Patents by Inventor El-Badawy El-Sharawy

El-Badawy El-Sharawy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anti-resonance mask for off-axis photolithography
    Publication number: 20030059687
    Abstract: A lithographic mask for use in an off-axis illumination system is provided. The mask includes a transparent substrate and a first patterned layer of an opaque material proximate to a first side of the transparent substrate. A second patterned layer is formed over the first patterned layer. The second patterned layer comprising a dielectric material configured to phase shift an exposure energy directed towards the mask. Over the second patterned layer a third patterned layer is formed. The third patterned layer is manufactured from an opaque material.
    Type: Application
    Filed: September 21, 2001
    Publication date: March 27, 2003
    Applicant: National Scientific Corporation
    Inventor: El-Badawy El-Sharawy