Abstract: A method includes providing a first power from an output terminal of a balanced amplifier to a discharge chamber. The balanced amplifier includes two amplifier paths, each of which supplies a signal to a coupler. The coupler is configured to combine the signals as a function of their phase relationship and supply a power as the first power to the output terminal and/or as a second power to an isolation terminal. The method further includes setting a first phase relationship between the signals for a predefined time in order to ignite the plasma, and setting a second phase relationship in order to maintain the plasma. Under the second phase relationship, substantially an entirety of the power is supplied to the output terminal. Under the first phase relationship, a third power reflected from the discharge chamber is reflected back to the discharge chamber in a proportion large enough for the ignition.

Abstract: A method for igniting and supplying a laser or a processing plasma in a discharge chamber with electrical power includes providing a power from an output terminal of an amplifier to the discharge chamber. The amplifier includes two amplifier paths, each of which supplies a respective signal to a combiner. The combiner is configured to combine the signals as a function of an amplitude relationship and/or a phase relationship between the signals and to supply the power to the output terminal and/or an isolation terminal. The method further includes actuating an impedance switching arrangement connected to the isolation terminal and a ground according to a first actuation mode in order to ignite the laser or the processing plasma, and actuating the impedance switching arrangement according to a second actuation mode in order to operate the laser or maintain the processing plasma in the discharge chamber.

Abstract: A method of maintaining a supply of power to a load comprising operating a power generator connected to a mains voltage in a rated operating mode, generating a power signal by the power generator, feeding the power signal to the load, monitoring the mains voltage or a variable derived therefrom for an occurrence of a first specified event, and operating the power generator in a first predefined operating mode based on the occurrence of the first specified event, wherein the first predefined operating mode differs from the rated operating mode.

Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.

Abstract: In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.

Abstract: A method of maintaining a supply of power to a load comprising operating a power generator connected to a mains voltage in a rated operating mode, generating a power signal by the power generator, feeding the power signal to the load, monitoring the mains voltage or a variable derived therefrom for an occurrence of a first specified event, and operating the power generator in a first predefined operating mode based on the occurrence of the first specified event, wherein the first predefined operating mode differs from the rated operating mode.

Abstract: For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.

Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.

Abstract: In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.

Abstract: In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h?, h?1, h?2) is further determined as a second measurement value, in particular, by means of the time difference (?t) between the zero passages of the auxiliary signals (h, h?, h?1, h?2).

Abstract: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h?, h?1, h?2) is further determined as a second measurement value, in particular, by means of the time difference (?t) between the zero passages of the auxiliary signals (h, h?, h?1, h?2).

Abstract: A plasma power supply controller jointly monitors a plurality of plasma power supply devices of one or more electrical loads. The controller includes at least one signal input, at least one signal output connected to at least one first logic switching device configured to actuate a first power interrupter of at least one of the plasma power supply devices, and a safety switching device. The at least one signal input is configured to receive indication signals of at least one indication device. The safety switching device is configured to detect a state or a state change of at least one of the indication devices and to interrupt the current supply of at least one of the plasma power supply devices using the first logic switching device upon a detection of a predetermined state or upon a detection of a state change of at least one of the indication devices.

Abstract: For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.

Abstract: A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.

Abstract: A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.