Patents by Inventor Eiji Tsujimoto

Eiji Tsujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods
    Patent number: 6548312
    Abstract: In order to inhibit or prevent a pattern abnormality such as the deformation or misalignment of a pattern of a semiconductor integrated circuit device, a light intensity is calculated based on the pattern data DBP of a mask and the aberration data DBL of a lens of a pattern exposure device (step 101) and then the results of the light intensity calculation is compared with the results of the light intensity calculated on condition that the lens of the pattern exposure device has no aberration (step 102), and then a pattern data exceeding an allowable level, of the pattern data of the mask, is corrected according to the amount of correction calculated on the basis of the results of the comparison such that the pattern data does not exceed the allowable level (step 104). The mask is manufactured by using the mask making data DBM after the correction and then is mounted on the pattern exposure device to transfer a predetermined pattern to a semiconductor wafer.
    Type: Grant
    Filed: August 18, 2000
    Date of Patent: April 15, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Katsuya Hayano, Norio Hasegawa, Akira Imai, Naoko Asai, Eiji Tsujimoto, Takahiro Watanabe