Patents by Inventor Elisabeth Schneider

Elisabeth Schneider has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240077380
    Abstract: A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating an irradiance profile for at least one optical element of the projection system from a power and illumination source pupil of the radiation beam, estimating a temperature distribution as a function of time in the at least one optical element of the projection system using the calculated irradiance profile for the at least one optical element of the projection system; calculating the thermally induced aberrations of the projection system based on the estimated temperature distribution and a thermal expansion parameter map associated with the at least one optical element of the projection system, wherein the thermal expansion parameter map is a spatial map indicating spatial variations of thermal expansion parameters in the at least one optical element of the projection system or a uniform map.
    Type: Application
    Filed: January 5, 2022
    Publication date: March 7, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Marinus Maria Johannes VAN DE WAL, Koos VAN BERKEL, Victor Sebastiaan DOLK, Stijn Clyde Natalia THISSEN, Mauritius Gerardus Elisabeth SCHNEIDERS, Adrianus Hendrik KOEVOETS
  • Publication number: 20230273527
    Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.
    Type: Application
    Filed: June 17, 2021
    Publication date: August 31, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Mauritius Gerardus Elisabeth SCHNEIDERS, Koos VAN BERKEL, Wenjie JIN
  • Publication number: 20230229090
    Abstract: The invention provides a method for thermo-mechanical control of a heat sensitive element (Ml) subject to a heat load, comprising: -providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between characteristics of the heat load and deformation of the heat sensitive element; -calculating a control signal on the basis of an optimization calculation of the non-linear model, -providing an actuation signal to a heater (HE), wherein the actuation signal is at least partially based on the control signal, -heating the heat sensitive element by the heater on the basis of the actuation signal.
    Type: Application
    Filed: June 2, 2021
    Publication date: July 20, 2023
    Inventors: Victor Sebastiaan Dolk, Koos Van Berkel, Mauritius Gerardus Elisabeth Schneiders
  • Patent number: 8786830
    Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.
    Type: Grant
    Filed: April 15, 2010
    Date of Patent: July 22, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christophe De Metsenaere, Ronald Casper Kunst, Paul Petrus Joannes Berkvens, Mauritius Gerardus Elisabeth Schneiders, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran
  • Patent number: 7948609
    Abstract: In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the position in a feedback manner, the feedback control loop having a setpoint input, and an acceleration feedforward to generate a feedforward signal to be forwardly fed into the feedback control loop. The feedforward signal is derived from the setpoint signal. The stage control system is arranged to modify the position setpoint signal into a modified position setpoint signal, the setpoint input of the feedback control loop to receive the modified position setpoint signal, the modified position setpoint signal to take account of a non rigid body behavior of the stage.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: May 24, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Mauritius Gerardus Elisabeth Schneiders, Wilhelmus Franciscus Johannes Simons
  • Publication number: 20100290013
    Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.
    Type: Application
    Filed: April 15, 2010
    Publication date: November 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christophe DE METSENAERE, Ronald Casper Kunst, Paul Petrus Joannes Berkvens, Mauritius Gerardus Elisabeth Schneiders, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran
  • Publication number: 20090231566
    Abstract: In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the position in a feedback manner, the feedback control loop having a setpoint input, and an acceleration feedforward to generate a feedforward signal to be forwardly fed into the feedback control loop. The feedforward signal is derived from the setpoint signal. The stage control system is arranged to modify the position setpoint signal into a modified position setpoint signal, the setpoint input of the feedback control loop to receive the modified position setpoint signal, the modified position setpoint signal to take account of a non rigid body behavior of the stage.
    Type: Application
    Filed: December 17, 2008
    Publication date: September 17, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Mauritius Gerardus Elisabeth SCHNEIDERS, Wilhelmus Franciscus Johannes Simons
  • Patent number: 6860563
    Abstract: A description is given of a device for avoiding or limiting the tilting of the head forwards and/or to the side of a passenger sitting in a seat which has a backrest, having at least one one-piece or multi-piece head-support element which comprises one or more cushion-like elements (1a, 1b; 11a, 11b). The head-tilting protection described is distinguished by the fact that the one or more cushion-like elements are designed and dimensioned such that, in the position worn as intended, they are able to completely surround the side and front sections of the neck and/or of the head of the passenger, resting on the shoulders and/or the chest region of the passenger.
    Type: Grant
    Filed: January 26, 1997
    Date of Patent: March 1, 2005
    Assignee: Infineon Technologies AG
    Inventors: Angelika Semsch, Elisabeth Schneider
  • Patent number: 5827706
    Abstract: The nucleotide sequence which codes for cyclosporin synthetase and similar enzymes and recombinant vectors containing the sequence. The vectors are used in methods for the production of cyclosporin and cyclosporin derivatives.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: October 27, 1998
    Assignee: Novartis AG
    Inventors: Ernst Leitner, Elisabeth Schneider, Kurt Schoergendorfer, Gerhard Weber