Patents by Inventor Eika Rietzel

Eika Rietzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110306818
    Abstract: The idea concerns irradiation of a target volume (53), wherein intensities for target points (70) are determined which are sequentially approached by a beam, comprising the following steps: detecting a volume (63) to be protected, wherein a dose generated by irradiating a target volume (53) does not exceed a predetermined maximum value; determining intensities for target points (70) in such a way that within the volume (63) to be protected the generated dose does not exceed the predetermined maximum value, wherein a dose contribution data record is used for determining the intensities, which dose contribution data record comprises the dose generated at other spots (73) by directing the beam (10) on one of the target points (70) with a predetermined intensity.
    Type: Application
    Filed: October 17, 2009
    Publication date: December 15, 2011
    Inventors: Christoph Bert, Eika Rietzel
  • Publication number: 20110272600
    Abstract: The invention concerns an idea of planning irradiation of two target points (81, 9) with a beam approaching target points (72) for the purpose of depositing a first target dose distribution in a first of the two target volumes (81, 92) and a second target dose distribution in a second of the two target volumes (81, 92). The idea is characterized by the following steps: assigning target points (72) to one of the target volumes (81, 92), detecting an overlap of a first deposition caused by approaching a target point (72) assigned to the first target volume (81, 92) with a second deposition caused by approaching a target point (72) assigned to the second target volume (81, 92), and adapting the planning process for at least one of the target points (72) whose approach contributes to the overlap of the first and second deposition.
    Type: Application
    Filed: October 17, 2009
    Publication date: November 10, 2011
    Inventors: Christoph Bert, Eika Rietzel