Patents by Inventor Eisaku Hirasawa

Eisaku Hirasawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6207759
    Abstract: A scale has marks or a point-symmetrical shape which are arranged in matrix. The scale and an article to be measured in dimension are positioned without any relative movement. An image sensor unit detects a predetermined portion of the article and the marks of the scale corresponding to the predetermined portion of the article selectively and successively, and the image sensor unit generates output signals in accordance with the detected results of the article and the scale. The output signals are processed to calculate the dimension of the article.
    Type: Grant
    Filed: September 18, 1997
    Date of Patent: March 27, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Yoshiyuki Iwase, Sumio Fujita, Eisaku Hirasawa
  • Patent number: 5231133
    Abstract: A thermoplastic polymer which is the reaction product of(A) at least one copolymer selected from the group consisting of ethylene/unsaturated carboxylic acid copolymers and ionically crosslinked products thereof wherein the ion is a zinc, cobalt, nickel, copper, lead or magnesium ion,(B) a polyamine compound having at least two primary and/or secondary amino groups, and(C) a polyepoxy resin in a proportion corresponding to not more than one epoxy group for one amino group of the polyamine compound; and a process for its production.
    Type: Grant
    Filed: June 4, 1991
    Date of Patent: July 27, 1993
    Assignee: Dupont Mitsui Polychemicals Co., Ltd.
    Inventors: Eisaku Hirasawa, Hirohide Hamazaki
  • Patent number: 5210138
    Abstract: Disclosed is an ionomer composition comprising (A) an ionomer formed by neutralizing a carboxyl group of an ethylene/unsaturated carboxylic acid copolymer with an transition metal cation, (B) a polyamide and (C) a polyamide oligomer having a terminal group of the molecule chain blocked with a primary amino group. Since two polyamide components differing in the degree of polymerization are incorporated in this ionomer composition, excellent characteristics of the ionomer resin are related in the ionomer composition, and the mechanical strength at high temperatures, the formability and the transparency are prominently improved.
    Type: Grant
    Filed: February 12, 1991
    Date of Patent: May 11, 1993
    Assignee: Dupont-Mitsui Polychemicals Co., Ltd.
    Inventors: Yoshimasa Yamamoto, Eisaku Hirasawa
  • Patent number: 5179168
    Abstract: Disclosed is an ionomer composition comprising an ethylene/unsaturated carboxylic acid copolymer which is at least partially neutralized with at least one alkali metal selected from the group consisting of potassium, rubidium and cesium, wherein the ethylene/unsaturated carboxylic acid copolymer is a blend comprising (A) an ethylene/unsaturated carboxylic acid copolymer having an unsaturated carboxylic acid content of 6 to 15 mole % and (B) an ethylene/unsaturated carboxylic acid copolymer having an unsaturated carboxylic acid content of 0.5 to 5 mole % at an (A)/(B) weight ratio of from 10/90 to 80/20, and the alkali metal is present in an amount at least 0.4 millimole but smaller than 1.3 millimoles per gram of the ionomer composition.This ionomer composition has an excellent antistatic property and an excellent heat moldability.
    Type: Grant
    Filed: September 21, 1990
    Date of Patent: January 12, 1993
    Assignee: Dupont-Mitsui Polychemicals Co., Ltd.
    Inventor: Eisaku Hirasawa
  • Patent number: 4968752
    Abstract: Proposed herein is an ionomer composition which comprises a reaction product of from 90 to 99.5% by weight of an ethylene copolymer-type ionomer (A) with from 0.5 to 10% by weight of an olefin copolymer (B) having epoxy groups in its side chains, and from 5 to 200 parts by weight, based on 100 parts by weight of said reaction product, of an olefin-type thermoplastic elastomer (C). The proposed ionomer composition is excellent in scratch resistance and flexibility and exhibits a reduced "luster reappearance".
    Type: Grant
    Filed: January 29, 1990
    Date of Patent: November 6, 1990
    Assignee: Du Pont-Mitsui Polychemicals Co., Ltd.
    Inventors: Manabu Kawamoto, Yasuhisa Hosoai, Eisaku Hirasawa