Patents by Inventor Eisuke Inoue
Eisuke Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240362007Abstract: A software update device is configured to update software for an in-vehicle control device mounted in a vehicle. The software update device includes an information acquisition unit, an output unit, an execution unit, a communication status acquisition unit, a correction unit, and a notification unit. The information acquisition unit is configured to acquire, from a server provided outside the vehicle, update process information related to an update of the software. The output unit is configured to output consent request information for asking a user whether to consent to the update of the software. The execution unit is configured to execute an update process for the software according to response information that is a response to the consent request information from the user. The calculation unit is configured to calculate an estimate time required for the update.Type: ApplicationFiled: July 27, 2021Publication date: October 31, 2024Applicant: Nissan Motor Co., Ltd.Inventors: Mitsuhiko Kikuchi, Koji Morita, Yoshimori Shizuka, Eisuke Ohashi, Masaaki Uzumi, Muneeswaran Ayyappan, Yohei Kaieda, Takayuki Inoue, Hidetoshi Hayashi
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Publication number: 20050095629Abstract: Multi-dimensional scaling is used to solve characteristic polynomials of similarity matrixes, in order to determine a minimal-number SNP set (htSNPs (haplotype-tagging SNPS)) for identifying an arbitrary number of haplotypes in blocks with strong linkage disequilibrium. Thus, unnecessary SNP typing in blocks with strong linkage disequilibrium can be avoided.Type: ApplicationFiled: September 10, 2004Publication date: May 5, 2005Applicants: NEC Corporation, Mitsubishi Research Institute, Inc., Japan Biological Informatics ConsortiumInventors: Toshio Furuta, Naoyuki Kamatani, Yoshihiro Nakamura, Toshikazu Ito, Eisuke Inoue
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Patent number: 6271691Abstract: A chopper type voltage comparison circuit is disclosed which restrain leakage current between an input and output nodes of each amplifying circuit to enable normal voltage comparisons even if a threshold voltage for each transistor is reduced to diminish a power supply voltage.Type: GrantFiled: June 29, 2000Date of Patent: August 7, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Kenji Toyoda, Kimio Maruyama, Eisuke Inoue
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Patent number: 6246161Abstract: A cathode ray tube has a vacuum envelope formed of a panel portion supporting a phosphor film on an inner surface thereof, a neck housing an electron gun, a funnel joining the panel and the neck, and a stem sealing an open end of the neck and mounting the electron gun via a plurality of pins extending through the stem. The inside diameters at the open end sealed by the stem and vicinities thereof become gradually larger toward the open end sealed by the stem, or retain at least a value substantially equal to an inside diameter of a major portion of the neck.Type: GrantFiled: September 23, 1998Date of Patent: June 12, 2001Assignee: Hitachi, Ltd.Inventors: Takao Kawamura, Hisashi Nose, Eisuke Inoue
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Patent number: 5818155Abstract: A cathode ray tube has a vacuum envelope formed of a panel portion supporting a phosphor film on an inner surface thereof, a neck housing an electron gun, a funnel joining the panel and the neck, and a stem sealing an open end of the neck and mounting the electron gun via a plurality of pins extending through the stem. The inside diameters at the open end sealed by the stem and vicinities thereof become gradually larger toward the open end sealed by the stem, or retain at least a value substantially equal to an inside diameter of a major portion of the neck.Type: GrantFiled: August 30, 1995Date of Patent: October 6, 1998Assignee: Hitachi, Ltd.Inventors: Takao Kawamura, Hisashi Nose, Eisuke Inoue
