Patents by Inventor Elief Paffrath

Elief Paffrath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for measuring alpha particle induced soft errors in semiconductor devices
    Patent number: 9291660
    Abstract: An apparatus includes a probe card, an alpha particle source and a shutter. The probe card includes a plurality of contact elements. The contact elements define a measuring position. The shutter is arranged between the alpha particle source and the measuring position. The shutter is movable between a closed position and an open position. When the shutter is in the open position, alpha particles from the alpha particle source reach the measuring position. When the shutter is in the closed position, the alpha particles are blocked from reaching the measuring position.
    Type: Grant
    Filed: January 22, 2013
    Date of Patent: March 22, 2016
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Elief Paffrath, Frank Schreiter
  • METHOD AND APPARATUS FOR MEASURING ALPHA PARTICLE INDUCED SOFT ERRORS IN SEMICONDUCTOR DEVICES
    Publication number: 20140203814
    Abstract: An apparatus includes a probe card, an alpha particle source and a shutter. The probe card includes a plurality of contact elements. The contact elements define a measuring position. The shutter is arranged between the alpha particle source and the measuring position. The shutter is movable between a closed position and an open position. When the shutter is in the open position, alpha particles from the alpha particle source reach the measuring position. When the shutter is in the closed position, the alpha particles are blocked from reaching the measuring position.
    Type: Application
    Filed: January 22, 2013
    Publication date: July 24, 2014
    Applicant: GLOBALFOUNDRIES Inc.
    Inventors: Elief Paffrath, Frank Schreiter