversion system which converts a conversion source NC program for executing a processing in a conversion source processing machine into a conversion destination NC program for executing a processing in a conversion destination processing machine, wherein an input of information relating to (1) stiffness of the conversion destination processing machine or (2) stiffness of the tool included in a conversion destination toolset is received, and on the basis of the received information relating to the stiffness, a conversion source NC program 1424 is converted into a conversion destination NC program 1425.

Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.

Abstract: A compound represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R1 being other than those containing a urethane bond.

Abstract: A composition including at least one compound having a perfluoropolyether group and a curable site, wherein in a molecular weight distribution curve in gel permeation chromatography measurement, the following formula is satisfied: M2/M1?3.5, wherein M1 is a molecular weight at a main peak, and M2 is a molecular weight at 25% intensity of an intensity of the main peak on a higher molecular weight side than M1. Also disclosed is a curable composition containing the composition and a method for producing the curable composition.

Abstract: A curable composition including a compound having a perfluoropolyether group and a curable moiety, and a curable resin and/or a curable monomer, wherein an organic solvent having no radical reactive group is not substantially contained. The curable composition is capable of forming a surface-treating layer that is in a lower clouded state.

Abstract: The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.

Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.

Abstract: An imprint apparatus for forming a pattern of an imprint material on a mold and a substrate includes a substrate holding unit configured to hold the substrate, and a charging unit configured to charge at least one of a surface of the substrate holding unit on a side facing the mold or a particle existing in the vicinity of the surface to the same polarity as the charge polarity of the mold.

Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.

Abstract: The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.

Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.