Patents by Inventor Eleni PSARA

Eleni PSARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing method
    Patent number: 9798225
    Abstract: A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more characteristics of the mask. The method can be used to model shadowing effects of a EUV mask with a thick absorber illuminated at an angle.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Eelco Van Setten, Natalia Viktorovna Davydova, Eleni Psara, Anton Bernhard Van Oosten
  • METHOD OF CHARACTERIZING, METHOD OF FORMING A MODEL, METHOD OF SIMULATING, MASK MANUFACTURING METHOD AND DEVICE MANUFACTURING METHOD
    Publication number: 20160266483
    Abstract: A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more characteristics of the mask. The method can be used to model shadowing effects of a EUV mask with a thick absorber illuminated at an angle.
    Type: Application
    Filed: October 14, 2014
    Publication date: September 15, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Eelco VAN SETTEN, Natalia Viktorovna DAVYDOVA, Eleni PSARA, Anton Bernhard VAN OOSTEN