Patents by Inventor Elisa Riedo

Elisa Riedo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11591716
    Abstract: An ultra-hard carbon film is formed by the uniaxial compression of thin films of graphene. The graphene films are two or three layers thick (2-L or 3-L). High pressure compression forms a diamond-like film and provides improved properties to the coated substrates.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: February 28, 2023
    Assignees: Research Foundation of the City University of New York, New York University
    Inventors: Yang Gao, Tengfei Cao, Filippo Cellini, Elisa Riedo, Angelo Bongiorno
  • Publication number: 20220249740
    Abstract: Described herein are methods for using localized source of heat, such as thermal scanning probe lithography (tSPL), for the low-cost and high-throughput fabrication of biological tissue replicas.
    Type: Application
    Filed: February 3, 2022
    Publication date: August 11, 2022
    Inventors: Giuseppe Maria de Peppo, Elisa Riedo
  • Publication number: 20210404091
    Abstract: An ultra-hard carbon film is formed by the uniaxial compression of thin films of graphene. The graphene films are two or three layers thick (2-L or 3-L). High pressure compression forms a diamond-like film and provides improved properties to the coated substrates.
    Type: Application
    Filed: October 22, 2018
    Publication date: December 30, 2021
    Inventors: Yang GAO, Tengfei CAO, Filippo CELLINI, Elisa RIEDO, Angelo BONGIORNO
  • Publication number: 20160172092
    Abstract: Method for magnetic nanopatterning of a substrate 10, said substrate comprising a first ferromagnetic or ferrimagnetic phase FM and a second antiferromagnetic phase AF, said FM and AF phases being coupled by exchange bias in such a way to form an exchange bias system; said method comprising submitting said substrate to a magnetic field Hw so as to set the magnetization of said first phase FM in the direction of said magnetic field Hw, while heating predefined portions of said antiferromagnetic phase AF up to a writing temperature TW at which the exchange bias can be influenced, equipment for carrying out said method and substrate nanopatterned according to said method.
    Type: Application
    Filed: November 12, 2015
    Publication date: June 16, 2016
    Inventors: Riccardo BERTACCO, Daniela PETTI, Edoardo ALBISETTI, Elisa RIEDO
  • Patent number: 8468611
    Abstract: Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.
    Type: Grant
    Filed: June 1, 2010
    Date of Patent: June 18, 2013
    Assignee: Georgia Tech Research Corporation
    Inventors: Elisa Riedo, Seth R. Marder, Walt A. de Heer, Robert J. Szoskiewicz, Vamsi K. Kodali, Simon C. Jones, Takashi Okada, Debin Wang, Jennifer E. Curtis, Clifford L. Henderson, Yueming Hua
  • Publication number: 20110053805
    Abstract: Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.
    Type: Application
    Filed: June 1, 2010
    Publication date: March 3, 2011
    Applicant: Georgia Tech Research Corporation
    Inventors: Elisa Riedo, Seth R. Marder, Walt A. de Heer, Robert J. Szoszkiewicz, Vamsi K. Kodali, Simon C. Jones, Takashi Okada, Debin Wang, Jennifer E. Curtis, Clifford L. Henderson, Yueming Hua