Patents by Inventor Ekkehard Mann
Ekkehard Mann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10209294Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.Type: GrantFiled: December 5, 2013Date of Patent: February 19, 2019Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Bannwarth, Christian Fritsch, Ulrich Heller, Daniel Krausse, Rolf Merte, Moritz Nitschke, Peter Wiedemuth, Christian Bock, Michael Glueck, Thomas Kirchmeier, Ekkehard Mann, Krishna Kishore Nedunuri, Martin Steuber, Markus Winterhalter
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Patent number: 10212797Abstract: A method of maintaining a supply of power to a load comprising operating a power generator connected to a mains voltage in a rated operating mode, generating a power signal by the power generator, feeding the power signal to the load, monitoring the mains voltage or a variable derived therefrom for an occurrence of a first specified event, and operating the power generator in a first predefined operating mode based on the occurrence of the first specified event, wherein the first predefined operating mode differs from the rated operating mode.Type: GrantFiled: December 21, 2016Date of Patent: February 19, 2019Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Ekkehard Mann, Markus Winterhalter, Florian Zehetner
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Patent number: 9684327Abstract: In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.Type: GrantFiled: January 24, 2014Date of Patent: June 20, 2017Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Christian Fritsch, Ekkehard Mann, Gerhard Seifert
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Publication number: 20170105274Abstract: A method of maintaining a supply of power to a load comprising operating a power generator connected to a mains voltage in a rated operating mode, generating a power signal by the power generator, feeding the power signal to the load, monitoring the mains voltage or a variable derived therefrom for an occurrence of a first specified event, and operating the power generator in a first predefined operating mode based on the occurrence of the first specified event, wherein the first predefined operating mode differs from the rated operating mode.Type: ApplicationFiled: December 21, 2016Publication date: April 13, 2017Inventors: Ekkehard Mann, Markus Winterhalter, Florian Zehetner
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Patent number: 8884523Abstract: For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.Type: GrantFiled: November 5, 2007Date of Patent: November 11, 2014Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Winterhalter, Ekkehard Mann
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Publication number: 20140159580Abstract: In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.Type: ApplicationFiled: January 24, 2014Publication date: June 12, 2014Applicant: TRUMPF Huettinger GmbH + Co. KGInventors: Christian Fritsch, Ekkehard Mann, Gerhard Seifert
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Publication number: 20140159741Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.Type: ApplicationFiled: December 5, 2013Publication date: June 12, 2014Applicant: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Bannwarth, Christian Fritsch, Ulrich Heller, Daniel Krausse, Rolf Merte, Moritz Nitschke, Peter Wiedemuth, Christian Bock, Michael Glueck, Thomas Kirchmeier, Ekkehard Mann, Krishna Kishore Nedunuri, Martin Steuber, Markus Winterhalter
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Patent number: 8203398Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.Type: GrantFiled: August 7, 2009Date of Patent: June 19, 2012Assignee: Huettinger Elektronik GmbH + Co. KGInventors: Ekkehard Mann, Christoph Gerhardt, Christian Thome, Christian Wangler, Daniel Krausse, Stephan Guenther, Rolf Weber
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Patent number: 8190969Abstract: A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.Type: GrantFiled: May 18, 2007Date of Patent: May 29, 2012Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Markus Winterhalter, Ekkehard Mann
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Patent number: 8018243Abstract: In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h?, h?1, h?2) is further determined as a second measurement value, in particular, by means of the time difference (?t) between the zero passages of the auxiliary signals (h, h?, h?1, h?2).Type: GrantFiled: November 24, 2008Date of Patent: September 13, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Ekkehard Mann, Christian Fritsch, Christoph Obrecht
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Patent number: 7981306Abstract: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.Type: GrantFiled: August 11, 2006Date of Patent: July 19, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Manfred Blattner, Markus Winterhalter, Ekkehard Mann
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Patent number: 7745955Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.Type: GrantFiled: October 16, 2006Date of Patent: June 29, 2010Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Thomas Kirchmeier, Ekkehard Mann, Michael Glück, Christoph Hofstetter, Christoph Gerhardt, Gerd Hintz
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Publication number: 20100026415Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.Type: ApplicationFiled: August 7, 2009Publication date: February 4, 2010Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Ekkehard Mann, Christoph Gerhardt, Christian Thome, Christian Wangler, Daniel Krausse, Stephan Guenther, Rolf Weber
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Publication number: 20090140722Abstract: In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h?, h?1, h?2) is further determined as a second measurement value, in particular, by means of the time difference (?t) between the zero passages of the auxiliary signals (h, h?, h?1, h?2).Type: ApplicationFiled: November 24, 2008Publication date: June 4, 2009Applicant: HUETTINGER Elektronik GmbH + Co. KGInventors: Ekkehard Mann, Christian Fritsch, Christoph Obrecht
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Publication number: 20080150361Abstract: A plasma power supply controller jointly monitors a plurality of plasma power supply devices of one or more electrical loads. The controller includes at least one signal input, at least one signal output connected to at least one first logic switching device configured to actuate a first power interrupter of at least one of the plasma power supply devices, and a safety switching device. The at least one signal input is configured to receive indication signals of at least one indication device. The safety switching device is configured to detect a state or a state change of at least one of the indication devices and to interrupt the current supply of at least one of the plasma power supply devices using the first logic switching device upon a detection of a predetermined state or upon a detection of a state change of at least one of the indication devices.Type: ApplicationFiled: December 6, 2007Publication date: June 26, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Michael Helde, Ekkehard Mann, Christian Fritsch
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Publication number: 20080105538Abstract: For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.Type: ApplicationFiled: November 5, 2007Publication date: May 8, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Markus Winterhalter, Ekkehard Mann
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Patent number: 7321227Abstract: A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.Type: GrantFiled: April 12, 2006Date of Patent: January 22, 2008Assignee: Huettinger Elektronik GmbH + Co. KGInventors: Christian Fritsch, Ekkehard Mann
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Publication number: 20070294608Abstract: A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.Type: ApplicationFiled: May 18, 2007Publication date: December 20, 2007Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Markus Winterhalter, Ekkehard Mann
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Publication number: 20070145900Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.Type: ApplicationFiled: October 16, 2006Publication date: June 28, 2007Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Thomas Kirchmeier, Ekkehard Mann, Michael Gluck, Christoph Hofstetter, Christoph Gerhardt, Gerd Hintz
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Publication number: 20070044715Abstract: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.Type: ApplicationFiled: August 11, 2006Publication date: March 1, 2007Applicant: HUETTINGER Elektronik GmbH + Co. KGInventors: Manfred Blattner, Markus Winterhalter, Ekkehard Mann