Patents by Inventor Eliberthus Houtman

Eliberthus Houtman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5446777
    Abstract: For position-sensitive measurements, an X-ray analysis system comprises a one-dimensional position-sensitive detector and a detection Soller slit system in order to achieve position sensitivity in a direction transversely of the dispersion direction of the detector. Different position-sensitive measurement methods can be carried out by adaptation of the Soller slit system and the orientation of the one-dimensional position-sensitive detector.
    Type: Grant
    Filed: August 8, 1994
    Date of Patent: August 29, 1995
    Assignee: U.S. Philips Corporation
    Inventor: Eliberthus Houtman
  • Patent number: 4800580
    Abstract: In an X-ray analysis apparatus provided with a detector comprising photodiode-detection elements, it is possible to eliminate the dark current and the background current from the measurement signals due to the fact that elements in the signal reading device can be combined. Due to the fact that also during the measurement at a stationary peak beside the signal amplitude also signal ratios can be obtained from combinations of detector elements, the correct position and amplitude of the peaks to be measured can be determined. The detector can also be provided with mutually separated detector elements which have such a surface area and configuration that the dark surrent can already be compensated thereby.
    Type: Grant
    Filed: October 20, 1986
    Date of Patent: January 24, 1989
    Assignee: U.S. Philips Corporation
    Inventors: Eliberthus Houtman, Geert Brouwer