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Patent number: 5233265Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property. In one aspect of the present invention, the amorphous semiconductor layer is amorphous Se. In another aspect of the present invention, the amorphous semiconductor layer is composed mainly of tetrahedral elements including at least an element of hydrogen or halogens. When using the amorphous semiconductor layer composed mainly of tetrahedral elements, the charge multiplication effect is produced mainly in the interior of the amorphous semiconductor, and thus it is possible to obtain a thermally stable photoconductive device having a high sensitivity while keeping a good photoresponse.Type: GrantFiled: August 1, 1990Date of Patent: August 3, 1993Assignees: Hitachi, Ltd., Nippon Hoso KyokaiInventors: Yukio Takasaki, Kazutaka Tsuji, Tatsuo Makishima, Tadaaki Hirai, Sachio Ishioka, Tatsuro Kawamura, Keiichi Shidara, Eikyu Hiruma, Kenkichi Tanioka, Junichi Yamazaki, Kenji Sameshima, Hirokazu Matsubara, Kazuhisa Taketoshi, Mitsuo Kosugi, Shiro Suzuki, Takashi Yamashita, Masaaki Aiba, Yoshizumi Ikeda, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Hirofumi Ogawa
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Patent number: 4952839Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property.Type: GrantFiled: October 12, 1989Date of Patent: August 28, 1990Assignees: Hitachi, Ltd, Nippon Hoso KyokaiInventors: Kenkichi Tanioka, Mitsuo Kosugi, Junichi Yamazaki, Keiichi Shidara, Kazuhisa Taketoshi, Tatsuro Kawamura, Eikyuu Hiruma, Shiro Suzuki, Takashi Yamashita, Masaaki Aiba, Yochizumi Ikeda, Tadaaki Hirai, Yukio Takasaki, Sachio Ishioka, Tatsuo Makishima, Kenji Sameshima, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Kazutaka Tsuji, Hirofumi Ogawa
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Patent number: 4888521Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property.Type: GrantFiled: July 2, 1987Date of Patent: December 19, 1989Assignees: Hitachi Ltd., Nippon Hoso KyokaiInventors: Kenkichi Tanioka, Keiichi Shidara, Tatsuro Kawamura, Junichi Yamazaki, Eikyuu Hiruma, Kazuhisa Taketoshi, Shiro Suzuki, Takashi Yamashita, Mitsuo Kosugi, Yochizumi Ikeda, Masaaki Aiba, Tadaaki Hirai, Yukio Takasaki, Sachio Ishioka, Tatsuo Makishima, Kenji Sameshima, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Kazutaka Tsuji, Hirofumi Ogawa
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Patent number: 4866332Abstract: A target of an image pickup tube, having a transparent substrate, a transparent conductive film, a p-type photoconductive film made mainly from amorphous Se, and an n-type conductive film capable of forming a rectifying contact at the interface with the p-type photoconductive film, using the rectifying contact as a reverse bias, characterized in that the p-type photoconductive film containing at least a region having more than 35%, and to 60% by weight of Te in the film thickness direction, and at least a region containing 0.005 to 5% by weight of at least a material capable of forming shallow levels in the amorphous Se in the film thickness direction, has good after-image characteristics even if operated at a high temperature.Type: GrantFiled: February 19, 1987Date of Patent: September 12, 1989Assignees: Hitachi, Ltd., Nippon Hoso KyokaiInventors: Yukio Takasaki, Tatsuo Makishima, Kazutaka Tsuji, Tadaaki Hirai, Eisuke Inoue, Yasuhiko Nonaka, Naohiro Goto, Masanao Yamamoto, Keiichi Shidara, Kenkichi Tanioka, Takashi Yamashita, Tatsuro Kawamura, Eikyuu Hiruma, Shirou Suzuki, Masaaki Aiba
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Patent number: 4816715Abstract: There is disclosed an image pick-up tube target comprising an N-type conductive film formed on a transparent substrate, and a P-type photoconductive film in rectifying contact with the N-type conductive film and comprising a first layer containing As and Se, the average concentration of As in the first layer being below 8% by weight, a second layer containing As and Se, a third layer containing As and Se, the concentration of As being in the range of 8 to 20% by weight and thickness of the third layer being in the range of 5 to 50% of the total thickness of the P-type photoconductive film, in the order named, and a beam landing layer.Type: GrantFiled: July 9, 1987Date of Patent: March 28, 1989Assignee: Hitachi, Ltd.Inventors: Takaaki Unnai, Yasuhiko Nonaka, Eisuke Inoue
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Patent number: 4717854Abstract: An image pick-up tube target comprising an N-type conductive film formed on a transparent substrate, and P-type photoconductive film in rectifying contact with the N-type conductive film and comprising a first layer containing As, fluoride and Se, a second layer containing As, Te and Se, a portion of said second layer containing fluoride, a third layer containing As and Se, the composition of the third layer being different along the direction of thickness thereof, a fourth layer containing As and Se, wherein the concentration of As in the second layer varies continuously along the direction of thickness thereof, and in the second layer the minimum As concentration is located on the first layer side of the second layer and the maximum As concentration is located on the third layer side of the second layer.Type: GrantFiled: February 19, 1986Date of Patent: January 5, 1988Assignees: Hitachi, Ltd., Nippon Hoso KyokaiInventors: Masanao Yamamoto, Eisuke Inoue, Keiichi Shidara, Eikyuu Hiruma
