Patents by Inventor Elaina Babayan

Elaina Babayan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TECHNIQUES FOR CONTROLLING PRECURSORS IN CHEMICAL DEPOSITION PROCESSES
    Publication number: 20230323540
    Abstract: An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
    Type: Application
    Filed: June 9, 2023
    Publication date: October 12, 2023
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Elaina BABAYAN, Sarah WHITE, Vijay VENUGOPAL, Jonathan BAKKE
  • Techniques for controlling precursors in chemical deposition processes
    Patent number: 11718914
    Abstract: An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
    Type: Grant
    Filed: September 4, 2020
    Date of Patent: August 8, 2023
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Elaina Babayan, Sarah White, Vijay Venugopal, Jonathan Bakke
  • TECHNIQUES FOR CONTROLLING PRECURSORS IN CHEMICAL DEPOSITION PROCESSES
    Publication number: 20200399758
    Abstract: An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
    Type: Application
    Filed: September 4, 2020
    Publication date: December 24, 2020
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Elaina Babayan, Sarah White, Vijay Venugopal, Jonathan Bakke
  • Techniques for controlling precursors in chemical deposition processes
    Patent number: 10822699
    Abstract: An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
    Type: Grant
    Filed: April 5, 2018
    Date of Patent: November 3, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Elaina Babayan, Sarah White, Vijay Venugopal, Jonathan Bakke
  • TECHNIQUES FOR CONTROLLING PRECURSORS IN CHEMICAL DEPOSITION PROCESSES
    Publication number: 20190203358
    Abstract: An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
    Type: Application
    Filed: April 5, 2018
    Publication date: July 4, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Elaina Babayan, Sarah White, Vijay Venugopal, Jonathan Bakke