Patents by Inventor Eisuke Mitani

Eisuke Mitani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5012109
    Abstract: A charged particle beam apparatus comprising a charged particle beam source(s) for generating an ion beam and an electron beam, a focusing lens system for finely focusing each of the generated ion beam and electron beam, a charged particle beam deflecting system for deflecting each of the focused ion beam and electron beam, and a specimen subjected to irradiation thereof with each of the focused ion beam and electron beam is provided with means for detecting the deviation of the irradiation positions of the ion beam and the electron beam on the specimen from each other and means for making the irradiation positions of the ion beam and the electron beam on the specimen coincident with each other on the basis of the result of detection of the deviation of the irradiation positions from each other.
    Type: Grant
    Filed: July 11, 1989
    Date of Patent: April 30, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyasu Shichi, Setsuo Nomura, Eisuke Mitani
  • Patent number: 4851673
    Abstract: A secondary ion mass spectrometer including primary ion emitting means for generating a primary ion to irradiate a specimen with the primary ion, means for separating secondary ions sputtered from the specimen, in accordance with mass-to-charge ratios, and detection means for detecting a secondary ion current emerging from the secondary ion separating means is disclosed, in which, when the value of the secondary ion current becomes greater than the upper limit of the dynamic range of the detecting means, the secondary ion current is attenuated by an attenuator, and the value of secondary ion current detected by the detection means is divided by the attenuation factor of the attenuator to obtain a corrected value. Thus, the secondary ion mass spectrometer is prevented from producing an erroneous analytical result due to the saturation of the detection means, that is, has a wide dynamic range, in which the amount of secondary ion varies by eight to ten orders of magnitude.
    Type: Grant
    Filed: August 4, 1988
    Date of Patent: July 25, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Izumi, Hiroshi Iwamoto, Eisuke Mitani, Hiroyasu Shichi
  • Patent number: 4476466
    Abstract: A method of driving a gas-discharge panel having at least one reset electrode and cathode and anode groups for forming N electrode pairs. The cathodes are p-phase connected (p.gtoreq.3) while the anodes are m-phase connected (m.ltoreq.p). The reset electrode is applied with a reset pulse voltage having a period of T of one frame. Cathode pulse voltages having their pulse widths of (p-1)T/N are successively applied to the cathodes for respective p phases with a phase shift of T/N to each other while anode pulse voltages having their pulse widths of at maximum (m-1)T/N are successively applied to the anodes for respective m phases with a phase shift of T/N to each other. A reset discharge which is generated by the reset pulse voltage and the first one of the cathode pulse voltages and anode pulse voltages applied for each frame and having a value cooperating with the reset pulse voltage value is successively transferred by means of the cathode and anode voltages to display desired information.
    Type: Grant
    Filed: May 1, 1981
    Date of Patent: October 9, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Eisuke Mitani, Yukio Okamoto, Atsushi Sumioka
  • Patent number: 4333040
    Abstract: A gas discharge display device comprising alternately disposed anodes and cathodes, wherein the anodes and the cathodes are interconnected respectively in multi-phase connections whereby a bar-graph display can be effected by means of a self-scanning function.
    Type: Grant
    Filed: June 19, 1979
    Date of Patent: June 1, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Yukio Okamoto, Eisuke Mitani, Tadao Okabe, Atsushi Sumioka