Patents by Inventor Eiji Uramoto

Eiji Uramoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device manufacturing method
    Publication number: 20090311868
    Abstract: In a semiconductor device manufacturing method according to this invention, an SiO2 film used as a mask at the time of trench formation is removed by a wet process after hydrophilic treatment is performed on the interior of a hydrophobic trench.
    Type: Application
    Filed: June 12, 2009
    Publication date: December 17, 2009
    Applicant: NEC Electronics Corporation
    Inventors: Masafumi Hayashi, Eiji Uramoto