Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material by reactive-ion etching, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple silicon oxide or a mixed silicon oxide, most of the oxides in the case of a mixed oxide being silicon oxide, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the silicon of the oxide, a molar percentage of the species in the material ranging from 1 mol % or even up to 50 mol % while remaining below the percentage of the silicon oxide, at least most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the etching; structuring the surface of the hybrid material, without masking, with etching that lasts less t

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the

Abstract: The invention relates: to a process for forming a texture on a substrate, comprising: depositing a deformable layer on the substrate; bringing this deformable layer into contact with the textured face of a daughter stamp; introducing the coated substrate and the daughter stamp into a pouch made of an impermeable material; introducing the pouch and its contents into a hermetic vessel; evacuating air from the vessel until a pressure at most equal to 0.5 bar is reached; sealing the pouch before reintroducing air into the vessel; introducing the sealed pouch and its contents into an autoclave; applying a pressure comprised between 0.5 and 8 bar and a temperature comprised between 25 and 400° C.

Abstract: The invention relates: to a process for forming a texture on a substrate, comprising: depositing a deformable layer on the substrate; bringing this deformable layer into contact with the textured face of a daughter stamp; introducing the coated substrate and the daughter stamp into a pouch made of an impermeable material; introducing the pouch and its contents into a hermetic vessel; evacuating air from the vessel until a pressure at most equal to 0.5 bar is reached; sealing the pouch before reintroducing air into the vessel; introducing the sealed pouch and its contents into an autoclave; applying a pressure comprised between 0.5 and 8 bar and a temperature comprised between 25 and 400° C.

Abstract: The present invention relates to a process for surface structuring, that is to say, for meaning forming at least one array of patterns with a submillimeter scale characteristic lateral dimension on a flat surface of a product comprising a substrate bearing at least one layer resulting from a sol-gel process, where the structuring is done hot with a hydrolyzed sol layer based on alkoxides and/or halide(s) of at least one metal chosen among Si, Ti, Zr, W, Sb, Hf, Ta, V, Mg, Al, Mn, Co, Ni, Sn, Zn, and Ce with a nonreactive organic group, where the structuring is carried out by contact with a structured mask and exerting pressure as needed, and where the structuring is carried out in a temperature range suited for a sufficient condensation threshold ensuring the thermal hold of the structuring, with a total structuring time less than or equal to two hours. The invention also covers the resulting product.

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the

Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material by reactive-ion etching, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple silicon oxide or a mixed silicon oxide, most of the oxides in the case of a mixed oxide being silicon oxide, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the silicon of the oxide, a molar percentage of the species in the material ranging from 1 mol % or even up to 50 mol % while remaining below the percentage of the silicon oxide, at least most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the etching; structuring the surface of the hybrid material, without masking, with etching that lasts less t

Abstract: The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.

Abstract: The present invention relates to a process for surface structuring, that is to say, for meaning forming at least one array of patterns with a submillimeter scale characteristic lateral dimension on a flat surface of a product comprising a substrate bearing at least one layer resulting from a sol-gel process, where the structuring is done hot with a hydrolyzed sol layer based on alkoxides and/or halide(s) of at least one metal chosen among Si, Ti, Zr, W, Sb, Hf, Ta, V, Mg, Al, Mn, Co, Ni, Sn, Zn, and Ce with a nonreactive organic group, where the structuring is carried out by contact with a structured mask and exerting pressure as needed, and where the structuring is carried out in a temperature range suited for a sufficient condensation threshold ensuring the thermal hold of the structuring, with a total structuring time less than or equal to two hours. The invention also covers the resulting product.

Abstract: The invention relates to a process for structuring a surface, that is to say for forming at least one array of features with a submillimeter-scale lateral characteristic dimension on a plane surface of a product comprising a rigid glass element (1) and at least one layer (1a) attached to said glass element (1), the structuring being carried out on said layer (1a) and a surface structuring, by plastic or viscoplastic deformation, being carried out by contact with a structured element called a mask (10) with application of pressure, the structuring taking place by a continuous movement, parallel to the surface, of the product and by a movement of the mask about an axis parallel to the plane of the surface of the product. The invention also relates to a glass product having a structured surface and to its uses.

Abstract: The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.