Abstract: An integrated circuit (IC) includes self-calibrating programmable digital logic circuitry. The IC includes at least one programmable digital logic cell, wherein the first programmable digital logic cell provides (i) a plurality of different accessible circuit configurations or (ii) a voltage level controller. A self-calibration system is provided that includes at least one reference device, a measurement device for measuring at least one electrical performance parameter that can affect a processing speed of the first programmable digital logic cell or at least one parameter that can affect the electrical performance parameter using the reference device to obtain calibration data. A processing device maps the calibration data or a parameter derived therefrom to generate a control signal that is operable to select from the plurality of different accessible circuit configurations or a voltage level output to change the processing speed of the programmable digital logic cell.

Abstract: An integrated circuit (IC) includes at least one programmable digital logic cell that includes first dedicated digital logic cell having a plurality of transistors including at least one PMOS transistor and at least one NMOS transistor configured to perform at least one digital logical function. The first dedicated digital logic cell includes a plurality of nodes including at least one input node and at least one output node that reflects performance of a digital logical function. Programmable tuning circuitry includes at least one tuning input and at least one tuning circuit output. Circuitry for coupling or decoupling the tuning input or tuning circuit output to at least one of the plurality of nodes of the first dedicated digital logical cell is provided, wherein the coupling or decoupling is operable to change the processing speed for the first reprogrammable digital logic cell.

Abstract: An integrated circuit (IC) includes at least one programmable digital logic cell that includes first dedicated digital logic cell having a plurality of transistors including at least one PMOS transistor and at least one NMOS transistor configured to perform at least one digital logical function. The first dedicated digital logic cell includes a plurality of nodes including at least one input node and at least one output node that reflects performance of a digital logical function. Programmable tuning circuitry includes at least one tuning input and at least one tuning circuit output. Circuitry for coupling or decoupling the tuning input or tuning circuit output to at least one of the plurality of nodes of the first dedicated digital logical cell is provided, wherein the coupling or decoupling is operable to change the processing speed for the first reprogrammable digital logic cell.

Abstract: An integrated circuit (IC) includes self-calibrating programmable digital logic circuitry. The IC includes at least one programmable digital logic cell, wherein the first programmable digital logic cell provides (i) a plurality of different accessible circuit configurations or (ii) a voltage level controller. A self-calibration system is provided that includes at least one reference device, a measurement device for measuring at least one electrical performance parameter that can affect a processing speed of the first programmable digital logic cell or at least one parameter that can affect the electrical performance parameter using the reference device to obtain calibration data. A processing device maps the calibration data or a parameter derived therefrom to generate a control signal that is operable to select from the plurality of different accessible circuit configurations or a voltage level output to change the processing speed of the programmable digital logic cell.

Abstract: A pMOS transistor (601) is located in an n-well (602) and has at least one gate (603). Transistor (601) is connected between power pad Vdd or I/O pad (604) and ground potential Vss (605). Gate (603) is connected to power pad (604). The n-well (602) is capacitively (620) coupled to ground (605), decoupled from the transistor source (606) and floating under normal operating conditions. Under an ESD event, the diode formed by the source (606) and the n-well (602) is forward biased (n-well negatively biased) to turn on the lateral pnp transistor to discharge the ESD current. The well voltage keeps increasing up to the value that triggers the lateral bipolar pnp transistor. The ESD protection is scalable with the width of gate (603), improving with shrinking gate width.

Abstract: A pMOS transistor (601) is located in an n-well (602) and has at least one gate (603). Transistor (601) is connected between power pad Vdd or I/O pad (604) and ground potential Vss (605). Gate (603) is connected to power pad (604). The n-well (602) is capacitively (620) coupled to ground (605), decoupled from the transistor source (606) and floating under normal operating conditions. Under an ESD event, the diode formed by the source (606) and the n-well (602) is forward biased (n-well negatively biased) to turn on the lateral pnp transistor to discharge the ESD current. The well voltage keeps increasing up to the value that triggers the lateral bipolar pnp transistor. The ESD protection is scalable with the width of gate (603), improving with shrinking gate width.

Abstract: A bistable SCR-like switch (41) protects a signal line (65) of an SOI integrated circuit (40) against damage from ESD events. The bistable SCR-like switch (41) is provided by a first and a second transistors (42 and 44) which are formed upon the insulator layer (46) of the SOI circuit (40) and are separated from one another by an insulating region (60). Interconnections (62 and 64) extend between the two transistors (42 and 44) to connect a P region (62) of a first transistor (42) to a P region (54) of the second transistor (44) and an N region (50) of the first transistor (42) to an N region (58) of the second transistor (44). The transistors (42 and 44) may be either bipolar transistors or enhancement type MOSFET transistors. For bipolar transistors, the base of an NPN transistor (42) is connected to the collector of a PNP transistor (44) and the base of the PNP transistor (44) is connected to the collector of the NPN transistor (42).

Abstract: An embodiment of the instant invention is a method of optimizing an I/O circuit formed on a substrate with regards to an overvoltage or ESD event wherein the I/O circuit comprises at least one MOS device which has I-V characteristics, the method comprising the steps of: extracting selective electrical characteristics of the MOS device while the MOS device is operating in the avalanche and snapback regions of the I-V characteristics of the MOS device; characterizing the MOS device for the overvoltage or ESD event based on the electrical characteristics of the MOS device under standard operating conditions, the MOS device being comprised of a parasitic bipolar transistor and the substrate having a resistance; and wherein the I/O circuit is optimized for the overvoltage or ESD events by modifying the I/O circuit based on the electrical characteristics of the MOS device in conjunction with the characterization of the parasitic bipolar transistor and the substrate resistance.