Patents by Inventor Eiji Yonezawa

Eiji Yonezawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010048522
    Abstract: A defect inspection apparatus for inspecting a presence of a defect on an object includes: a first input unit which inputs a wavelength characteristic of each of a plurality of samples with wavelength variation of an illumination light for inspection; a second input unit which inputs an inspection condition which an inspector voluntary sets for each sample as a teaching signal; a third input unit which inputs a wavelength characteristic of the object with the wavelength variation of the illumination light; a learning unit which learns and stores a relationship between the inputted wavelength characteristic of each sample and the inputted inspection condition for each sample as a learning, and determines an inspection condition for the object based on the inputted wavelength characteristic of the object and the learning; and a defect detector witch detects a defect of the object based on the determined inspection condition of the object.
    Type: Application
    Filed: May 31, 2001
    Publication date: December 6, 2001
    Applicant: NIDEK CO., LTD.
    Inventor: Eiji Yonezawa
  • Publication number: 20010012393
    Abstract: In a visual inspection apparatus for visual inspection of an object, a plurality of monochrome images obtained from an object are used to prepare a plurality of computed color images. The computed color images are switchingly displayed on a color display for visual inspection.
    Type: Application
    Filed: November 30, 2000
    Publication date: August 9, 2001
    Inventor: Eiji Yonezawa
  • Patent number: 6222624
    Abstract: A defect inspecting apparatus for inspecting a defect on an object to be inspected on the basis of comparison between a pattern at a first position and a pattern at a second position on the object to be inspected having repeated patterns.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: April 24, 2001
    Assignee: Nidek Co., Ltd.
    Inventor: Eiji Yonezawa