Patents by Inventor ELISABETH EIDENBERGER

ELISABETH EIDENBERGER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11367599
    Abstract: A target for a cathode sputtering system has a tubular target body made of a sputtering material and at least one connector piece, which is connected to the target body and projects from the target body, for attaching the target body to the cathode sputtering system. The target body is connected to the at least one connector piece in a vacuum-tight manner and the two are rotationally fixed relative to one another. At least one damper element is provided between the at least one connector piece and the target body.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: June 21, 2022
    Assignee: Plansee SE
    Inventors: Andre Dronhofer, Christian Linke, Elisabeth Eidenberger-Schober
  • Patent number: 11047038
    Abstract: A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and usual impurities, and structuring the metallization by using at least one photolithographic process and at least one subsequent etching step. A sputtering target is composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a sputtering target composed of an Mo-based alloy includes providing a powder mixture containing Mo and also Al and Ti and cold gas spraying (CGS) of the powder mixture onto a suitable support material.
    Type: Grant
    Filed: August 10, 2015
    Date of Patent: June 29, 2021
    Assignee: Plansee SE
    Inventors: Harald Koestenbauer, Judith Koestenbauer, Gerhard Leichtfried, Joerg Winkler, Moo Sung Hwang, Martin Kathrein, Elisabeth Eidenberger
  • Publication number: 20180144913
    Abstract: A target for a cathode sputtering system has a tubular target body made of a sputtering material and at least one connector piece, which is connected to the target body and projects from the target body, for attaching the target body to the cathode sputtering system. The target body is connected to the at least one connector piece in a vacuum-tight manner and the two are rotationally fixed relative to one another. At least one damper element is provided between the at least one connector piece and the target body.
    Type: Application
    Filed: April 28, 2016
    Publication date: May 24, 2018
    Inventors: ANDRE DRONHOFER, CHRISTIAN LINKE, ELISABETH EIDENBERGER
  • Publication number: 20170260622
    Abstract: A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and usual impurities, and structuring the metallization by using at least one photolithographic process and at least one subsequent etching step. A sputtering target is composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a sputtering target composed of an Mo-based alloy includes providing a powder mixture containing Mo and also Al and Ti and cold gas spraying (CGS) of the powder mixture onto a suitable support material.
    Type: Application
    Filed: August 10, 2015
    Publication date: September 14, 2017
    Inventors: HARALD KOESTENBAUER, JUDITH KOESTENBAUER, GERHARD LEICHTFRIED, JOERG WINKLER, MOO SUNG HWANG, MARTIN KATHREIN, ELISABETH EIDENBERGER