Patents by Inventor Elaine R. Kleinfeld

Elaine R. Kleinfeld has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160211644
    Abstract: Edge-emitting laser chip wafer layouts are provided that enable a variety of tests to be performed while the chips are on the wafer, including side-mode suppression ratio (SMSR) tests. The laser chip wafer layouts include turning mirrors that direct light passing out of at least one of the facets of the chips away from the wafer. Directing the light out of the wafer in this manner allows external test and measurement equipment to perform SMSR testing on the chips prior to singulation.
    Type: Application
    Filed: January 19, 2015
    Publication date: July 21, 2016
    Inventors: Elaine R. Kleinfeld, Yufei Gao, John J. Leiby, James R. Lothian
  • Patent number: 6900265
    Abstract: An improved method of making CASE materials is provided, wherein the method utilizes a polymer latex derived from at least one ethylenically unsaturated monomer and at least one polymerizable surface active agent. The polymerizable surface active agent is capable of co-polymerization with traditional monomers and is preferably substantially completely consumed during the course of the polymerization. Latex polymers produced by the method of the present invention are well suited for use in coatings, adhesives, sealants, elastomers. Additionally, the present invention relates to improved coating, adhesive, sealant and elastomer (CASE) materials utilizing polymer latexes derived from various monomers and ethylenically unsaturated amine salts of sulfonic, phosphoric and/or carboxylic acids.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: May 31, 2005
    Assignee: Stepan Company
    Inventors: Alfred K. Schultz, Adnan Siddiqui, Elaine R. Kleinfeld
  • Publication number: 20040092632
    Abstract: An improved method of making CASE materials is provided, wherein the method utilizes a polymer latex derived from at least one ethylenically unsaturated monomer and at least one polymerizable surface active agent. The polymerizable surface active agent is capable of co-polymerization with traditional monomers and is preferably substantially completely consumed during the course of the polymerization. Latex polymers produced by the method of the present invention are well suited for use in coatings, adhesives, sealants, elastomers. Additionally, the present invention relates to improved coating, adhesive, sealant and elastomer (CASE) materials utilizing polymer latexes derived from various monomers and ethylenically unsaturated amine salts of sulfonic, phosphoric and/or carboxylic acids.
    Type: Application
    Filed: April 10, 2002
    Publication date: May 13, 2004
    Applicant: Stepan Company
    Inventors: Alfred K. Schultz, Adnan Siddiqui, Elaine R. Kleinfeld
  • Patent number: 6022590
    Abstract: A two-step adsorption process for producing ordered organic/inorganic multilayer structures is provided. Multilayered films are formed on metallic and nonmetallic substrates by alternate adsorption of a cationic polyelectrolyte and anionic sheets of a silicate clay. The two-step adsorption process is not only fast but allows also for preparation of multilayer elements of thicknesses greater than about 2200 Angstroms on silicon, and greater than about 1500 Angstroms on gold, silver, and copper.
    Type: Grant
    Filed: January 5, 1998
    Date of Patent: February 8, 2000
    Assignee: Competitive Technologies, Inc.
    Inventors: Gregory S. Ferguson, Elaine R. Kleinfeld
  • Patent number: 5716709
    Abstract: A two-step adsorption process for producing ordered organic/inorganic multilayer structures is provided. Multilayered films are formed on metallic and nonmetallic substrates by alternate adsorption of a cationic polyelectrolyte and anionic sheets of a silicate clay. The two-step adsorption process is not only fast but allows also for preparation of multilayer elements of thicknesses greater than about 2200 Angstroms on silicon, and greater than about 1500 Angstroms on gold, silver, and copper.
    Type: Grant
    Filed: July 14, 1994
    Date of Patent: February 10, 1998
    Assignee: Competitive Technologies, Inc.
    Inventors: Gregory S. Ferguson, Elaine R. Kleinfeld