Patents by Inventor Eisuke NUMAZAWA

Eisuke NUMAZAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220384183
    Abstract: A substrate cleaning method includes: providing a substrate including a low-k layer containing silicon to a substrate support; etching the low-k layer by a plasma generated from a first gas; separating the etched substrate from the substrate support; and removing a reaction product attached to the substrate in the etching by a plasma generated from a second gas. The second gas includes a first carbon-containing gas represented by CxHyFz (y?0, x/z>ΒΌ).
    Type: Application
    Filed: May 25, 2022
    Publication date: December 1, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Wakako ISHIDA, Yasunori HATAMURA, Eundo BAE, Kazuya KATO, Inho JANG, Eisuke NUMAZAWA