Patents by Inventor Eiki Hotta

Eiki Hotta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090091273
    Abstract: A plasma generation apparatus for generating a plasma within a discharge chamber is disclosed, which includes a plurality of electrodes disposed within the discharge chamber, a power supply device operative to flow a discharge current between electrodes for performing self-heating of a plasma between the electrodes and for applying a self-magnetic field to the plasma, and a control unit for control of the power supply device, wherein the control unit controls the power supply device in such a way as to confine the plasma in a space, thereby improving the conversion efficiency of extreme ultraviolet (EUV) light. A plasma generation method is also disclosed.
    Type: Application
    Filed: April 28, 2006
    Publication date: April 9, 2009
    Applicant: Tokyo Institute of Technology
    Inventors: Kazuhiko Horioka, Majid Masnavi, Eiki Hotta
  • Publication number: 20080245478
    Abstract: A surface treatment apparatus encompasses a gas introducing system configured to introduce a process gas from downstream end of a tubular treatment object; a vacuum evacuating system configured to evacuate the process gas from other end of the treatment object; an excited particle supplying system disposed at upstream side of the treatment object, configured to supply excited particles for inducing initial discharge in a main body of the treatment object; and a first main electrode and a second main electrode disposed oppositely to each other, defining a treating region of the treatment object as a main plasma generating region disposed therebetween, wherein the excited particle supplying system is driven at least until generation of main plasma, and main pulse of duty ratio of 10?7 to 10?1 is applied across the first main electrode and second main electrode, to generate a non-thermal equilibrium plasma flow in the inside of the treatment object, and thereby an inner surface of the treatment object is treated
    Type: Application
    Filed: April 23, 2008
    Publication date: October 9, 2008
    Applicants: TOKYO INSTITUTE OF TECHNOLOGY, NGK INSULATORS, LTD.
    Inventors: Eiki Hotta, Naohiro Shimizu, Yuichiro Imanishi
  • Publication number: 20080193330
    Abstract: A surface treatment apparatus encompasses a gas introducing system configured to introduce a process gas from one end of a tubular treatment object; a vacuum evacuating system configured to evacuate the process gas from other end of the treatment object; an excited particle supplying system disposed at the gas supply upstream side to the treatment object, configured to supply excited particles for inducing initial discharge in a main body of the treatment object; and a first main electrode and a second main electrode disposed oppositely to each other, defining a treating region of the treatment object as a main plasma generating region disposed therebetween, wherein the excited particle supplying system is driven at least until generation of main plasma, and main pulse of duty ratio of 10?7 to 10?1 is applied between the first main electrode and second main electrode, to generate a non-thermal equilibrium plasma flow inside the treatment object, and thereby an inner surface of the treatment object is treated.
    Type: Application
    Filed: July 19, 2007
    Publication date: August 14, 2008
    Applicants: TOKYO INSTITUTE OF TECHNOLOGY, NGK INSULATORS, LTD.
    Inventors: Eiki Hotta, Naohiro Shimizu, Yuichiro Imanishi