Patents by Inventor Eika Kyo

Eika Kyo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8859170
    Abstract: Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: October 14, 2014
    Assignee: PI R&D Co., Ltd.
    Inventors: Toshiyuki Goshima, Maw Soe Win, Sigemasa Segawa, Eika Kyo
  • Patent number: 8779085
    Abstract: The present invention discloses a method of producing a modified polyimide comprising a polycarbonate, which modified polyimide has excellent electric properties and adhesion as well as excellent heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; and the modified polyimide. Also disclosed are a composition comprising the modified polyimide and used thereof.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: July 15, 2014
    Assignee: PI R&D Co., Ltd.
    Inventors: Toshiyuki Goshima, Maw Soe Win, Eika Kyo
  • Patent number: 8349537
    Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: January 8, 2013
    Assignee: PI R&D Co., Ltd.
    Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki
  • Publication number: 20120097435
    Abstract: Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent.
    Type: Application
    Filed: April 30, 2010
    Publication date: April 26, 2012
    Applicant: PI R&D CO., LTD.
    Inventors: Toshiyuki Goshima, Maw Soe Win, Sigemasa Segawa, Eika Kyo
  • Publication number: 20120097439
    Abstract: The present invention discloses a method of producing a modified polyimide comprising a polycarbonate, which modified polyimide has excellent electric properties and adhesion as well as excellent heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; and the modified polyimide. Also disclosed are a composition comprising the modified polyimide and used thereof.
    Type: Application
    Filed: April 30, 2010
    Publication date: April 26, 2012
    Applicant: PI R&D CO., LTD.
    Inventors: Toshiyuki Goshima, Maw Soe Win, Eika Kyo
  • Publication number: 20110127077
    Abstract: The object is to provide a polyimide ink composition having good printing properties and good continuous priming properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance.
    Type: Application
    Filed: February 11, 2011
    Publication date: June 2, 2011
    Inventors: Maw Soe WIN, Toshiyuki Goshima, Eika Kyo, Shintaro Nakajima, Noriki Hayashi, Tohru Kashiwagi, Kenji Miyazaki, Katsuya Yamada, Naoyuki Yamabayashi, Shoji Nakagama, Hiroshi Okuyama, Fumio Kasabo, Ippei Tanaka
  • Publication number: 20110111351
    Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
    Type: Application
    Filed: January 14, 2011
    Publication date: May 12, 2011
    Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki
  • Publication number: 20090229870
    Abstract: The object is to provide a polyimide ink composition having good printing properties and good continuous printing properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance.
    Type: Application
    Filed: May 21, 2009
    Publication date: September 17, 2009
    Inventors: Maw Soe Win, Toshiyuki Goshima, Eika Kyo, Shintaro Nakajima, Noriki Hayashi, Tohru Kashiwagi, Kenji Miyazaki, Katsuya Yamada, Naoyuki Yamabayashi, Shoji Nakagama, Hiroshi Okuyama, Fumio Kasabo, Ippei Tanaka
  • Publication number: 20090186295
    Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
    Type: Application
    Filed: March 2, 2007
    Publication date: July 23, 2009
    Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki
  • Publication number: 20080275181
    Abstract: The object is to provide a polyimide ink composition having good printing properties and good continuous printing properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance.
    Type: Application
    Filed: May 24, 2005
    Publication date: November 6, 2008
    Applicant: Sumitomo Electric Industries, Ltd
    Inventors: Maw Soe Win, Toshiyuki Goshima, Eika Kyo, Shintaro Nakajima, Noriki Hayashi, Tohru Kashiwagi, Kenji Miyazaki, Katsuya Yamada, Naoyuki Yamabayashi, Shoji Nakagama, Hiroshi Okuyama, Fumio Kasabo, Ippei Tanaka