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Patent number: 4617248Abstract: A structure of a photoconductive film related to a target of an image pickup tube of the photo conductivity type is disclosed. This photoconductive film is formed from mainly Se and Te is added in a central part thereof. Further, As, which is considered to form a deep trap level which captures electrons in Se and GaF.sub.3, etc. which form negative space charges by capturing electrons in Se are added in the region adjacent to the region where Te exists. In addition, a thickness of film in the region where GaF.sub.3, etc. exists is selected to be thinner (not smaller than 20 .ANG. and not larger than 90 .ANG.) than a value which has been adopted so far.Type: GrantFiled: May 20, 1985Date of Patent: October 14, 1986Assignees: Nippon Hoso Kyokai, Hitachi, Ltd.Inventors: Kenkichi Tanioka, Keiichi Shidara, Takao Kuriyama, Yukio Takasaki, Tadaaki Hirai, Yasuhiko Nonaka, Eisuke Inoue
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Patent number: 4587456Abstract: An image pickup tube target includes a Se-As-Te photoconductive layer whose arsenic concentration changes in a direction of thickness of the Se-As-Te photoconductive layer, a carrier extraction layer having a high arsenic concentration and being contiguous to the Se-As-Te photoconductive layer, a capacitive layer having a low arsenic concentration and being contiguous to the carrier extraction layer, a doped layer obtained by doping In.sub.2 O.sub.3, MoO.sub.2 or a mixture thereof in an interface between the carrier extraction layer and the capacitive layer.Type: GrantFiled: January 17, 1984Date of Patent: May 6, 1986Assignee: Hitachi, Ltd.Inventors: Eisuke Inoue, Yasuhiko Nonaka, Masanao Yamamoto
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Patent number: 4563611Abstract: A photoconductive image pick-up tube target comprises a transparent substrate, an N-type conductive film formed on the transparent substrate, and a P-type photoconductive film in rectifying contact with the N-type conductive film and containing Se, As and Te as sensitizer. The P-type photoconductive film includes a first layer contiguous to the N-type conductive film and containing 94.+-.1% by weight of Se and 6.+-.0.5% by weight of As, a second layer formed on the first layer and containing 64.+-.4% by weight of Se, 3.+-.0.5% by weight of As, and 33.+-.2% by weight of Te, a third layer formed on the second layer and containing Se and As, and a fluoride doped region extending over the first layer and a front half layer of the second layer and having a fluoride concentration of 0.1 to 3.0% by weight. The third layer has an As concentration which has a peak of 28.+-.1% by weight at a site contiguous to a rear half layer of the second layer and reduces gradually.Type: GrantFiled: November 2, 1983Date of Patent: January 7, 1986Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nonaka, Eisuke Inoue, Keiichi Shidara, Kenkichi Tanioka
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Patent number: 4463279Abstract: A photoconductive film comprising a photo-conductive layer which is mainly made of selenium and a region added with tellurium in a direction of the thickness of the layer, wherein at least either one of a portion in a direction of hole flow of said region added with tellurium and a portion in the hole flow of another region which is located adjacent to said region added with tellurium is doped with at least one member selected from the group consisting of an oxide, a fluoride and elements which belong to the group II, III and VII, which are capable of forming a negative space charge in selenium, at a concentration in a range of 10 ppm to 1% by weight on an average. Typical examples of such oxide, fluoride and element include CuO, In.sub.2 O.sub.3, SeO.sub.2, V.sub.2 O.sub.5, MoO.sub.3, WO.sub.3, GaF.sub.2 InF.sub.3, Zn, Ga, In, Cl, I, Br and the like. The after image characteristic ascribable to incident light of high intensity can be significantly improved.Type: GrantFiled: May 21, 1982Date of Patent: July 31, 1984Assignees: Hitachi, Ltd., Nippon Hoso KyokaiInventors: Keiichi Shidara, Kenkichi Tanioka, Teruo Uchida, Chushirou Kusano, Yukio Takasaki, Yasuhiko Nonaka, Eisuke Inoue