Patents by Inventor Eizo Watanabe

Eizo Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for preparing thin film
    Patent number: 7727597
    Abstract: The present invention provides a method and an apparatus for preparing a silicon-containing solid film, which can form a thin film uniformly over a wide area. Raw-material fluid comprising a silane derivative and a hydrocarbon derivative is mixed with carrier fluid comprising carbon dioxide to form a supercritical condition. Further, an active-state is produced in the raw-material fluid of the supercritical fluid by a catalytic reaction with at least one metal catalyst selected from a group consisting of platinum, tungsten, cobalt, nickel, iron or an alloy of each of them. The fluid is blown to the substrate, thereby forming a silicon-containing solid film or a hydrocarbon-containing solid film on the substrate.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: June 1, 2010
    Assignees: Tokyo University of Agriculture & Tech., Itec Co., Ltd.
    Inventors: Eizo Watanabe, Toshiyuki Watanabe, Masato Sone, Yoshinori Matsuoka, Hideo Miyake, Masayasu Iida
  • Method And Apparatus For Preparing Thin Film
    Publication number: 20080166491
    Abstract: The present invention provides a method and an apparatus for preparing a silicon-containing solid film, which can form a thin film uniformly over a wide area. Raw-material fluid comprising a silane derivative and a hydrocarbon derivative is mixed with carrier fluid comprising carbon dioxide to form a supercritical condition. Further, an active-state is produced in the raw-material fluid of the supercritical fluid by a catalytic reaction with at least one metal catalyst selected from a group consisting of platinum, tungsten, cobalt, nickel, iron or an alloy of each of them. The fluid is blown to the substrate, thereby forming a silicon-containing solid film or a hydrocarbon-containing solid film on the substrate.
    Type: Application
    Filed: September 30, 2005
    Publication date: July 10, 2008
    Applicants: TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, ITEC CO., LTD.
    Inventors: Eizo Watanabe, Toshiyuki Watanabe, Masato Sone, Yoshinori Matsuoka, Hideo Miyake, Masayasu Iida