Patents by Inventor Elie Schapmans

Elie Schapmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming an extreme ultraviolet lithography pellicle
    Patent number: 11599019
    Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: March 7, 2023
    Assignee: IMEC VZW
    Inventors: Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans, Emily Gallagher
  • METHOD FOR GROWING A DIELECTRIC MATERIAL ON A SURFACE
    Publication number: 20210320001
    Abstract: A method for growing a dielectric material on a surface comprises introducing the surface into a first process chamber; in the first process chamber, exposing the surface to a first precursor, thereby adsorbing the first precursor to the surface; without purging the first process chamber, introducing the surface into a second process chamber; and in the second process chamber, exposing the surface to a second precursor thereby reacting the adsorbed first precursor with the second precursor to grow the dielectric material on the surface.
    Type: Application
    Filed: April 8, 2021
    Publication date: October 14, 2021
    Inventors: Daire Cott, Elie Schapmans
  • Method for Forming an Extreme Ultraviolet Lithography Pellicle
    Publication number: 20210191255
    Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.
    Type: Application
    Filed: December 22, 2020
    Publication date: June 24, 2021
    Inventors: Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans, Emily Gallagher