Patents by Inventor Elena Starodub

Elena Starodub has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9156068
    Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.
    Type: Grant
    Filed: September 10, 2014
    Date of Patent: October 13, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Leonard E. Klebanoff, Gildardo R. Delgado, Jeromy T. Hollenshead, Karl R. Umstadter, Elena Starodub, Guorong V. Zhuang
  • Publication number: 20140374619
    Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.
    Type: Application
    Filed: September 10, 2014
    Publication date: December 25, 2014
    Inventors: Leonard E. Klebanoff, Gildardo R. Delgado, Jeromy T. Hollenshead, Karl R. Umstadter, Elena Starodub, Guorong V. Zhuang
  • Publication number: 20140158914
    Abstract: An optical component arranged for use in a low pressure environment including: a surface arranged to receive extreme ultra-violet (EUV) light and a coating, on the surface, arranged to block at least one contaminant in the low pressure environment from binding to the surface. A method of mitigating contamination of a surface of an optical component, including: inserting the optical component into a chamber for a semi-conductor inspection system, controlling a temperature and a pressure within the chamber, introducing a blocking material, in a gaseous state, into the chamber, coating a surface of the optical component with the blocking material, and preventing, using the coating, a contaminant in the chamber from binding to the optical component.
    Type: Application
    Filed: December 9, 2013
    Publication date: June 12, 2014
    Inventors: Leonard E. Klebanoff, Jeromy T. Hollenshead, Gildardo Delgado, Elena Starodub, Karl R. Umstadter, Guorong V. Zhuang, Garry Rose