Patents by Inventor Eiko Ito

Eiko Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250010594
    Abstract: Provided is a laminated film that enables easy material recycling and has excellent impact strength. Formed on top of each other are: a layer A containing an ethylene polymer (A) having 80 mol % or more of an ethylene-derived structural unit; a layer B containing an ethylene polymer (B) having 70 mol % or more of an ethylene-derived structural unit and an inorganic filler (A); a layer C containing an ethylene polymer (C) having 70 mol % or more of an ethylene-derived structural unit; a barrier layer and/or an adhesive layer; a layer D containing an ethylene polymer (D) having 70 mol % or more of an ethylene-derived structural unit and an inorganic filler (B), the ethylene polymer (D) constituting at least 75% by mass but less than 99.5% by mass of the layer D; and a layer E containing an ethylene polymer (E) having 70 mol % or more of an ethylene-derived structural unit.
    Type: Application
    Filed: June 24, 2022
    Publication date: January 9, 2025
    Inventors: Nao IGAWA, Eiko ITO
  • Publication number: 20240092980
    Abstract: A method is provided for producing a resin composition including an olefin-based polymer; an inorganic filler; and a lubricant, in which the olefin-based polymer is at least one polymer selected from a propylene-based polymer and an ethylene-based polymer having a melt flow rate of 0.5 g/10 minutes or more measured at a temperature of 190° C. and a load of 2.16 kg. The method includes a step (1) of mixing the inorganic filler and a lubricant; a step (2) of mixing a mixture obtained in the step (1) and the olefin-based polymer; and a step (3) of kneading a mixture obtained in the step (2).
    Type: Application
    Filed: December 14, 2021
    Publication date: March 21, 2024
    Inventors: Hidekazu YAMADA, Nao IGAWA, Eiko ITO
  • Patent number: 7527741
    Abstract: Means for enabling plating on sites of complex configuration, etching for fine complex pattern, etc. through reduction of the viscosity resistance brought about by walls of fine liquid channel of microreactor. In particular, a microreactor comprising a liquid inlet, a fine liquid channel and a liquid discharge zone characterized in that the liquid channel is formed of a magnetic barrier of band ferromagnet so that a magnetic liquid introduced through the inlet undergoes at least one operation of chemical reaction, mixing, extraction and absorption in the liquid channel. Further, there is provided means for plating or etching performed by causing a plating solution or an etching solution to flow through the liquid channel.
    Type: Grant
    Filed: November 4, 2003
    Date of Patent: May 5, 2009
    Inventors: Ryoichi Aogaki, Eiko Ito, Mikio Ogata
  • Publication number: 20070104624
    Abstract: Means for enabling plating on sites of complex configuration, etching for fine complex pattern, etc. through reduction of the viscosity resistance brought about by walls of fine liquid channel of microreactor. In particular, a microreactor comprising a liquid inlet, a fine liquid channel and a liquid discharge zone characterized in that the liquid channel is formed of a magnetic barrier of band ferromagnet so that a magnetic liquid introduced through the inlet undergoes at least one operation of chemical reaction, mixing, extraction and absorption in the liquid channel. Further, there is provided means for plating or etching performed by causing a plating solution or an etching solution to flow through the liquid channel.
    Type: Application
    Filed: November 4, 2003
    Publication date: May 10, 2007
    Inventors: Ryoichi Aogaki, Eiko Ito, Mikio Ogata